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A kind of photosensitive polyethylene glycol-based antibacterial hydrogel dressing and preparation method thereof

A polyethylene glycol-based, polyethylene glycol acrylate technology is applied in the field of photosensitive polyethylene glycol-based antibacterial hydrogel dressings and the preparation thereof, which can solve the problems such as the lack of research on antibiotics, and achieve good antibacterial properties. Effect

Active Publication Date: 2020-09-01
ZHEJIANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is little research on the use of light to deliver antibiotics at wound sites

Method used

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  • A kind of photosensitive polyethylene glycol-based antibacterial hydrogel dressing and preparation method thereof
  • A kind of photosensitive polyethylene glycol-based antibacterial hydrogel dressing and preparation method thereof
  • A kind of photosensitive polyethylene glycol-based antibacterial hydrogel dressing and preparation method thereof

Examples

Experimental program
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Effect test

example 1

[0024] a) Synthesis of UV-cleavable benzylnitro molecules

[0025] Step 1: Dissolve 0.5g (2.36mmol) of 4-hydroxy-5-methoxy-o-nitroacetophenone and 0.476g (3.44mmol) of potassium carbonate in 25mL of anhydrous acetonitrile (calcium hydride to remove water first) and mix , add 0.28ml (3.64mmol) 3-bromopropyne, reflux reaction under nitrogen atmosphere at 100℃ for 3h, concentrate the reaction solution by rotary evaporation, add 50mL water and 5mL 2M HCl to dissolve, and extract 3 times with 3*50mL chloroform , the organic layer was obtained, dried with magnesium sulfate, filtered, and dried under reduced pressure to obtain a yellowish solid.

[0026] Step 2: Dissolve 0.57g of the product from the previous step in 20ml of tetrahydrofuran and 40ml of methanol mixed solvent, add 0.69g (13.728mmol) of sodium borohydride, stir for 3 hours in an ice bath, and concentrate the reaction solution by rotary evaporation, then add 50mL of water and 5 mL of 2M HCl, extracted three times with ...

example 2

[0034] Preparation of photosensitive polyethylene glycol-based antibacterial hydrogel dressing (25%)

[0035] 200mg of polyethylene glycol acrylate (150mg of unmodified polyethylene glycol acrylate + 50mg of modified polyethylene glycol acrylate) was dissolved in 1ml of PBS, 50mg of cross-linking agent polyethylene glycol diacrylate was added, and then Mix 50 μl APS (100 mg / ml) and 50 μl TEMED (8 mg / ml) evenly and heat at 90°C for 30 minutes to form a gel. Rinse repeatedly with PBS to remove excess initiator for later use.

example 3

[0037] Preparation of photosensitive polyethylene glycol-based antibacterial hydrogel dressing (75%)

[0038]200mg of polyethylene glycol acrylate (150mg of unmodified polyethylene glycol acrylate + 50mg of modified polyethylene glycol acrylate) was dissolved in 1ml of PBS, and 150mg of cross-linking agent polyethylene glycol diacrylate was added, and then Add 70 μl APS (100 mg / ml) and 70 μl TEMED (8 mg / ml), mix the solution evenly and heat at 90° C. for 30 minutes to form a gel. Rinse repeatedly with PBS to remove excess initiator for later use.

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Abstract

The invention relates to photo-sensitive polyethylene glycol antibacterial hydrogel dressing and a preparation method thereof. The photo-sensitive polyethylene glycol antibacterial hydrogel dressing is prepared by covalently grafting antibiotics to a polyethylene glycol hydrogen matrix. The preparation method of the photo-sensitive polyethylene glycol antibacterial hydrogel dressing comprises thefollowing steps: modifying micromolecular antibiotics to a polyethylene glycol macromolecular chain with terminal double bonds through ultraviolet breakable molecules, thus obtaining ultraviolet breakable polyethylene glycol-based macromolecules; blending the ultraviolet breakable polyethylene glycol-based macromolecules with unmodified polyethylene glycol molecules containing terminal double bonds as a monomer, and preparing and obtaining the hydrogel dressing with photo-sensitivity and antibacterial performance through thermal induced double-bond cross-linking under the action of a cross-linking agent and an initiator. According to the photo-sensitive polyethylene glycol antibacterial hydrogel dressing disclosed by the invention, the raw materials have good biocompatibility, the obtainedhydrogel dressing has certain mechanical performance and water-absorbing swelling performance, effective control and release can be realized under the irradiation of ultraviolet light with the wavelength of 365 nm, and the hydrogel dressing has good ultraviolet photoresponse performance and good antibacterial performance, and is suitable for protecting a wound and treating infection.

Description

technical field [0001] The invention relates to a hydrogel dressing and a preparation method thereof, in particular to a photosensitive polyethylene glycol-based antibacterial hydrogel dressing and a preparation method thereof. Background technique [0002] The skin is the largest organ of the human body. In daily life, it mainly plays the role of regulating body temperature, protecting internal organs from physical and chemical damage, and providing a physical barrier. However, a large area of ​​skin is exposed, and it is extremely vulnerable to various injuries in daily life, such as mechanical trauma, burns, and chronic ulcers. Skin repair and regeneration is a major clinical problem. At the same time, wound infection caused by microorganisms in the wound care process is the most common complication, and severe cases can lead to death. At present, the most commonly used means in the process of wound care are wound dressings, such as gauze, iodine tablets, and dressing ma...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07D309/00C08L71/02C08J3/24C08J3/075C08G65/333A61L15/26A61L15/44A61L15/46A61L15/42
CPCA61L15/26A61L15/42A61L15/44A61L15/46A61L2300/406C08G65/33396C08J3/075C08J3/246C08J2371/02C08J2471/02C08L71/02
Inventor 马列庞倩高长有
Owner ZHEJIANG UNIV
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