A light-induced infiltration microfluidic chip preparation method and functionalization method
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- NORTHWESTERN POLYTECHNICAL UNIV
- Publication Date
- 2021-01-05
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the field of microfluidic technology and the field of biochemistry, and relates to a preparation method and a functionalization method of a light-induced infiltration microfluidic chip, in particular to a light-induced infiltration multi-chemical biological chip capable of realizing a single chip structure. Enclosed microfluidic chips for analytical functions and their fabrication. Background technique
[0002] The basic preparation method of the existing chip is mainly the micromachining technology of glass, hard polymers (such as polycarbonate, polymethyl methacrylate, etc.) and elastic polymers (such as polydimethylsiloxane). Among them, photolithography is the core technology of preparation. Photolithography usually includes three steps of pattern transfer (exposure), development and etching to obtain the designed microstructure on the chip. Some researchers have developed a LIGA high-resolution etching process based on p...