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An ultra-high resolution fluorine-containing oxygen-containing block copolymer and its preparation method and application

An ultra-high-resolution, block copolymer technology, applied in the field of ultra-high-resolution fluorine-containing oxygen-containing block copolymers and their preparation, can solve problems such as hindering application, high defect rate, and difficulty in meeting production requirements, and achieves Effects of high etch contrast, defectivity reduction, and excellent phase separation

Active Publication Date: 2021-07-13
FUDAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Block copolymer materials in the prior art (such as polystyrene-b-polymethyl methacrylate (Polystyrene-block-Poly (methyl methacrylate), PS-b-PMMA)) need to be annealed at a higher temperature ( Above 160°C) and longer annealing time for complete self-assembly, which is increasingly difficult to meet actual production needs (especially photolithography)
This kind of material still has a high defect rate after self-assembly on the wafer, which further hinders its application in actual production

Method used

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  • An ultra-high resolution fluorine-containing oxygen-containing block copolymer and its preparation method and application
  • An ultra-high resolution fluorine-containing oxygen-containing block copolymer and its preparation method and application
  • An ultra-high resolution fluorine-containing oxygen-containing block copolymer and its preparation method and application

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preparation example Construction

[0062] The present invention also includes the preparation method of the above-mentioned ultra-high resolution fluorine-containing oxygen-containing block copolymer, comprising the following steps:

[0063] S1. Select a homopolymer monomer and a modified monomer, and polymerize the homopolymer monomer into a homopolymer, wherein the homopolymer monomer is selected from: alkoxy-substituted styrene compounds , Vinyl phenol ester compounds, methacrylate phenol ester or acrylate phenol ester compounds containing ester groups in the aryl group, the substitution is ortho-, inter-or mono-substitution or multi-substitution;

[0064] The modified monomer is a compound containing the following structural units: fluorine-containing methacrylate compounds, fluorine-containing styrene compounds;

[0065] S2. Mix the homopolymer and the modified monomer prepared in the step S1 in proportion, polymerize through a polymerization reaction, and then deprotect to obtain the ultra-high resolution...

Embodiment 1

[0070] Embodiment 1 of the present invention is: an ultra-high resolution fluorine-containing oxygen-containing block copolymer and its preparation method, the precursor of the block copolymer is P3OTHPS-b-PPDFMA-1, and the P3OTHPS-b -PPDFMA-1 is prepared by anionic polymerization.

[0071] 3ml 3OTHPS Dissolve in 35mL tetrahydrofuran, add dibutylmagnesium solution (1M, solvent is n-hexane) and raise the temperature to 40°C for 0.5h, and transfer the treated mixture to a reaction flask. The reaction bottle was returned to room temperature, stirred evenly, and then placed in a cold bath at -80°C for 15 minutes. Add 0.65mL sec-BuLi (1.3M, the solvent is n-hexane), and keep the reaction at -80°C for 15min. The dried fluoromethacrylate ( 2.5ml) was dropped to -60°C, dropped into the reaction system, and kept at -80°C for 40 minutes. The product was precipitated in ethanol to give 4.5 g of a white solid.

[0072] Get the white precipitation that above-mentioned operation make...

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Abstract

The invention discloses an ultra-high-resolution fluorine-containing oxygen-containing block copolymer. The precursor of the ultra-high-resolution fluorine-containing oxygen-containing block copolymer includes at least block A and block B. The block The monomer of segment A is selected from the following compounds: alkoxy-substituted styrene compounds, vinyl phenol ester compounds, methacrylate phenol ester or acrylate phenol ester compounds containing ester groups in the aryl group; the block The monomer of B is selected from the following compounds: fluorine-containing methacrylate compounds, fluorine-containing styrene compounds, wherein, the substitution in the monomers of the block A or block B is ortho, meta or mono-substitution or Multiple substitutions. Compared with the existing technology, the ultra-high-resolution fluorine-containing oxygen-containing block copolymer can be rapidly assembled at low temperature, and has potential self-healing properties to reduce the defect rate, thereby improving its ability to resist etching.

Description

technical field [0001] The invention relates to the field of materials, in particular to an ultra-high resolution fluorine-containing oxygen-containing block copolymer, a preparation method and application thereof. Background technique [0002] Block copolymer, also known as mosaic copolymer, is a special polymer prepared by linking two or more polymer segments with different properties. Block copolymers with a specific structure will exhibit different properties from simple linear polymers and mixtures of many random copolymers and even homopolymers. Therefore, they are used as thermoplastic elastomers, blending compatibilizers, interfacial modification It has broad application prospects in many fields such as biomedicine, photolithography technology, construction and chemical industry. [0003] Photolithography technology refers to the technology of transferring the pattern on the mask plate to the substrate by means of photoresist (also known as photoresist, mainly copol...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F293/00C08F8/12C08F297/02C08F212/14C08F220/24C08F220/28
CPCC08F8/12C08F212/14C08F220/24C08F220/28C08F293/005C08F2438/01C08F2438/03C08F220/282C08F297/026
Inventor 邓海王晨旭李志龙
Owner FUDAN UNIV
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