A diamond-like composite film on the surface of a cutting tool
A diamond and composite film technology, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problems of reduced service life, single interface structure, and low bonding strength, so as to improve the bonding degree and reduce the surface Defects, Guaranteed Cohesion Effects
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Embodiment 1
[0025] The metal bottom layer is a Cr layer, which is formed by magnetron sputtering and then laser cladding, and its thickness is 10nm. The process parameters of magnetron sputtering for the metal bottom layer are: substrate negative bias voltage 70V, chromium target current 2A, substrate rotation speed 2rpm, nitrogen flow rate 5sccm, C 2 h 2 The flow rate is 3.5 sccm; the process parameters of laser cladding for the metal bottom layer are power 1000W, argon gas flow rate 1200ml / min, scanning speed 2mm / s, laser head tilt angle 0 degrees, and defocus amount 10mm.
[0026] The thicknesses of the three layers of the transition layer are 50nm, 100nm, and 200nm in sequence from the inside to the outside.
[0027] The process parameters of the CrAl layer using magnetron sputtering are: substrate negative bias 70V, chromium target current 2A, substrate speed 2rpm, nitrogen flow 5sccm, aluminum target current 2A, C 2 h 2 Flow 3sccm;
[0028] The process parameters of the CrAlTi l...
Embodiment 2
[0035] The metal bottom layer is an Al layer, which is formed by magnetron sputtering and then laser cladding, and its thickness is 50nm. The process parameters of magnetron sputtering for the metal bottom layer are: substrate negative bias voltage 70V, aluminum target current 2A, substrate rotation speed 2rpm, nitrogen flow rate 5sccm, C 2 h 2 The flow rate is 3.5 sccm; the process parameters of laser cladding for the metal bottom layer are power 2500W, argon gas flow rate 2400ml / min, scanning speed 8mm / s, laser head tilt angle 30 degrees, and defocus amount 30mm.
[0036]The thicknesses of the three layers of the transition layer are 70nm, 200nm and 300nm in sequence from inside to outside.
[0037] The process parameters of the CrAl layer using magnetron sputtering are: substrate negative bias 100V, chromium target current 4A, substrate speed 8rpm, nitrogen flow 10sccm, aluminum target current 4A, C 2 h 2 Flow 7sccm;
[0038] The process parameters of the CrAlTi layer u...
Embodiment 3
[0045] The metal bottom layer is a Cr layer, which is formed by magnetron sputtering and then laser cladding, and its thickness is 25nm. The process parameters of magnetron sputtering for the metal bottom layer are: substrate negative bias voltage 70V, chromium target or aluminum target current 2A, substrate speed 2rpm, nitrogen flow rate 5sccm, C 2 h 2 The flow rate is 3.5 sccm; the process parameters of laser cladding for the metal bottom layer are power 1800W, argon gas flow rate 1700ml / min, scanning speed 5mm / s, laser head tilt angle 15 degrees, and defocus amount 20mm.
[0046] The thicknesses of the three layers of the transition layer are 60nm, 150nm and 250nm in sequence from inside to outside.
[0047] The process parameters of the CrAl layer using magnetron sputtering are: substrate negative bias voltage 80V, chromium target current 3A, substrate speed 5rpm, nitrogen flow rate 7sccm, aluminum target current 3A, C 2 h 2 Flow 5sccm;
[0048] The process parameters ...
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