Plasmon-photonic mode-based coupled narrow-band photoelectric detector
A photodetector and plasmon technology, applied in the field of photodetectors, can solve the problems of inconvenient chip and integration, complex system, large volume, etc., and achieve miniaturization and chip, high spectral resolution, The effect of improving sensitivity
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Embodiment 1
[0026] A narrow-band photodetector based on plasmon-photon mode coupling, such as figure 1 As shown, the structure of the detector from bottom to top is the bottom electrode 1, which is the bottom aluminum electrode, the semiconductor layer 2, which is the silicon-based PIN structure semiconductor layer, and the insulating medium layer 3, which is the silicon dioxide insulating passivation layer. The upper surface of the layer 3 is decorated with plasmonic metal nanostructures 4, that is, periodic gold nano-square arrays, and a top electrode 5, that is, a top aluminum electrode, is arranged on the periphery of the insulating medium layer 3, and the top electrode 5 is in direct contact with the semiconductor layer 2.
[0027] The bottom electrode 1 has a thickness of 100 nm, the semiconductor layer 2 has a thickness of 100 nm, and the insulating medium layer 3 has a thickness of 100 nm.
[0028] When the incident light of visible light is irradiated on the surface of the device...
Embodiment 2
[0030] A narrow-band photodetector based on plasmon-photon mode coupling, such as figure 1 As shown, the structure of the detector from bottom to top is the bottom electrode 1, which is the bottom aluminum electrode, the semiconductor layer 2, which is the indium gallium arsenic semiconductor layer, and the insulating medium layer 3, which is the insulating passivation layer of aluminum oxide. The upper surface of layer 3 is decorated with plasmonic metal nanostructures 4 , namely periodic silver disk arrays, and a top electrode 5 , namely top copper electrode, is arranged on the periphery of insulating medium layer 3 , and the top electrode 5 is in direct contact with semiconductor layer 2 .
[0031] The thickness of the bottom electrode 1 is 200nm, the thickness of the semiconductor layer 2 is 1000nm, and the thickness of the insulating medium layer 3 is 500nm.
[0032] When the incident light of broadband near-infrared light hits the surface of the device, the plasmon mode ...
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