Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparing method of silica-glass-doped evaporation-coating material

A technology of quartz glass and vapor deposition materials, applied in glass manufacturing equipment, glass molding, glass furnace equipment, etc., can solve the problems of low hardness of ceramic particles, easy dusting on the surface of particles, splash points, etc., and achieve the evaporation rate. Uniform and stable, not easy for dust to fall off, and the effect of film quality improvement

Active Publication Date: 2019-09-06
CHANGZHOU PROSRUN PHOTOELECTRIC TECH CO LTD
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The ceramic particles have many pores, the amount of outgassing during the evaporation process is large, the coating stability is poor, and the dust of the coating machine is easily aroused, resulting in poor film finish; the density is small, and the particles are easy to fly when the electron gun is evaporating; the hardness of the ceramic particles is not high, and the surface of the particles is easy to Dusty, unclean treatment, splash points caused by evaporation process

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparing method of silica-glass-doped evaporation-coating material
  • Preparing method of silica-glass-doped evaporation-coating material
  • Preparing method of silica-glass-doped evaporation-coating material

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0031] In order to solve the above problems, the first aspect of the present invention provides a method for preparing a doped quartz glass evaporation material, the steps comprising:

[0032] (1) Preparation of ingredients: the raw material SiO 2 and Al 2 o 3 According to the weight ratio (1-X): X ingredients are mixed, wherein X=1~40wt%; Put the mixed material into the planetary ball mill, add zirconia grinding balls with a diameter of 2 mm and pure water at the same time, and water is the mixing medium in the planetary ball mill Carry out wet ball milling process on the ingredients, the ratio of material to ball is 10:1~20:1, and the ball milling time is 5~10h;

[0033] (2) Slurry spray granulation: put the slurry made after step (1) ball milling into a spray granulator to prepare spherical powder;

[0034] (3) Tablet forming: the composite powder made in step (2) is pressed and formed on a tablet press, and the tablet pressure is controlled at 100-200 MPa to prepare a s...

Embodiment 1

[0085] Embodiment 1 provides a kind of preparation method of doped quartz glass evaporation material, and the steps include:

[0086] (1) Preparation of ingredients: the raw material SiO 2 and Al 2 o 3 According to the weight ratio (1-X): X ingredients are mixed, wherein X=10wt%; the mixed material is put into the planetary ball mill, and zirconia grinding balls with a diameter of two millimeters and pure water are added simultaneously, and water is the mixing medium for the ingredients in the planetary ball mill Carry out the wet ball milling process, the material-ball ratio is 20:1, and the ball milling time is 10h;

[0087] (2) Slurry spray granulation: Put the slurry made after step (1) ball milling into a spray granulator to prepare spherical powder with a diameter of 100 μm;

[0088] (3) Tablet forming: the composite powder made in step (2) is pressed and formed on a tablet press, the tablet pressure is controlled at 200MPa, and a cuboid sheet-shaped green body is pre...

Embodiment 2

[0096] Embodiment 2 provides a kind of preparation method of doped quartz glass evaporation material, and the steps include:

[0097] (1) Preparation of ingredients: the raw material SiO 2 and Al 2 o 3 According to the weight ratio (1-X): X ingredients are mixed, wherein X=1wt%; the mixture is put into the planetary ball mill, and the zirconia grinding balls with a diameter of two millimeters and pure water are added simultaneously, and water is the mixing medium for the ingredients in the planetary ball mill Carry out the wet ball milling process, the ratio of material to ball is 10:1, and the ball milling time is 5h;

[0098] (2) Slurry spray granulation: Put the slurry made after step (1) ball milling into a spray granulator to prepare spherical powder with a diameter of 100 μm;

[0099] (3) Tablet molding: the composite powder made in step (2) is pressed and formed on a tablet machine, the tablet pressure is controlled at 100MPa, and a cuboid sheet-shaped green body is ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
particle size (mesh)aaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to the technical field of preparation of evaporation-coating materials, in particular to a preparing method of a silica-glass-doped evaporation-coating material. The preparing method of the silica-glass-doped evaporation-coating material comprises the steps of 1, preparation of ingredients; 2, spray granulation of a sizing agent; 3, tabletting forming; 4, preparation of a sintering body; 5, smashing and pulverizing; 6, founding and heap forming; 6, annealing treatment; 8, smashing into particles; 9, cleaning packaging. According to the preparing method, the steps of firstly, smashing the aluminum silicon ceramic sintering body, then firing and annealing the sintering body, and finally smashing the sintering body again are adopted, the density of the obtained aluminumsilicon glass evaporation-coating material is large, and sputtering phenomena cannot occur due to the light weight of the gun when the electronic gun bombards the evaporation-coating material; few pores exist, the air discharge amount in the coating process is reduced, and the quality of the coating layer is improved accordingly; the evaporation angle is consistent, the evaporation speed is uniform and stable, and focusing of the electronic gun is easy; dust falling is unlikely to occur to the coating material, and sputtering points cannot be generated in the coating process; meanwhile, the evaporation-coating material can be applied to plastic lenses in batch, so that the coating operabiity and the quality of the coating layer after coating are both greatly improved.

Description

technical field [0001] The invention belongs to the technical field of evaporation material preparation, and more specifically, the invention relates to a method for preparing a doped quartz glass evaporation material. Background technique [0002] Lenses are widely used in the fields of vehicle, security, and photography. The lens on the lens is a key optical component that determines the quality of the lens. The material of the lens in the early stage is optical glass, but the optical glass base material needs to be machined into a lens, the processing cost is high, and the product batch stability is not good. With the rapid development of plastic technology, the transmittance and other properties of plastic substrates are close to those of glass substrates. Compared with the glass substrate, the plastic substrate can be formed in one time according to the required shape, and the processing is simple and the cost is low. At present, plastic base materials have increasing...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03C6/04C03C3/06C03C1/02C03B20/00C03B5/16C03B25/00C23C14/24C23C14/10
CPCC03B5/16C03B20/00C03B25/00C03C1/00C03C1/026C03C3/06C23C14/10C23C14/24
Inventor 李新华
Owner CHANGZHOU PROSRUN PHOTOELECTRIC TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products