Method for preparing anti-wear hydraulic pump part
A technology for hydraulic pumps and parts, which is applied in the field of preparation of anti-wear hydraulic pump parts, can solve problems such as unsupportable, PVD coating peeling, coating peeling, etc., to improve surface treatment efficiency, slow down physical performance differences, improve structure and sexual effect
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Embodiment 1
[0026] In the preparation method of the wear-resistant hydraulic pump parts of the present invention, the base material of the hydraulic pump parts is 40Cr, and the base material of the hydraulic pump parts is subjected to quenching, high-temperature tempering, rough and fine machining, and then carburized by ion plating. The HfCrWSiC multi-component composite carbide coating on the surface is deposited by the combined method of ion plating and magnetron sputtering; 2 C ion plating targets, 1 Hf magnetron sputtering target, 1 Cr magnetron sputtering target, and 1 Cr magnetron sputtering target are used for deposition. W magnetron sputtering target and 1 Si magnetron sputtering target; specifically include the following steps:
[0027] (1) Parts processing: parts blank→quenching (870~880℃, water cooling)→high temperature tempering (540~560℃, water cooling)→rough machining→semi-finishing→stress relief tempering (500~550℃, air cooling) → Finishing (surface roughness Ra1.6μm, proc...
Embodiment 2
[0037] In the preparation method of the wear-resistant hydraulic pump parts of the present invention, the base material of the hydraulic pump parts is 40Cr, and the base material of the hydraulic pump parts is subjected to quenching, high-temperature tempering, rough and fine machining, and then carburized by ion plating. The HfCrWSiC multi-component composite carbide coating on the surface is deposited by the combined method of ion plating and magnetron sputtering; 2 C ion plating targets, 1 Hf magnetron sputtering target, 1 Cr magnetron sputtering target, and 1 Cr magnetron sputtering target are used for deposition. W magnetron sputtering target and 1 Si magnetron sputtering target; specifically include the following steps:
[0038] (1) Part matrix processing: part matrix blank→quenching (910~930℃, oil quenching)→high temperature tempering (560~620℃, air cooling)→rough machining→semi-finishing→stress relief tempering (550~600℃ , oil cooling)→finishing (surface roughness Ra1....
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