Production process of electrodeposited copper foil with shiny surface subjected to roughening

A technology of electrolytic copper foil and production process, which is applied in the field of preparation of high-precision electrolytic copper foil, can solve the problems such as the unsatisfactory peeling resistance of electrolytic copper foil, improve the peeling resistance and corrosion resistance, improve the peeling strength, improve The effect of surface morphology

Inactive Publication Date: 2020-02-07
JIANGDONG ELECTRONIC MATERIALS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the gradual increase in the current requirements for the peeling resistance of PCB boards, the peeling resistance of the electrolytic copper foil of the above process can no longer meet the current needs. Therefore, it is necessary to develop a new production process for smooth and roughened electrolytic copper foil. To improve the peeling resistance of smooth copper foil after roughening

Method used

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  • Production process of electrodeposited copper foil with shiny surface subjected to roughening

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Such as figure 1 As shown, a production process of smooth surface roughened electrolytic copper foil, the 18μm copper foil with smooth surface roughness Rz of 1.62μm is pickled, roughened Ⅰ, cured Ⅰ, roughened Ⅱ, cured Ⅱ, cured Ⅲ in sequence , Curing Ⅳ, high temperature anti-oxidation, water washing Ⅰ, room temperature anti-oxidation, water washing Ⅱ, silane spraying and drying and other processes. The vehicle speed is 22m / min.

[0023] Among them, the pickling process conditions: temperature 30~40 ℃, sulfuric acid (H 2 SO 4 ) concentration of 100~170g / l, copper ion (Cu 2+ ) Concentration 25~45g / l.

[0024] Coarsening I and II process conditions: current density 28~33A / dm 2 , temperature 25~35℃, sulfuric acid (H 2 SO 4 ) concentration of 160~180g / l, copper ion (Cu 2+ ) concentration of 7~13g / l, chloride ion (Cl 2- ) concentration 15~30mg / l, sodium tungstate (Na 2 WO 4 2H 2 O) 0~90mg / l, sodium molybdate (Na 2 MoO 4 2H 2 O) 0~70mg / l and cobalt sulfate (CoSO...

Embodiment 2

[0032] A production process for roughening electrolytic copper foil on a smooth surface. The 18 μm copper foil with a smooth surface roughness Rz of 1.53 μm is pickled, roughened Ⅰ, cured Ⅰ, roughened Ⅱ, cured Ⅱ, cured Ⅲ, and cured Ⅳ in sequence. , high temperature anti-oxidation, water washing Ⅰ, room temperature anti-oxidation, water washing Ⅱ, silane spraying and drying processes. The vehicle speed is 22m / min.

[0033] Among them, the pickling process conditions: temperature 30~40 ℃, sulfuric acid (H 2 SO 4 ) concentration of 100~170g / l, copper ion (Cu 2+ ) Concentration 25~45g / l.

[0034] Coarsening I and II process conditions: current density 28~33A / dm 2 , temperature 25~35℃, sulfuric acid (H 2 SO 4 ) concentration of 160~180g / l, copper ion (Cu 2+ ) concentration of 7~13g / l, chloride ion (Cl 2- ) concentration 15~30mg / l, sodium tungstate (Na 2 WO 4 2H 2 O) 0~90mg / l, sodium molybdate (Na 2 MoO 4 2H 2 O) 0~70mg / l and cobalt sulfate (CoSO 4 ·7H 2 O) 0~45g / L. ...

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Abstract

The invention discloses a production process of electrodeposited copper foil with a shiny surface subjected to roughening. The copper foil is subjected to acid pickling, roughening I, curing I, roughening II, curing II, curing III, curing IV, high-temperature anti-oxidation, water washing I, normal-temperature anti-oxidation, water washing II, silane spraying and drying in sequence; and the process conditions of the roughening I and the roughening II are that the current densities is 28 A / dm<2>-33 A / dm<2>, the temperature is 25 DEG C-35 DEG C, the sulfuric acid concentration is 160 g / l-180 g / l, the copper ion concentration is 7 g / l-13 g / l, the chloride ion concentration is 15 mg / l-30 mg / l, the sodium tungstate concentration is 0 mg / l-90 mg / l, the sodium molybdate concentration is 0 mg / l-70mg / l, and the cobalt sulfate concentration is 0 g / l-45 g / l. According to the process, tungsten, cobalt and molybdenum elements are added in the roughening procedures, so that the surface morphology of the copper foil is improved, and the anti-stripping strength of the electrodeposited copper foil is improved; and elements such as lanthanum or cerium are added in the high-temperature anti-oxidation process to form a special plating layer, and the structural morphology of the plating layer is changed, so that the anti-stripping strength and the corrosion resistance of the electrodeposited copper foil are improved.

Description

technical field [0001] The invention relates to a production process of electrolytic copper foil, in particular to a production process of smooth surface roughened electrolytic copper foil, and belongs to the field of high-precision electrolytic copper foil preparation. Background technique [0002] With the development of electronic information technology, multi-layer complex or high-density thin circuit PCB boards are increasingly used in high-precision miniaturized electronic products. Traditional methods usually use high-precision electronic copper foil or double-sided roughened electrolytic copper foil for high-precision electronic products. Density fine line PCB board or multi-layer complex PCB board inner layer, the use of traditional high-precision electrolytic copper foil side requires complex processes such as corrosion and blackening after pressing the board, the production process is long and the cost is high; the use of double-sided roughened electrolytic copper ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23G1/10C23G3/02C25F3/02C25D3/56C25D5/48C25D7/06
CPCC23G1/103C23G3/02C25D3/56C25D5/48C25D7/0614C25F3/02
Inventor 于君杰唐海峰刘肇王卫黄德兵曹德林韩青李登辉隋景昕
Owner JIANGDONG ELECTRONIC MATERIALS CO LTD
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