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A method for processing various nanopatterns using femtosecond laser

A femtosecond laser processing, nano-patterning technology, applied in nanotechnology, nanotechnology, nanostructure manufacturing, etc., can solve the problems of single nanostructure shape and so on

Active Publication Date: 2021-11-19
CHANGCHUN UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The present invention aims at the shortage of single nanostructure shape processed by metal nanoparticle-assisted femtosecond laser on the surface of the substrate in the past, and proposes a method of changing the dielectric environment around the metal nanoparticle to realize the processing of various nanopatterns by femtosecond laser

Method used

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  • A method for processing various nanopatterns using femtosecond laser
  • A method for processing various nanopatterns using femtosecond laser
  • A method for processing various nanopatterns using femtosecond laser

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specific Embodiment approach 1

[0028] figure 1 It is a flow chart of the method for realizing femtosecond laser processing various nanometer patterns in the present invention.

[0029] Cut the silicon wafer into 1*1cm 2 Place the squares in acetone, ethanol and deionized water in turn for ultrasonic cleaning for 5 minutes. Put the cleaned silicon chip into a mixed solution of concentrated sulfuric acid and hydrogen peroxide at a ratio of 7:3, heat the solution to 80°C, then keep heating at a constant temperature for 1 hour, cool for 1 hour, take out the silicon chip and put it in deionized water for ultrasonic cleaning After 5 minutes, the surface was blown dry with nitrogen, and the hydrophilization treatment was completed.

[0030] A gold nanoparticle solution with a concentration of 5% and a particle diameter of 200nm (the solvent is deionized water) was mixed with sodium citrate at a ratio of 1:4 to prepare a mixed solution, and stirred evenly with a magnetic stirrer.

[0031] Place the hydrophilized...

specific Embodiment approach 2

[0035] The difference between this solution and the first method is that the polarization state of the femtosecond laser is changed to circular polarization. The laser energy density is 30.57mJ / cm 2 When, the processing effect is as Image 6 Shown; the laser energy density is 45.8mJ / cm 2 When, the processing effect is as Figure 7 Shown; laser energy density is 56.05mJ / cm 2 When, the processing effect is as Figure 8 Shown; the laser energy density is 66.2mJ / cm 2 When, the processing effect is as Figure 9 Shown; the laser energy density is 81.5mJ / cm 2 When, the processing effect is as Figure 10 shown.

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Abstract

The invention relates to a method for processing various nanometer patterns by using a femtosecond laser, and belongs to the technical field of nanostructure preparation. The present invention comprises seven steps: (1) washing and drying the cleaned silicon wafer after hydrophilic treatment; (2) making a gold nanoparticle solution with a concentration of 5%, a particle diameter of 200nm and a solvent of deionized water Mix with sodium citrate and stir evenly with a stirrer; (3) drop the solution liquid on the surface of the silicon wafer; (4) use the turntable to rotate the silicon wafer, change the filling amount of sodium citrate and spin coating parameters, and spin coat gold nanoparticles (5) place the silicon wafer in a resistance furnace to dry; (6) use the femtosecond laser to vertically irradiate the prepared silicon wafer with gold nanoparticles and deposited film; (7) change the femtosecond laser The second laser parameters and the parameters of the deposited thin film realize the preparation of various nano-processing patterns.

Description

technical field [0001] The invention relates to the technical field of nanostructure preparation, in particular to a method for processing various nanometer patterns by using a femtosecond laser. Background technique [0002] In recent years, under the excitation of the incident light field, the local near-electric field enhancement of metal nanostructures near the contact point with the substrate has attracted extensive attention. The enhanced near-field generated by the coupling of metal nanoparticles and the substrate can melt or ablate the substrate under the metal nanostructure, resulting in permanent deformation. Therefore, super-diffraction-limited nanofabrication can be achieved by irradiation of incident light field with appropriate energy density. This processing method is widely used in the field of micro-nano processing, and meets the requirements of high-precision processing for the miniaturization of modern optoelectronic devices. [0003] For nanohole proces...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B82B3/00
CPCB23K26/36B23K26/60B23K26/702
Inventor 宋晓伟窦银萍林景全孙雪
Owner CHANGCHUN UNIV OF SCI & TECH