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A kind of photosensitive resin and its preparation method and application

A technology of photosensitive resin and structural unit, applied in the field of photosensitive resin and its preparation, can solve the problems of large difference, non-uniform residual film rate, low residual film stability and surface uniformity, etc., and achieves heat resistance and leveling. The effect of improving the heat resistance and leveling performance, improving the stability and uniformity of the residual film rate

Active Publication Date: 2020-12-08
合肥鼎材科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Under the condition of ultraviolet light, the photoinitiator in the photoresist of the above-mentioned ratio can initiate the photopolymerization monomer to undergo photocrosslinking and curing reaction to form a high polymer, and the alkali-soluble resin is (meth)acrylic acid copolymer resin and / or Or esterified styrene maleic anhydride copolymer resin, although the photoresist of the invention reaches the performance of acid resistance and alkali resistance, that is, it avoids the problem that the cured photoresist is dissolved by the metal etching solution and causes pattern defects, but its Low residual film stability and surface uniformity
[0008] Therefore, there is an urgent need to develop a new type of photosensitive resin composition in this field to solve the problem of uneven and large differences in the residual film rate after post-baking, and improve the stability and surface uniformity of the residual film rate.

Method used

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  • A kind of photosensitive resin and its preparation method and application
  • A kind of photosensitive resin and its preparation method and application
  • A kind of photosensitive resin and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0076] This synthesis example provides a kind of photosensitive resin EMTB01 and preparation method thereof, specifically as follows:

[0077] (1) In a three-neck flask equipped with a stirrer, dropping funnel and thermometer, add 500mL of solvent propylene glycol methyl ether acetate, heat up to 90°C, and dissolve 100g of methyl methacrylate (R 1 For methyl) (Shanghai Aladdin Biochemical Technology Co., Ltd.), methacrylic acid 82g (R 2 is methyl) (Shanghai McLean Biochemical Technology Co., Ltd.), p-styrene polysiloxane 124g (m=10~100, R 3 is methyl, R 4 benzene ring) (BYK-022, Shanghai Yuyu New Material Co., Ltd.), 2-methyl-2-adamantyl methacrylate 92g (R 5 For methyl, Bailingwei Technology Co., Ltd.) and initiator azobisisobutyronitrile 5g (Bailingwei Technology Co., Ltd.) were added dropwise into the three-necked bottle, and the dropwise addition was completed in 2 hours, and the reaction was carried out for 10 hours;

[0078] (2) The temperature was raised to 110° C. t...

Synthetic example 2

[0081] The difference with Synthesis Example 1 is that methyl methacrylate is replaced by ethyl methacrylate (R 1 is ethyl), and methacrylic acid is replaced by ethacrylic acid (R 2 is ethyl), and the para-styrene polysiloxane is replaced by vinyl polysiloxane (R 3 for hydrogen, R 4 is a single bond), replace 2-methyl-2-adamantyl methacrylate with 2-ethyl-2-adamantyl ethyl acrylate (R 5 and R 6 Ethyl), the preparation obtains EMTB02, yield 90.6%;

[0082]Structural characterization: The resin EMTB02 was dissolved in tetrahydrofuran and characterized by Waters-Breeze GPC gel permeation chromatography. The weight average molecular weight Mw=17500 and PDI=1.116 were measured.

Synthetic example 3

[0084] The difference with Synthesis Example 1 is that methyl methacrylate is replaced by phenethyl methacrylate (R 1 is phenylethyl), and methacrylic acid is replaced by phenylethyl acrylate (R 2 is phenylethyl), and the p-position styrene polysiloxane is replaced by terminal vinyl styrene polysiloxane (R 3 is phenethyl, R 4 Ethylene), replace 2-methyl-2-adamantyl methacrylate with 2-phenethyl-2-adamantyl phenethyl acrylate (R 5 and R 6 Be phenethyl), prepare EMTB03, yield 90.23%;

[0085] Structural characterization: The resin EMTB03 was dissolved in tetrahydrofuran and characterized by Waters-Breeze GPC gel permeation chromatography. The weight average molecular weight Mw=16500 and PDI=1.212 were measured.

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Abstract

The invention relates to photosensitive resin as well as a preparation method and application thereof. The photosensitive resin comprises at least one structural unit (A), at least one structural unit(B), at least one structural unit (C) and at least one structural unit (D). A silane structural unit (A) and an adamantane structural unit (B) are introduced into the molecular chain of the photosensitive resin at the same time; through the combined action of the two components, the photosensitive resin has excellent heat resistance and leveling property, so that the heat resistance and levelingproperty of the photosensitive resin composition containing the structural units at high temperature can be improved, and the residual film rate stability and uniformity of color glue in a post-bakingprocess section can be improved.

Description

technical field [0001] The invention relates to the technical field of liquid crystal display materials, in particular to a photosensitive resin and its preparation method and application. Background technique [0002] The color filter is an important component of the liquid crystal display panel. Through the color filter, the liquid crystal display can achieve visual colorization. The performance index of the color photoresist used to prepare the color filter directly affects the display effect of the liquid crystal panel. The preparation of color filters mainly utilizes the photoinitiated curing mechanism of photoinitiators. Photocuring technology is a new type of advanced material surface treatment technology, which has the characteristics of high efficiency, high quality, environmental protection, and energy saving. Photosensitive resin, as a key component of light-curable materials, plays a decisive role in the degree of light-cure, film-forming properties, pigment-car...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F283/12C08F220/18C08F220/14G03F7/004G03F7/027G03F7/00G02B5/20G02B1/04
CPCC08F283/124G02B1/04G02B5/20G03F7/0007G03F7/004G03F7/027C08F220/14
Inventor 王石进孙涛刘永祥桑伟
Owner 合肥鼎材科技有限公司