A kind of intermediate phase for perovskite vapor phase growth and its preparation method and application
A technology of vapor phase growth and perovskite, which is applied in the direction of electrical components, semiconductor/solid-state device manufacturing, semiconductor devices, etc., can solve the problems of low efficiency of solar cell devices, and achieve the purpose of promoting reaction rate, increasing grain size, and eliminating crystals. The effect of defects
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Embodiment 1
[0032] Deposition of 200nmPbI on FTO substrate 2 Floor( figure 1In a), react with FAI / FACl (FAI:FACl=1:1) atmosphere, and then react with FAI / FACl (FAI:FACl=1:1) atmosphere at 170 o C, react for 40 minutes under 100Pa to generate FAPbI 3 perovskite thin film.
[0033] The results showed that PbI 2 FAPbCl can be generated with FACl atmosphere x I 3-x ( figure 1 In b) with FA 2 PbCl 4 ( figure 1 Middle c) Perovskite interphase, which can finally react with FAI to generate FAPbI 3 ( figure 1 Middle d) The target perovskite phase.
[0034] The FAPbI 3 The perovskite film is prepared into a battery device, and the intensity is 100mW / cm 2 The photoelectric performance was tested under the simulated solar energy, and the results showed that the solar cell obtained a short-circuit photocurrent density J sc =21.94mA / cm 2 , open circuit voltage V oc =1120mV, fill factor FF=0.757, photoelectric conversion efficiency η=18.6%; under positive sweep condition, J sc =21.88mA / ...
Embodiment 2
[0036] Preparation of perovskite solar cell devices, the structure of which is as follows figure 2 As shown, there are 1-6 layers from bottom to top, of which 1 is a transparent substrate (glass), 2 is a TCO conductive layer (FTO), 3 is an electron extraction layer (tin oxide), and 4 is an organic-inorganic hybrid perovskite layer (Cs x FA 1-x PbBr y I 3-y ), 5 is the hole extraction layer (Spiro-OMeTAD), 6 is the back electrode (gold). where Cs x FA 1-x PbBr y I 3-y The preparation process of the perovskite layer is: sequentially vapor-deposit 30nmCsBr and 200nmPbI on the tin oxide layer 2 (inorganic components), and then placed in a tube furnace, reacted with FAI / FACl mixed atmosphere (FAI:FACl=4:1) at 160°C, 100Pa for 1 hour to generate Cs x FA 1-x PbBr y I 3-y perovskite layer.
[0037] At an intensity of 100mW / cm 2 The photoelectric performance was tested under the simulated solar energy, and the results showed that the solar cell obtained a short-circuit p...
Embodiment 3
[0039] Using FAI / C 2 h 6 Preparation of FAPbI in OS compound atmosphere 3 film. Evaporate 100nmPbI on conductive substrate A 2 , and then react with FAI / DMF (FAI:DMF =20:1) atmosphere at 170°C, 50Pa for 30 minutes to generate FAPbI 3 perovskite thin film. The FAPbI 3 The perovskite film is prepared into a battery device, and the intensity is 100mW / cm 2 The photoelectric performance was tested under the simulated solar energy, and the results showed that the solar cell obtained a short-circuit photocurrent density J sc =22.52mA / cm 2 , open circuit voltage V oc = 1091mV, fill factor FF = 0.721, photoelectric conversion efficiency η = 17.71%; under positive sweep conditions, J sc =21.67mA / cm 2 , V oc =1.087mV, FF=0.731, η=17.21%.
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