Reactive alkali-soluble resin, photosensitive resin composition containing same and application of photosensitive resin composition

A technology of alkali-soluble resin and photosensitive resin, which is applied in the field of light curing, can solve problems such as edge uniformity, low resolution, color photoresist pixels are not resistant to development, and pattern pixel edges are not neat, etc., to achieve good developability, light Good curing performance and alkali solubility, clear pores

Active Publication Date: 2020-06-23
BEIJING ETERNAL MATERIAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the traditional color photoresist is applied to this technology, due to the lack of functional groups contained in the resin, the color photoresist pixel is not resistant to development, the edge is uniform, and the resolution is low.
[0004] CN107870514A discloses a photosensitive resin composition, which is characterized in that it contains: (A) a photosensitive resin containing carboxyl groups; (B) an oxime ester photopolymerization initiator; (C) formed with copper complex compound; (D) a compound having an ethylenically unsaturated group; and (E) an epoxy compound, even if the thickness of the coating film of the photosensitive resin composition is about 10 μm or less, the composition on the copper foil The photosensitivity is also relatively excellent, and a cured product with excellent adhesion to copper foil can be obtained, but there is a problem that the pixel edges of the obtained pattern are not neat
Since the photosensitive resin composition contains a specific alkali-soluble resin, it has excellent developability, high-definition pattern linearity and contour angle, but there is also a problem that the openings are not clear

Method used

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  • Reactive alkali-soluble resin, photosensitive resin composition containing same and application of photosensitive resin composition
  • Reactive alkali-soluble resin, photosensitive resin composition containing same and application of photosensitive resin composition
  • Reactive alkali-soluble resin, photosensitive resin composition containing same and application of photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0083] Synthetic reactive alkali-soluble resin A1 solution:

[0084] (1) In a 1 L flask equipped with a reflux condenser, a dropping funnel, and a stirrer, nitrogen gas was flowed at 0.02 L / min to form a nitrogen atmosphere, 200 g of propylene glycol monomethyl ether acetate was introduced, and the temperature was raised to 100° C., Add methacrylic acid 3.01g (0.035mol), styrene 3.64g (0.035mol), pentaerythritol diacrylate (PET4A) 8.68 g (0.035 mol) was stirred and reacted for 3 hours, and the temperature was lowered to room temperature to obtain a reactive alkali-soluble resin A1 solution.

[0085] (2) After removing part of the solvent, the reaction type alkali-soluble resin A1 solution with a solid content of 38.1% is obtained. The weight average molecular weight of polystyrene conversion measured by GPC is 11500, and the acid value is 102KOH mg / g. The calculated double bond The equivalent weight is 400 g / mol.

preparation example 2

[0087] Synthetic reactive alkali-soluble resin A2 solution:

[0088] (1) The difference with Preparation Example 1 is that pentaerythritol diacrylate Replaced with pentaerythritol triacrylate (PETA) The amount added was 10.43 g (0.035 mol).

[0089] (2) After removing part of the solvent, the reaction type alkali-soluble resin A2 solution with a solid content of 38.5% is obtained, and the weight-average molecular weight converted from polystyrene measured by GPC is 15800, the acid value is 102KOH mg / g, and the calculated double bond equivalent is 500g / mol.

preparation example 3

[0091] Synthetic reaction type alkali-soluble resin solution A3 liquid:

[0092] (1) The difference with Preparation Example 1 is that pentaerythritol diacrylate Replaced with pentaerythritol tetraacrylate (PEDA) The amount added was 12.32 g (0.035 mol).

[0093] (2) After removing part of the solvent, the reaction type alkali-soluble resin A3 solution with a solid content of 38.7% was obtained, and the weight-average molecular weight converted from polystyrene measured by GPC was 19800, the acid value was 101KOH mg / g, and the calculated double bond equivalent is 600g / mol.

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Abstract

The invention provides reactive alkali-soluble resin, a photosensitive resin composition containing the same and application of the photosensitive resin composition. The reactive alkali-soluble resincomprises at least one structural unit (A), at least one structural unit (B) and at least one structural unit (C). The photosensitive resin composition is prepared from the following components in parts by weight: 1 to 30 parts of reactive alkali-soluble resin, 1 to 30 parts of non-reactive alkali-soluble resin and 0.1 to 10 parts of an initiator. The photosensitive resin composition has the characteristics of good development performance, excellent line width, good heat resistance, high resolution, clear opening, tidy pixel edge and the like.

Description

technical field [0001] The invention relates to the field of photocuring technology, in particular to a reactive alkali-soluble resin, a photosensitive resin composition containing the resin and its application. Background technique [0002] Existing liquid crystal panels can be mainly divided into two types according to the structure, that is, the traditional liquid crystal panel composed of a thin film transistor array substrate and a color filter substrate, and a color filter integrated on a thin film transistor array substrate (ColorFilter On Array, ColorFilter On Array, Compared with the traditional liquid crystal panel, the liquid crystal panel using COA technology does not have the problem that the color filter unit and the pixel electrode are not strictly aligned because the color filter is integrated on the array substrate. The aperture ratio of the liquid crystal panel can be increased, and the brightness of the liquid crystal panel can be increased. [0003] Due ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/038G03F7/004C08F222/14C08F220/06C08F212/08G02F1/1335G02F1/1362
CPCG03F7/038G03F7/004G02F1/133514G02F1/1362C08F222/10C08F220/06C08F212/08G02F1/136222
Inventor 侯少堃刘永祥桑伟刘嵩
Owner BEIJING ETERNAL MATERIAL TECH
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