Application of diffusion barrier material, high-temperature coating and preparation method and application thereof, and gas turbine hot end part
A hot-end component and coating technology, which is applied in metal material coating process, coating, ion implantation plating, etc., can solve the problems of anti-oxidant element consumption, coating failure, performance degradation, etc., and achieve high temperature stability and high temperature oxidation resistance, good compactness and thermal stability, simple preparation method
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[0068] The present application also proposes a method for preparing the above-mentioned high-temperature coating, which may include the following steps: preparing an outer layer on the surface of the inner layer.
[0069] For reference, the preparation method of the inner layer may include, but is not limited to, magnetron sputtering, chemical vapor deposition or electron beam evaporation. In actual operation, the above method can be used to prepare the inner layer on the surface of the base alloy.
[0070] As an option, the substrate can be DD5 single crystal superalloy, DD6 single crystal superalloy, DZ22 nickel-based superalloy, DZ125 nickel-based superalloy, K403 nickel-based superalloy, K417 nickel-based superalloy, K423 nickel-based superalloy, IC6 single crystal superalloy or GH605 cobalt-based superalloy.
[0071] Preferably, before preparing the inner layer, the substrate can be cleaned first. For example, the substrate can be degreased and washed. Organic reagents...
Embodiment 1
[0090] The substrate is made of DD5 single crystal superalloy with a size of 20mm×10mm×3mm. Firstly, the magnetron sputtering technology is used to prepare MoSi of about 0.5μm 2 Inner layer, MoSi 2 The purity of the target material is 99.95 wt%. The substrate sample is ultrasonically degreased with acetone, cleaned with absolute ethanol, dried and placed in a vacuum chamber. Magnetron sputtering process parameters: substrate temperature 150°C, argon gas to maintain pressure 0.5Pa, target current 2.0A, pulse bias -100V, ion source current 1.0A. The outer layer of NiAlHfRu of about 70 μm was prepared by arc ion plating, and the preparation parameters of arc ion plating were: substrate temperature 350°C, argon pressure 2Pa, arc current 120A, DC bias voltage -50V, duty cycle 70%.
[0091] In this embodiment, the chemical composition of the NiAlHfRu coating is: Ni content 50 at.%, Al content 49 at.%, Hf content 0.5 at.%, Ru content 0.5 at.%.
[0092] The NiAlHfRu / MoSi obtained a...
Embodiment 2
[0094] The substrate is made of K417 nickel-based superalloy with a size of 20mm×10mm×3mm. Firstly, the magnetron sputtering technology is used to prepare MoSi with a thickness of about 5 μm. 2 inner layer. The substrate sample is ultrasonically degreased with acetone, cleaned with absolute ethanol, dried and placed in a vacuum chamber. Magnetron sputtering process parameters: substrate temperature 150°C, argon gas to maintain pressure 0.3Pa, target current 1.5A, pulse bias -200V, ion source current 1.0A. The outer layer of NiCoCrAlYTa of about 50 μm is prepared by electron beam evaporation plating method, and the preparation parameters are: substrate temperature 800 ° C, vacuum degree 3 × 10 -2 Pa, voltage 20KV, electron gun current 1.5A.
[0095] In this embodiment, the chemical composition of the NiCoCrAlYTa coating is: Co content 18wt.%, Cr content 30wt.%, Al content 10wt.%, Y content 1.5wt.%, Ta content: 2wt.%, the rest is Ni .
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