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Preparation method of polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles

A nanoparticle and polyamide technology, applied in the field of membrane separation, can solve problems such as unstable membrane structure and affecting membrane separation performance

Active Publication Date: 2022-04-01
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the characteristics of inorganic nanomaterials and their compatibility with polyamide-based membranes, it is easy to cause non-selective defects in the membrane, resulting in unstable membrane structure and affecting the separation performance of the membrane.

Method used

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  • Preparation method of polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles
  • Preparation method of polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles

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preparation example Construction

[0016] A preparation method for a polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles, comprising the following steps:

[0017] 1) Dissolving 0.2 to 5 parts by mass of polyamine monomer molecules and 0.01 to 0.2 parts by mass of dopamine biomimetic adhesive in 100 parts by mass of an aqueous solution, and then dissolving 30 to 50 parts by mass of fluoroalkylthiol-containing compounds Add the ethanol solution of the above-mentioned aqueous solution into the above-mentioned aqueous solution, feed oxygen, and react at 15-35° C. for 1-6 hours to obtain an aqueous phase solution containing fluorinated organic nanoparticles;

[0018] 2) Immerse the porous support membrane in the above-mentioned aqueous phase solution containing fluorinated organic nanoparticles for 1 to 30 minutes, take out and remove the excess aqueous phase solution on the surface of the membrane; then immerse it into the organic phase containing polyacyl chloride monome...

Embodiment 1

[0021] Get 0.2g m-phenylenediamine and 0.01g dopamine and dissolve in 100g aqueous solution, then add 30g containing 0.01% 1H,1H,2H,2H-perfluorodecanethiol ethanol solution (concentration of ethanol mass percentage is 90%), pass Inject oxygen, polymerize at 15°C for 6 hours to obtain an aqueous phase solution containing fluorinated organic nanoparticles, immerse the polyethersulfone ultrafiltration membrane in the above aqueous phase solution for 1 minute, take out and remove the excess aqueous phase solution on the surface; Then immerse in the n-hexane solution of trimesoyl chloride with a concentration of 0.05%, carry out the interfacial polymerization reaction for 0.5 minutes, take out and remove the residual organic phase solution on the surface of the film; heat treat at 30°C for 30 minutes, and obtain the polymer containing fluorinated organic nanoparticles. Amide solvent resistant nanofiltration membrane.

[0022]Fluorinated organic nanoparticles polyamide solvent-resis...

Embodiment 2

[0024] Get 5g m-phenylenediamine and 0.2g dopamine and dissolve in 100g aqueous solution, then add 50g containing 0.1% 1H, 1H, 2H, 2H-perfluorodecanethiol ethanol solution (the ethanol mass percentage concentration is 98%), pass into Oxygen, polymerized at 35°C for 1 hour to obtain a water phase solution containing fluorinated organic nanoparticles, soaking the polyethersulfone ultrafiltration membrane in the above water phase solution for 10 minutes, taking out and removing the excess water phase solution on the surface; then Immerse in a 0.5% trimesoyl chloride n-hexane solution, interfacially polymerize for 5 minutes, take out and remove the residual organic phase solution on the surface of the membrane; heat treat at 80°C for 5 minutes to obtain polyamide containing fluorinated organic nanoparticles Solvent resistant nanofiltration membrane.

[0025] Fluorinated organic nanoparticles polyamide solvent-resistant nanofiltration membrane at 25 ℃, 1.5MPa pressure, for differen...

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Abstract

The invention discloses a preparation method of a polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles, using polyamine, dopamine and fluoroalkyl thiol compounds as reactive monomers, through Michael addition and Schiff base reaction The fluorinated organic nanoparticles are formed, and then the polyamide membrane containing the fluorinated organic nanoparticles is formed on the surface of the porous support membrane through an interfacial polymerization reaction with polybasic acid chlorides. Utilizing the low surface energy characteristics of fluorinated organic nanoparticles, regulating the interfacial polymerization process, optimizing the chemical composition, microstructure and hydrophobicity of the polyamide separation layer, and obtaining a polyamide solvent-resistant nanofiltration membrane with a unique pore structure, the prepared membrane It has high separation selectivity and solvent permeation flux, the membrane preparation method is simple and easy to control, and has good industrial application prospects.

Description

technical field [0001] The invention belongs to the field of membrane separation, and in particular relates to a preparation method of a polyamide solvent-resistant nanofiltration membrane containing fluorinated organic nanoparticles. Background technique [0002] Membrane separation technology is an emerging technology that uses separation membrane as the core to separate, concentrate and purify substances. It has developed rapidly since the 1960s. For the pressure-driven membrane separation process, according to the size of the membrane pores, operating pressure and molecular weight cut-off, it can be divided into microfiltration, ultrafiltration, nanofiltration and reverse osmosis. At present, the separation and purification of most modern industrial products such as petroleum, fine chemicals, food, biomedicine and other substances usually need to be carried out in a system containing organic solvents. In the pursuit of sustainable and efficient separation process, solven...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D71/56B01D71/82B01D69/02B01D67/00B01D65/10B01D61/08B01D61/02
CPCB01D71/56B01D71/82B01D69/02B01D67/0002B01D67/0006B01D65/10B01D61/08B01D61/027B01D2325/30
Inventor 计艳丽顾冰心卢洪浩高从堦
Owner ZHEJIANG UNIV OF TECH
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