Preparation method of porous bismuth vanadate film photo-anode
A technology of porous bismuth vanadate and photoanode, applied in electrodes, electrode shape/type, electrolysis process, etc., can solve the problems of low carrier separation efficiency and low photohydrogen conversion efficiency of pure bismuth vanadate photoanode
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Embodiment 1
[0038] 1. Preparation of bismuth oxyiodide seed layer
[0039] Bi(NO 3 ) 3 ·5H 2 O and KI were dissolved in a mixed solvent of ethylene glycol and acetic acid with a volume ratio of 2:1 at a molar ratio of 1:1 to prepare a bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.1 mol / L. The 20mm×20mm FTO glass substrate was ultrasonically cleaned in water, ethanol and acetone for 20 minutes respectively, and dried with nitrogen gas, and then the bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.1mol / L was dropped on the FTO glass substrate. Spin coating on the bottom, during the spin coating process, rotate at 2500r / min for 5s and 3000r / min for 30s at a high speed, so that the precursor solution is evenly coated on the FTO glass substrate. Then the FTO glass substrate was quickly dried on a hot stage at 200°C and immersed in water at 55°C for 10 minutes. Finally, it was taken out and dried with nitrogen and placed in an oven at 70...
Embodiment 2
[0045] In step 2 of this embodiment, the bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.3 mol / L is used to replace the bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.2 mol / L in Step 2 of Example 1, and the other steps are the same as Same as in Example 1, a porous bismuth vanadate thin film photoanode was obtained.
Embodiment 3
[0047] In step 2 of this embodiment, the bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.35 mol / L is used to replace the bismuth oxyiodide precursor solution with a bismuth ion concentration of 0.2 mol / L in Step 2 of Example 1, and the other steps are the same as Same as in Example 1, a porous bismuth vanadate thin film photoanode was obtained.
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