Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Device and method for preparing high-toughness amorphous carbon based multiphase hybrid film

An amorphous carbon, strengthening and toughening technology, applied in the field of devices for preparing toughened amorphous carbon-based multi-phase hybrid films, can solve low toughness, affect service life and efficiency, low film-base adhesion strength, etc. question

Active Publication Date: 2020-10-30
TAIYUAN UNIV OF TECH
View PDF9 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the amorphous carbon film often peels off and fails due to high residual stress, which leads to low film-substrate adhesion strength and low toughness, which seriously affects its service life and efficiency.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Device and method for preparing high-toughness amorphous carbon based multiphase hybrid film
  • Device and method for preparing high-toughness amorphous carbon based multiphase hybrid film
  • Device and method for preparing high-toughness amorphous carbon based multiphase hybrid film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] The multi-excitation source plasma coating device used in the present invention to prepare the toughened amorphous carbon-based multi-phase hybrid film has a structure such as figure 1As shown, it includes a vacuum chamber 1, a DC cathodic arc source 2, a pulsed cathodic arc source 3, a radio frequency magnetron sputtering source 4, and an ion source 5; a set of magnetic separation units 6 and DC cathodic arc source 2, pulse cathodic arc source 3 is installed on the right side; ion source 5 and observation window 7 are installed on the vacuum chamber door; radio frequency magnetron sputtering source 4 is installed on the right side wall of vacuum chamber 1, and there is a The air extraction channel 8 is connected to the vacuum device 9 outside the air extraction channel 8 . The bottom of the vacuum chamber is equipped with a circular rotating sample stage 10, and the lower end of the sample stage is connected to a bias power supply 11 outside the vacuum chamber 1; the b...

Embodiment 2

[0048] This embodiment provides a method for preparing a toughened amorphous carbon-based multi-phase hybrid film on a TC4 titanium alloy substrate using the device described in Embodiment 1, comprising the following steps:

[0049] (1) Substrate surface treatment: first, the ground and polished titanium alloy substrate was washed with soapy water and deionized water, and then ultrasonically cleaned in acetone solution and absolute ethanol solution for 10 min respectively to remove the surface grease and other pollutants, and then put the substrate in an oven to dry for use;

[0050] (2) Fix the pretreated titanium alloy substrate on the rotating sample stage in the vacuum chamber of the multi-excitation source plasma device, and install the high-purity titanium target and graphite target on the evaporators of DC cathodic arc and pulsed cathodic arc respectively, The high-purity aluminum target is installed on the RF magnetron sputtering target head;

[0051] (3) Use a vacuum...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Elastic modulusaaaaaaaaaa
Login to View More

Abstract

The invention discloses a device and a method for preparing a high-toughness amorphous carbon based multiphase hybrid film. The device is a radio frequency magnetron sputtering auxiliary direct current and pulse cathode arc multi-excitation-source plasma coating device. The preparation method comprises the following steps: drying a pretreated substrate, placing the substrate on a rotary sample table of a multi-excitation-source plasma coating device; vacuumizing, filling argon in a vacuum chamber, and carrying out sputtering washing on the surface of the substrate by using an ion source; and taking high-purity metal aluminum, titanium and graphite flakes as magnetron sputtering target materials and direct current and pulse cathode arc evaporation target materials, filling argon gas and nitrogen gas, designing a multiphase hybrid film structure according to formation laws of nanocrystals and amorphous phases, adjusting the rotating speed of the sample table, and introducing functional doped elements and a gradient intermediate layer by using a multi-excitation-source plasma technology to prepare the amorphous carbon based multiphase hybrid film. The prepared amorphous carbon based multiphase hybrid film is adjustable in structure and controllable in phase composition distribution, and has high hardness, high adhesion strength and high toughness.

Description

technical field [0001] The invention relates to a device and method for preparing a toughened amorphous carbon-based multi-phase hybrid film, belonging to the technical field of material surface modification. Background technique [0002] Surface coating treatment of friction and wear parts is one of the effective measures to reduce waste of resources and energy. Amorphous carbon film has excellent characteristics such as high hardness, high elastic modulus, low friction coefficient, good corrosion resistance and wear resistance, and can be widely used in friction units such as mechanical parts, tools (moulds), electronics and medical equipment Surface functional and protective layers. However, during use, amorphous carbon films often peel off and fail due to high residual stress, which leads to low film-substrate adhesion strength and low toughness, seriously affecting their service life and efficiency. The residual stress of the amorphous carbon film is mutually restrict...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C14/32C23C14/16C23C14/02C23C14/35C23C14/50C23C14/06C23C14/56
CPCC23C14/325C23C14/16C23C14/022C23C14/35C23C14/165C23C14/0036C23C14/505C23C14/0605C23C14/56
Inventor 周兵刘竹波吴玉程黑鸿君高洁吴艳霞王永胜于盛旺
Owner TAIYUAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products