Device and method for preparing high-toughness amorphous carbon based multiphase hybrid film
An amorphous carbon, strengthening and toughening technology, applied in the field of devices for preparing toughened amorphous carbon-based multi-phase hybrid films, can solve low toughness, affect service life and efficiency, low film-base adhesion strength, etc. question
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Embodiment 1
[0037] The multi-excitation source plasma coating device used in the present invention to prepare the toughened amorphous carbon-based multi-phase hybrid film has a structure such as figure 1As shown, it includes a vacuum chamber 1, a DC cathodic arc source 2, a pulsed cathodic arc source 3, a radio frequency magnetron sputtering source 4, and an ion source 5; a set of magnetic separation units 6 and DC cathodic arc source 2, pulse cathodic arc source 3 is installed on the right side; ion source 5 and observation window 7 are installed on the vacuum chamber door; radio frequency magnetron sputtering source 4 is installed on the right side wall of vacuum chamber 1, and there is a The air extraction channel 8 is connected to the vacuum device 9 outside the air extraction channel 8 . The bottom of the vacuum chamber is equipped with a circular rotating sample stage 10, and the lower end of the sample stage is connected to a bias power supply 11 outside the vacuum chamber 1; the b...
Embodiment 2
[0048] This embodiment provides a method for preparing a toughened amorphous carbon-based multi-phase hybrid film on a TC4 titanium alloy substrate using the device described in Embodiment 1, comprising the following steps:
[0049] (1) Substrate surface treatment: first, the ground and polished titanium alloy substrate was washed with soapy water and deionized water, and then ultrasonically cleaned in acetone solution and absolute ethanol solution for 10 min respectively to remove the surface grease and other pollutants, and then put the substrate in an oven to dry for use;
[0050] (2) Fix the pretreated titanium alloy substrate on the rotating sample stage in the vacuum chamber of the multi-excitation source plasma device, and install the high-purity titanium target and graphite target on the evaporators of DC cathodic arc and pulsed cathodic arc respectively, The high-purity aluminum target is installed on the RF magnetron sputtering target head;
[0051] (3) Use a vacuum...
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