In-situ preparation method and application of super-hydrophobic titanium film
An in-situ preparation and titanium thin film technology, which is applied in the field of metal surface engineering, can solve the problems of easy damage, poor substrate bonding, and affecting hydrophobicity, and achieve the effect of simple operation, low cost, and not easy to be damaged by mechanical effects
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Embodiment 1
[0032] (1) Substrate preparation: Place the cut single-sided polished silicon wafers in acetone, ethanol and deionized water respectively for 15 minutes for ultrasonic cleaning, and the ultrasonic frequency is 100 Hz;
[0033] (2) Then fix the silicon wafer substrate cleaned in step (1) on the baffle, put it into the sample delivery room of the radio frequency magnetron sputtering equipment, and carry out vacuuming with a degree higher than 5×10 -3 Torr, then turn off the chamber vacuum pump;
[0034] (3) Target pre-sputtering: Pre-sputtering is performed on the titanium target, the titanium target is pure titanium with a purity of 99.99%; the vacuum degree of the chamber during pre-sputtering is higher than 2×10 -7 Torr, the voltage is 50V, the flow rate of high-purity argon gas is 20sccm, the working pressure is 3mTorr, the sputtering time is 30min, and the chamber temperature is cooled to 20°C after the sputtering is completed;
[0035] (4) Sample delivery: open the gate b...
Embodiment 2
[0042] The preparation process is the same as in Example 1, except that the heat treatment time is increased to 10s. The characterization method of the titanium film is the same as in Example 1, with a contact angle of 156° and a hardness of 8GPa.
Embodiment 3
[0044] The preparation process is the same as in Example 1, except that the heat treatment time is increased to 15s. The characterization method of the titanium film is the same as in Example 1, with a contact angle of 166° and a hardness of 8.5GPa.
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