Chain type wet etching equipment for TOPCon battery

Abstract

The invention discloses chain type wet etching equipment for a TOPCon battery. The chain type wet etching equipment comprises five functional areas and a conveying device penetrating through each functional area; the five functional areas are a first acid washing area, a first alkali washing area, a second acid washing area, a second alkali washing area and a third acid washing area; solutions ofthe first acid washing area, the second acid washing area and the third acid washing area are hydrofluoric acid solutions; solutions of the first alkali washing area and the second alkali washing areaare sodium hydroxide or potassium hydroxide solutions; and a to-be-etched silicon wafer sequentially passes through the first acid washing area, the first alkali washing area, the second acid washingarea, the second alkali washing area and the third acid washing area through the conveying devices. According to the chained wet etching equipment, an edge is isolated while winding polycrystalline silicon is removed, so that the production continuity of a TOPCon battery is realized, and meanwhile, the conversion efficiency of the battery is improved; the equipment is high in automation degree, high in productivity and suitable for large-scale production requirements; and the equipment is easy to realize and low in cost.

Description

technical field [0001] The invention relates to a chain type wet etching equipment, in particular to a chain type wet etching equipment used for TOPCon batteries. Background technique [0002] In the field of crystalline silicon solar cell manufacturing, chain-type wet-process equipment is widely used due to the advantages of low equipment manufacturing cost, high output, and stable process effect. Common chain-type wet-processing equipment includes chain-type texturing equipment, chain-type acid etching equipment, chain-type phosphorus-silicate glass (PSG) equipment, etc. Chain texturing equipment is usually used for single-sided texturing of silicon wafers, chain acid etching equipment is usually used for back polishing of battery semi-finished products, and chain-type dephosphorous silicon glass equipment is usually used for single-sided phosphorus removal of battery semi-finished products. Removal of silica glass. [0003] With the update and development of crystalline...

AI Technical Summary

Problems solved by technology

TOPCon cells passivate the back of the silicon wafer with a tunneling oxide layer and a doped polysilicon layer, which can greatly improve the performance of the battery. However, when making doped polysilicon, a wrap-around polysilicon will be formed on the front of the silicon wafer, and leakage will be formed on the side of the silicon wafer. area, greatly impairing battery performance

[0004] At present, in the production process of TOPCon cells, multi-step wet chemical treatment methods are usually used to remove the polysilicon plating and isolate the edge of the silicon wafer. The process switching procedure is complicated and cannot be realized continuously by a single device, and the degree of automation is low.

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