Semiconductor element for thermoelectric module of real-time fluorescent quantitative PCR instrument
A semiconductor and component technology, which is applied in the field of semiconductor components for thermoelectric modules of real-time fluorescent quantitative PCR instruments, can solve problems such as potential difference increase, and achieve good thermoelectric conversion, high bending strength, and excellent thermoelectric performance.
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[0033] In some embodiments of the invention, a method of preparing a semiconductor element comprising the steps of:
[0034] Sncl by weight 2 · 2h 2 O Soluble in 100 to 150 parts by weight of unhappy ethanol, so that SN 2+ The concentration is 0.25 ~ 75mol / L, reflows from 85 to 100 ° C for 10 to 14 h, then press SN 4+ : SR 2+ : M 4+ = 1-A-B: 2A: B Add SRCL 2 · 6h 2 O, MCL 4 Among them, 0.1 ≤ a <0.3, 0.2 ≤ b <0.5; one of the metal M is Ti, Zr, and HF, continues to return to flow from 85 to 100 ° C for 10 to 14 h, and Chenhua 22 ~ 35 ° C 28h to get a sol;
[0035] Using the impregnation-pull process, the ceramic substrate was sequentially washed with a concentration of 10%, distilled water, anhydrous ethanol, dried at 45 to 55 ° C for 2 to 3 h, and then impregnated after the above sol 1 ~ 3min, vertical Take a smooth pulling 3 to 6 times, then dried at 75 to 100 ° C for 20 to 30 min, then heat treatment at 550 to 650 ° C for 2 to 4 h, and the nanoparticle film was obtained;
[003...
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[0040] Example 1
[0041] A method of preparing a semiconductor element, comprising the steps of:
[0042]Sncl by weight 2 · 2h 2 O Soluble in 120 parts by weight of anhydrous ethanol, so that SN 2+ The concentration is 0.45 mol / L, reflows back at 90 ° C for 10 h, then press SN 4+ : SR 2+ : HF 4+ = 0.6: 0.2: 0.3 proportion Add SRCL 2 · 6h 2 O, HFCL 4 Continue to return to flow at 90 ° C for 12 h at 30 ° C for 24 hours, resulting in a sol;
[0043] The impregnation-pull process is used to clean the dimensions of 20 mm × 10 mm × 4 mm, and the concentration is 10% dilute hydrochloric acid, distilled water, and no water ethanol is sequentially washed, and 3 h is dried at 45 ° C, then impregnated After the above sol 1min, vertically smoothly tied 5 times, then dried at 85 ° C for 20 min, then heat treatment at 550 ° C for 4 h, prepared (SN 0.6 SR 0.2 HF 0.3 ) O 2 Nano particulate membrane;
[0044] The weight ratio of the silver paste and the turbine is diluted with a weight ratio of...
Example Embodiment
[0045] Example 2
[0046] A method of preparing a semiconductor element, comprising the steps of:
[0047] Sncl by weight 2 · 2h 2 O Soluble in 140 parts by weight of anhydrous ethanol, so that SN 2+ The concentration is 0.65mol / L, reflows in 12 h at 100 ° C, then press SN 4+ : SR 2+ : HF 4+ = 0.4: 0.4: 0.4 proportion of 0.4 Add SRCL 2 · 6h 2 O, HFCL 4 , Continued to return to flow at 100 ° C for 12 h, and Chenhua at 32 ° C for 26 h, resulting in a sol;
[0048] The impregnation-pull process is used, and the size of a β-silicon nitride ceramic substrate having a size of 20 mm × 10 mm × 4 mm is washed sequentially by a concentration of 10%, distilled water, anhydrous ethanol, and dried at 50 ° C for 2.5 h, then After immersing in the above sol 2min, vertically stable four times, then dried at 90 ° C for 25 min, then heat treatment at 600 ° C for 3 h, resulting in (SN 0.4 SR 0.4 HF 0.4 ) O 2 Nano particulate membrane;
[0049] The weight ratio of the silver paste and the turbine i...
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