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Preparation method of low-resistance high-transparency conductive film

A transparent conductive film, low-resistance technology, used in cable/conductor manufacturing, conductive materials dispersed in non-conductive inorganic materials, conductive layers on insulating carriers, etc. Process application and other issues

Active Publication Date: 2021-07-09
佳雅威海新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the light transmittance of the transparent conductive film prepared by this scheme is relatively low, so it will greatly affect the application of subsequent processes.

Method used

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  • Preparation method of low-resistance high-transparency conductive film
  • Preparation method of low-resistance high-transparency conductive film
  • Preparation method of low-resistance high-transparency conductive film

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0052] Embodiment 1: A kind of low resistance high transparent conductive film:

[0053] This embodiment provides a low-resistance and high-transparency conductive film, which is specifically prepared by the following method:

[0054] 1): 5g dry hemicellulose (weight average molecular weight 25000, dispersion coefficient 1.2) is dispersed in 200mL50 ℃ deionized water, add 15g2% sodium hydroxide solution for constant temperature alkalinization reaction for 10min; then add 5g sodium chloroacetate and heat up to At 68°C, add 25g of 2% sodium hydroxide solution for constant temperature etherification reaction for 75 minutes, neutralize the reaction system with 2% acetic acid solution to neutrality, wash with absolute ethanol, and then freeze-dry for 7 days to obtain carboxymethyl hemicellulose ;

[0055] 2): Prepare graphene dispersion, add urea according to the weight ratio of graphene and urea 1:5, completely dissolve and react with hydrothermal reaction at 160°C for 12h, take ...

Embodiment 2

[0059] Embodiment 2: A kind of low resistance high transparent conductive film:

[0060] This embodiment provides a low-resistance and high-transparency conductive film, which is specifically prepared by the following method:

[0061] 1): 5g dry hemicellulose (weight average molecular weight 27000, dispersion coefficient 1.5) is dispersed in 200mL60 ℃ deionized water, add 25g 2% sodium hydroxide solution for constant temperature alkalinization reaction for 20min; then add 10g sodium chloroacetate and heat up to Add 40g of 2% sodium hydroxide solution at 68°C for constant temperature etherification reaction for 90 minutes, neutralize the reaction system to neutral with 4% acetic acid solution, wash with absolute ethanol after precipitation, dialyze for 7 days, and then freeze-dry to obtain carboxymethyl hemicellulose ;

[0062] 2): Prepare graphene dispersion liquid, add urea according to the weight ratio of graphene and urea 1:10, completely dissolve and react in hydrothermal...

Embodiment 3

[0066] Embodiment 3: a kind of low resistance high transparent conductive film:

[0067] This embodiment provides a low-resistance and high-transparency conductive film, which is specifically prepared by the following method:

[0068]1): 5g of dried hemicellulose (weight average molecular weight 27000, dispersion coefficient 1.5) was dispersed in 200mL of 55°C deionized water, 20g of 1.5% sodium hydroxide solution was added for constant temperature alkalinization reaction for 15min; then 8g of sodium chloroacetate was added and Raise the temperature to 66°C, add 32g of 1.5% sodium hydroxide solution for constant temperature etherification reaction for 90 minutes, neutralize the reaction system with 3% acetic acid solution to neutrality, wash with absolute ethanol after precipitation, dialyze for 7 days, and freeze-dry to obtain carboxymethyl base hemicellulose;

[0069] 2): Prepare graphene dispersion liquid, add urea according to the weight ratio of graphene and urea 1:12, c...

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Abstract

The invention relates to a conductive material technology, and particularly relates to a preparation method of a low-resistance high-transparency conductive film. The method comprises the following steps: performing carboxymethylation on hemicellulose through an etherification reaction, preparing an alkaline urine solution of hemicellulose, adding graphene to prepare gel, and performing hot press molding to obtain the conductive film. The conductive film prepared from carboxymethyl hemicellulose and graphene has excellent toughness, conductivity and visible light transmittance, high density and excellent mechanical properties, the conductivity of the conductive film is not obviously attenuated after the conductive film is bent for multiple times, the conductive film can be repeatedly utilized, and the cost is remarkably reduced.

Description

technical field [0001] The invention relates to conductive material technology, in particular to a preparation process of a conductive film, in particular to a preparation method of a low-resistance and high-transparency conductive film. Background technique [0002] Generally speaking, conductive film is a thin film with conductive function. Highly transparent conductive film is a thin film that can conduct electricity and has high transparency in the visible light range. It mainly includes metal film systems, oxide film systems, and other compound film systems. , polymer film system, composite film system, etc. Conductive films are widely used in fields such as flat-panel TVs, touch screens, smart window glass, light-emitting diodes, and photovoltaic cells. Among the transparent conductive films, the most widely used one is Indium-Tin Oxide transparent conductive film glass (ITO film). As early as 1968, Philips used indium acetate and tin chloride through spray pyrolysis....

Claims

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Application Information

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IPC IPC(8): H01B13/00H01B1/22H01B5/14
CPCH01B13/00H01B1/22H01B5/14Y02P70/50
Inventor 赖强
Owner 佳雅威海新材料科技有限公司
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