Sand-dust-resistant high-hardness multispectral aluminum nitride film system and preparation method thereof
A technology of aluminum nitride film and high hardness, applied in optics, optical components, ion implantation plating, etc., can solve difficult problems, achieve high stability, solve high absorption characteristics, and high N element doping ratio Effect
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Embodiment 1
[0036] The preparation method of the sand-dust-resistant high-hardness multi-spectral aluminum nitride film system of the embodiment of the present invention includes the following steps:
[0037] S1. Cleaning of optical components. The purpose of cleaning is to obtain a smooth surface of optical components;
[0038] S2. The cleaned optical element is used as a substrate, and an optical transition matching layer is coated on it, and the optical transition matching layer includes a multi-layer film structure. It has high optical transmittance in the range of visible light 700nm ~ 1000nm, near infrared 1064nm and medium wave infrared 3.7μm ~ 4.8μm;
[0039] S3, preparing a high-hardness, multi-spectral aluminum nitride thin film on the optical transition matching layer.
[0040] The preparation method also includes S4, the step of testing the optical hardness index of the prepared aluminum nitride film, mainly to test the optical hardness index, and various methods can be used ...
Embodiment 2
[0043] On the basis of Example 1, in Example 2, a high-hardness AlN protective film system is prepared on the surface of the cleaned optical element by ion-assisted electron beam evaporation deposition or magnetron sputtering, including the following steps:
[0044] 1) Cleaning of optical components: Place the optical components as the base in an ultrasonic cleaning line for non-destructive cleaning to remove surface residues. During the cleaning process, heat to 45°C-55°C and clean for 1min-2min. After cleaning, use isopropanol Dehydration and drying to obtain a smooth surface of optical components;
[0045]2) Transition layer plating: An optical transition layer is prepared between the substrate and the outermost AlN protective film, which effectively solves the risk of film stripping caused by the high stress of the film layer. According to the requirements of optical properties, the optical transition layer adopts Ta 2 o 5 , SiO 2 As high and low refractive index materi...
Embodiment 3
[0051] A newly polished sapphire lens with a size of Φ100mm×5mm is used. After the polishing is completed and the surface finish is judged to be better than grade V, the preparation process of AlN thin film is started. The process flow is as follows figure 1 shown. The detailed steps are as follows:
[0052] 1) Optical component cleaning: place the sapphire in an ultrasonic cleaning line for non-destructive cleaning to remove surface residues. The temperature of the lotion cleaning process is kept at 50°C, and the cleaning time is 1.5 minutes. After the cleaning is completed, enter the pure water tank for rinsing. After the rinsing is completed, use pure water to rinse. The temperature of the pure water rinsing is set to 45° C., and 3 tanks are cleaned, and the cleaning time of each tank is 1 min. After rinsing with pure water, enter isopropanol for dehydration and spin dry. After the spin is completed, it is judged that the smoothness of the sapphire substrate is better tha...
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Abstract
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