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Acid pore-conditioning agent and surface metallization treatment process method of inorganic non-metal base material

An acidic and porogen technology, applied in metal material coating process, liquid chemical plating, coating, etc., can solve problems such as uneven copper plating on the surface, achieve good corrosion inhibition effect, simple control, and reduce the average The effect of roughness

Pending Publication Date: 2022-02-08
深圳市天熙科技开发有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the object of the present invention is to provide an acidic pore conditioner and a surface metallization treatment process for inorganic non-metallic substrates, which solves the problem of uneven copper plating on the surface

Method used

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  • Acid pore-conditioning agent and surface metallization treatment process method of inorganic non-metal base material

Examples

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preparation example Construction

[0028] (1) Preparation of acidic pore modifier: add ionic liquid, organic acid and repairing agent to deionized water, stir and mix uniformly to obtain acidic pore modifier, wherein the preparation method of ionic liquid comprises the following steps:

[0029] Trioctylamine and dodecyl bromide are added to the DMF solvent, and reflux reaction is carried out under the protection of nitrogen. After the reaction is completed, the reaction product is cooled to room temperature, left standing, solid-liquid separation, ethyl acetate recrystallization, namely A white solid was obtained, and then the white solid and lithium bistrifluoromethanesulfonylimide were added to methanol solvent, the reaction was stirred, then cooled to room temperature, the organic phase was dried, the solvent was concentrated, dichloromethane was added, and washed with deionized water , concentrating the solvent to obtain a colorless viscous liquid, and then vacuum-drying the colorless viscous liquid to obtai...

Embodiment 1

[0048]Add 200 g of ionic liquid bistrifluoromethanesulfonimide trioctyldodecylammonium, 10 g of acetic acid, 10 g of glycolic acid, 10 g of hydroxyethylidene diphosphonic acid and 1 g of graphene oxide into 1 L of deionized water, stir and mix well , to obtain an acidic pore modifier;

[0049] Heat the prepared pore adjusting agent to 50°C for later use, and process the through-hole copper-clad laminate with a thickness of 2.0mm to be tested according to the hole metallization process of the aforementioned steps a~i. After the copper plating is completed, dry the sample for Test evaluation.

Embodiment 2

[0051] Add 300 g of ionic liquid bistrifluoromethanesulfonimide trioctyltetradecyl ammonium, 20 g of methanesulfonic acid, 10 g of citric acid, 10 g of hydroxyethylene diphosphonic acid, and 2 g of graphene oxide into 1 L of deionized water, Stir and mix evenly to obtain an acidic pore modifier;

[0052] Heat the prepared pore adjusting agent to 50°C for later use, and process the through-hole copper-clad laminate with a thickness of 2.0mm to be tested according to the hole metallization process of the aforementioned steps a~i. After the copper plating is completed, dry the sample for Test evaluation.

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Abstract

The invention discloses an acidic pore-conditioning agent and a surface metallization treatment process method of an inorganic non-metal base material. According to the invention, adsorption of introduced ionic liquid on a surface of a PCB follows a Langmuir adsorption model, and the adsorption of the ionic liquid on the PCB is mainly physical adsorption; the ionic liquid is a cathode type corrosion inhibitor and a surfactant, can be used as an active agent of the PCB, can be especially applied to chemical copper plating of a horizontal continuous conveying operation mode, can improve the metallization quality of high-performance circuit board holes, and has an excellent corrosion inhibition effect; graphene oxide is adopted as a repairing agent, and the ultrahigh specific surface area and the nanometer property of the graphene oxide are utilized, so that average roughness of a PCB face is effectively reduced, and surfaces of PCB layer holes become flat; and organic acid which is easier to clean is used, the organic acid is not prone to causing residues compared with alkaline substances, the cleaning effect of the organic acid on oxides on a copper surface of the circuit board is better, and binding force of a plating layer and the copper surface can be improved.

Description

technical field [0001] The invention relates to the technical field of preparation of inorganic non-metal substrates, in particular to an acidic pore modifier and a surface metallization treatment process for inorganic non-metal substrates. Background technique [0002] The inorganic non-metallic substrate is the printed circuit board, referred to as the printed circuit board. The insulating board is the basic material for PCB production. The printed board is cut into a certain size. There are many conductive patterns on the board, and there are many patterns on the cloth. Holes are used to replace the chassis for installing electronic components or integrated circuits, so as to realize the interconnection of electronic components. [0003] As the core process of printed circuit board manufacturing, the hole metallization process mainly uses electroless copper plating and electroplating copper to plate a conductive layer on the insulating PCB hole wall to connect the interla...

Claims

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Application Information

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IPC IPC(8): C23C18/38H05K3/42
CPCC23C18/38H05K3/422
Inventor 张磊王运太姚艳
Owner 深圳市天熙科技开发有限公司