PCB production process based on laser direct writing exposure
A production process and laser direct writing technology, which are applied in microlithography exposure equipment, photolithography process of pattern surface, photolithography process exposure device, etc., can solve problems such as high cost and poor heat dissipation effect, and improve product quality. , scientific and reasonable design, high efficiency
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Embodiment 1
[0029] A PCB production process based on laser direct writing exposure, specifically including the following steps:
[0030] S1. Vacuum lamination: stack the layers of the PCB board in order, and place the stacked layers under the vacuum sub-lamination machine for vacuum lamination. Control the vacuum lamination temperature to ≤20°C and the vacuum degree to -0.1 MPa, repeatedly press the stacked boards until the thickness of the boards does not change, and perform cutting, filleting, chamfering and drilling on the laminated boards;
[0031] S2. Horizontal copper sinking: Deburr the opening of the pressed copper clad laminate, and soak it in the degreasing liquid to remove the oil stains. When degreasing, ensure that the concentration of the degreasing liquid backflow cycle is uniform, and then clean the base material at the drilled hole Open micro pits with a roughening solution, place the copper clad laminate horizontally in the copper sinking tank, pre-plate copper through c...
Embodiment 2
[0047] The difference between this embodiment and embodiment 1 is:
[0048] The copper plating solution for electrochemical copper plating is: copper sulfate 20g / L, sulfuric acid 5g / L, sodium polydisulfide dipropane sulfonate 2g / L, sodium tartrate 10g / L, formaldehyde 3g / L, sodium citrate 10g / L , a mixture of artificial plasma 25g / L, ammonium bromide 10g / L and deionized water.
[0049] The copper solution for VCP electroplating is a mixture of copper sulfate 45g / L, potassium dihydrogen phosphate 20g / L, dipotassium hydrogen phosphate 15g / L, artificial plasma 25g / L, ammonium bromide 10g / L and deionized water.
[0050] The special copper plating brightener for VCP electroplating is: copper sulfate 4.5g / L, zinc sulfate 50g / L, sulfuric acid 50g / L, saccharin 1.5g / L, citric acid 5g / L, diamine blue 0.015g / L, twelve A mixture of sodium alkylsulfonate 4g / L, sodium lauryl sulfate 2g / L and deionized water.
[0051] The positive and negative current ratio of VCP plating is 1:1, the positi...
Embodiment 3
[0057] The copper plating solution for electrochemical copper plating is: copper sulfate 50g / L, sulfuric acid 5g / L, sodium polydisulfide dipropane sulfonate 5g / L, sodium tartrate 10g / L, formaldehyde 8g / L, sodium citrate 5g / L , a mixture of artificial plasma 25g / L, ammonium bromide 5g / L and deionized water.
[0058] The copper solution for VCP electroplating is a mixture of copper sulfate 30g / L, potassium dihydrogen phosphate 20g / L, dipotassium hydrogen phosphate 10g / L, artificial plasma 25g / L, ammonium bromide 5g / L and deionized water.
[0059] The special copper plating brightener for VCP electroplating is: copper sulfate 4.5g / L, zinc sulfate 50g / L, sulfuric acid 100g / L, saccharin 1.5g / L, citric acid 5g / L, diamine blue 0.005g / L, twelve A mixture of sodium alkylsulfonate 4g / L, sodium lauryl sulfate 2g / L and deionized water.
[0060] The positive and negative current ratio of VCP plating is 1:1, the positive and negative current time is 1:1, the VCP plating temperature is cont...
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