Organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compound and preparation method thereof

A technology of organotin and clusters, which is applied in the field of organotin-inorganic tin hybrid Sn18 crystalline tin-oxygen clusters and its preparation, which can solve the problems of structural diversity and insufficient functionality

Pending Publication Date: 2022-03-11
山西师范大学
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Although there have been some reports on tin-oxygen clusters, as candidate materials for photoresists, their structural diversity and functionality are still far from enough. It is necessary to develop more materials that meet the requirements of photoresists according to the needs. Tin-oxygen cluster candidate materials for further development in lithography

Method used

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  • Organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compound and preparation method thereof
  • Organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compound and preparation method thereof
  • Organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compound and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] 5mmol benzoic acid, 0.5mmol phenylphosphonic acid, 0.1mmol SnCl 4 ·5H 2 O, 1 mmol of butyl stannoic acid and 7.5 mL of acetonitrile, water, and isopropanol mixed solution were loaded into a hydrothermal reaction kettle, and reacted at 100° C. for 3 days. The resulting mixed solution was filtered to obtain colorless blocky crystals. Washed with acetonitrile, filtered, and dried at room temperature, the organic tin-inorganic tin hybrid Sn 18 type crystalline tin-oxygen clusters with a yield of 78% (as SnCl 4 ·5H 2 O meter).

[0043] The analysis of the single crystal diffraction data of the colorless bulk crystal prepared in this example shows that the molecular formula of the complex is [(BuSn) 12 sn 6 (μ 3 -O) 20 (PhCO 2 ) 12 (PhPO 3 ) 4 ], the molecular weight is 5219.35, and the crystallographic data is α=90°, β=94.0540(10)°, γ=90°, Z=4, monoclinic system, P2 1 / c space group. Crystal structure such as figure 1 shown. In the crystal structure 18 Sn...

Embodiment 2

[0048] 5mmol p-toluic acid, 0.5mmol phenylphosphonic acid, 0.1mmol SnCl 4 ·5H 2 0, 1mmol of butyl stannoic acid and 7.5mL of acetonitrile, water, and isopropanol mixed solution were loaded into a hydrothermal reactor, and reacted for 4 days at 100°C. The resulting mixed solution was filtered to obtain colorless blocky crystals. Washed with acetonitrile, filtered, and dried at room temperature, the organic tin-inorganic tin hybrid Sn 18 type crystalline tin-oxygen cluster compound with a yield of 76% (as SnCl 4 ·5H 2 O meter).

[0049] The analysis of the single crystal diffraction data of the colorless bulk crystal prepared in this example shows that the molecular formula of the complex is [(BuSn) 12 sn 6 (μ 3 -O) 20 (4-MePhCO 2 ) 12 (PhPO 3 ) 4 ]·2CH 3 CN·2H 2 O, the molecular weight is 5500.21, the crystallographic data is α=76.2874(13)°, β=88.5702(11)°, γ=62.2587(15)°, Z=2, triclinic crystal system, space group P-1. Crystal structure such as Figure 5 ...

Embodiment 3

[0054] 5mmol p-tert-butylbenzoic acid, 0.5mmol phenylphosphonic acid, 0.1mmol SnCl 4 ·5H 2 O. 1mmol of butyl stannoic acid and 7.5mL of acetonitrile, water, and isopropanol mixed solution were charged into a hydrothermal reactor, and reacted at 100°C for 3 days. The resulting mixed solution was filtered to obtain colorless blocky crystals. Washed with acetonitrile, filtered, and dried at room temperature, the organic tin-inorganic tin hybrid Sn 18 type crystalline tin-oxygen cluster compound with a yield of 73% (as SnCl 4 ·5H 2 O meter).

[0055] In this example, the analysis of the diffraction data of the prepared colorless block crystal single crystal shows that the molecular formula of the complex is [(BuSn) 12 sn 6 (μ 3 -O) 20 (4-t-BuPhCO 2 ) 12 (PhPO 3 ) 4 ]·2CH 3 CN 2iPrO H 2H 2 O, the molecular weight is 6067.41, the crystallographic data is α=82.1576(12)°, β=80.6499(11)°, γ=67.7108(11)°, Z=2, triclinic crystal system, P-1 space group. Crystal str...

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Abstract

The invention discloses an organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compound and a preparation method thereof, and belongs to the field of inorganic chemistry. Substituted benzoic acid, phenylphosphonic acid, SnCl4. 5H2O and butylstannic acid are used as raw materials, acetonitrile, isopropanol and water are used as a mixed solvent, and three cases of organic tin-inorganic tin hybrid Sn18 type crystalline tin-oxygen cluster compounds are prepared through self-assembly reaction at 100 DEG C. The material disclosed by the invention has accurate structural information, high hydrophobicity and good stability, and is expected to be used as a novel tin-oxygen cluster material for preparing photoresist in an EUV (Extreme Ultraviolet) photoetching technology. The raw materials are easy to obtain, the preparation method is simple, the yield is high, and low cost and high benefit can be realized.

Description

technical field [0001] The invention belongs to the field of inorganic chemistry or material chemistry, in particular to an organotin-inorganic tin hybrid Sn 18 Type crystalline tin-oxygen cluster compound and its preparation method. Background technique [0002] Photolithography, a patterning technique used in the manufacture of integrated circuits (ICs), is one of the most critical technologies in information technology in modern society. Photolithography technology determines the characteristic size of circuit nodes on silicon wafers in integrated circuits, thereby determining the number of transistors fabricated in each chip. Therefore, photolithography technology has increasingly become the most critical technology that restricts the development of integrated circuit manufacturing. [0003] Extreme Ultra-violet lithography (Extreme Ultra-violet), often referred to as EUV lithography, is a photolithography technology that uses extreme ultraviolet light as a light source...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004
CPCG03F7/004
Inventor 张献明田秀娟郁有祝
Owner 山西师范大学
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