Unlock instant, AI-driven research and patent intelligence for your innovation.

Photosensitive resin composition containing polyimide precursor

A polyimide precursor and photosensitive resin technology, which is applied in the field of photosensitive resin compositions, can solve the problems of difficulty in obtaining patterns, difficulty in adjusting the characteristics of sensitivity and residual film rate, difficulty in selecting a variety of materials, etc. Excellent effect of elasticity and resilience

Pending Publication Date: 2022-05-06
上海玟昕科技有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, the polyamic acid has a high solubility in an alkaline aqueous solution used as a developer, so it is difficult to adjust the sensitivity and residual film rate characteristics, and there is a problem that it is difficult to obtain a desired pattern.
In addition, in the case of using a soluble polyimide resin having a hydroxyl group, it is difficult to select a variety of materials

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive resin composition containing polyimide precursor
  • Photosensitive resin composition containing polyimide precursor
  • Photosensitive resin composition containing polyimide precursor

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0087] Under dry nitrogen flow, 9,9-bis-(4-aminophenyl)-9H-fluorene-3,6-diol 30.9g (0.05mol) was dissolved in acetone 100mL, and propylene oxide 17.4g (0.3 mol) and then cooled to -5°C. A solution of 20.4 g (0.11 mol) of 3-nitrobenzoyl chloride dissolved in 100 mL of acetone was then added dropwise to the above reaction solution.

[0088] After completion of the dropwise addition, the reaction was carried out at -5°C for 3 hours, and then returned to room temperature. Concentrate the solution with a rotary evaporator, wash the obtained solid with water and acetone, and dry it with a vacuum dryer at 80° C. to obtain a solid.

[0089] Thereafter, 25 g of the dry solid was added to a 1.0 L three-necked flask together with 2 g of 5% palladium-carbon and 0.6 L of methoxyethanol (Methyl Cellosolve), and the internal temperature was adjusted to 60°C. 3.5 g of saturated hydrazine hydrate was slowly added dropwise thereto.

[0090] After the dropwise addition was completed and stirr...

Synthetic example 2

[0094] Under dry nitrogen flow, 9,9-bis-(4-aminophenyl)-9H-fluorene-3,6-diol 35.6g (0.05mol) and allyl glycidyl ether (allyl glycidyl ether) 34.5 g (0.3 mol) was dissolved in 100 g of γ-butyrolactone (GBL), and cooled to -5°C. 22.1 g (0.11 mol) of chlorinated trimellitic anhydride dissolved in 50 g of GBL was added dropwise thereto so that the temperature of the reaction liquid did not exceed 0°C. After completion of the dropping, the reaction was carried out at 0° C. for 3 hours to obtain a reaction solution.

[0095] The reaction solution was concentrated with a rotary evaporator and poured into 1L of toluene to obtain an anhydride of chemical formula 7.

[0096] chemical formula 7

[0097]

Synthetic example 3

[0099] Under a dry nitrogen stream, 15.4 g (0.025 mol) of the hydroxyl-containing diamine obtained in Synthesis Example 1 was dissolved in 50 g of N-methyl-2-pyrrolidone (NMP). 17.8 g (0.025 mol) of the hydroxyl-containing acid anhydride obtained in the synthesis example 2 and 0.74 g (0.005 mol) of maleic anhydride were added there, and it was made to react at 60 degreeC for 6 hours, and the polyimide precursor 1 was obtained.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Weight average molecular weightaaaaaaaaaa
Login to View More

Abstract

A photosensitive resin composition containing a polyimide precursor includes a polyimide precursor of a polymer having a structural unit represented by the following Chemical Formula 1, a photoreactive compound including a carbon-carbon unsaturated group, an O-acyl oxime-based photoinitiator, and a solvent, in the formula (1), R2 is a tetravalent organic group derived from an aromatic diamine represented by chemical formula (2), R1 is a hexavalent organic group derived from an aromatic dianhydride represented by chemical formula (3), R3, R4, R5 and R6 are hydrogen, respectively, R7 and R8 are hydrogen or at least one is an epoxy acrylate substituent represented by chemical formula (4) or chemical formula (5), the substitution rate of the substituent is in the range of 2-50%, and n is an integer of 1-3. And n represents an integer of 1 to 25.

Description

technical field [0001] Embodiments of the present invention relate to a photosensitive resin composition containing a polyimide precursor. More specifically, the embodiments of the present invention relate to a photosensitive resin composition containing a polyimide precursor having a negative type (NEGATIVE TYPE). Background technique [0002] In a display element manufacturing process, it is necessary to form an insulating film pattern or a protective film pattern on a substrate. A photosensitive resin composition can be used for forming the insulating film pattern or the protective film pattern. The photosensitive resin composition contains a photoinitiator. Therefore, the photosensitive resin composition may undergo a photocuring reaction when irradiated with light. [0003] The photosensitive resin composition is coated on the substrate to form a photosensitive resin film. Afterwards, a photolithography process is performed on the photosensitive resin film to form a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G03F7/038
CPCG03F7/0387
Inventor 黄光锋李文武
Owner 上海玟昕科技有限公司