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Method for removing and recycling semiconductor deposits on surface of metal coating equipment

A technology of coating equipment and recycling method, which is applied in the directions of cleaning methods, cleaning methods and utensils, chemical instruments and methods using liquids, etc. Achieve the effect of ensuring high efficiency, no electrostatic sparks, and high density

Pending Publication Date: 2022-05-17
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This type of physical cleaning technology has disadvantages such as high equipment investment cost, high equipment energy consumption, and difficult recycling of sediments.

Method used

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  • Method for removing and recycling semiconductor deposits on surface of metal coating equipment
  • Method for removing and recycling semiconductor deposits on surface of metal coating equipment
  • Method for removing and recycling semiconductor deposits on surface of metal coating equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] The cleaning object is crystalline silicon solar cell coating equipment, the material of the equipment is stainless steel, and the composition of the surface deposits is silicon carbide. Adjust the spray angle between the coating equipment with surface deposits and the nozzle of the spray gun to 5°, the spray pressure to 0.2Mpa, and spray granular sodium bicarbonate crystals with a particle size of about 20 μm to the surface of the coating equipment for deposition cleaning. Collect the jet debris mixture and add water to completely dissolve the sodium bicarbonate debris, then filter and recover the sediment powder material. SEM and energy spectrum detection found that the silicon carbide deposits on the surface of the coating equipment were completely removed after cleaning ( figure 1 ,Table 1). The C content decreased from 22.39% to 0.12%, and the Si content decreased from 76.37% to 0.10%. Comparative analysis of infrared spectra found that the infrared characterist...

Embodiment 2

[0037]The cleaning object is crystalline silicon solar cell coating equipment, the equipment material is aluminum, and the composition of the surface deposit is aluminum oxide. Adjust the spray angle between the coating equipment and the nozzle of the spray gun to 60°, the spray pressure to 1.0Mpa, and spray the granular sodium bicarbonate crystals with a particle size of about 500 μm to the surface of the coating equipment to clean the deposits. Collect the jet debris mixture and add water to completely dissolve the sodium bicarbonate debris, then filter and recover the sediment powder material. SEM and energy spectrum detection found that the aluminum oxide deposits on the surface of the coating equipment were completely removed after cleaning ( image 3 ,Table 2). The O content decreased from 21.13% to 0.05%, and the Al content increased from 78.76% to 99.95%.

[0038] Table 2 Comparison of element content on the surface of the aluminum coating equipment before and after ...

Embodiment 3

[0041] The cleaning object is crystalline silicon solar cell coating equipment, the equipment material is aluminum, and the composition of the surface deposit is silicon nitride. Adjust the spray angle between the coating equipment and the nozzle of the spray gun to 90°, the spray pressure is 3.0Mpa, and spray the granular sodium bicarbonate crystals with a particle size of about 1000 μm to the surface of the coating equipment to clean the deposits. Collect the jet debris mixture and add water to completely dissolve the sodium bicarbonate debris, then filter and recover the sediment powder material. SEM and energy spectrum detection found that the silicon nitride on the surface of the coating equipment was completely removed after cleaning ( Figure 4 ,table 3). The N content decreased from 56.79% to 0.00%, the Si content decreased from 40.59% to 0.12%, and the Al content increased from 2.56% to 99.83%.

[0042] Table 3 Comparison of element content on the surface of the alu...

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Abstract

The invention discloses a method for removing and recycling semiconductor deposits on the surface of metal coating equipment, which comprises the following steps of: spraying granular sodium bicarbonate crystals to the surface of a metal coating attached with the semiconductor deposits by utilizing the characteristic differences of metal ductility and plasticity and semiconductor brittleness; the compact grinding effect and the surface temperature difference are generated in the scattering process of broken crystals along the surface of the semiconductor sediment film, efficient separation between the semiconductor sediment and the surface of metal coating equipment is achieved, and ejected semiconductors and sodium bicarbonate fragments are collected. And adding water for dissolving to remove sodium bicarbonate, and separating and recycling to obtain the semiconductor sediment powder material. The method can effectively remove semiconductor deposits on the surface of a metal material, has no damage to the surface of metal coating equipment, and is simple and safe to operate and environment-friendly in process. Pollution is reduced while valuable semiconductor deposits are recovered.

Description

technical field [0001] The invention belongs to the field of cleaning semiconductor deposits on the surface of coating equipment, and in particular relates to a method for non-destructive removal and recovery of semiconductor deposits on the surface of metal coating equipment. Background technique [0002] In recent years, with the continuous improvement of the integration of electronic devices, industries such as photovoltaic cells and semiconductors have higher and higher requirements for the manufacturing process of deposited semiconductor thin films. The existing chemical vapor deposition technology (CVD) includes low pressure deposition technology (LPCVD), atmospheric pressure deposition technology (APCVD), plasma enhanced deposition technology (PECVD), metal organic compound deposition technology (MOCVD) and atomic layer deposition technology. Deposition technology (ALD) has the advantages of high film purity, good uniformity, and good line retention. It can be used fo...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/02B08B3/08B08B13/00
CPCB08B3/02B08B13/00B08B3/08Y02P70/50
Inventor 王明亮江周宇李晓萱徐加乐
Owner SOUTHEAST UNIV