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Method for etching MXene based on electrochemistry, MXene turbid liquid and application of MXene turbid liquid

An electrochemical and electro-etching technology, which is applied in chemical instruments and methods, inorganic chemistry, fiber chemical characteristics, etc., can solve the problems of easy operation danger, low safety factor of hydrothermal reaction, etc., and achieve the effect of economical and simple operation process

Pending Publication Date: 2022-07-12
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

For example, the Chinese invention patent whose document number is CN 111755685A is to use Ti 3 AlC 2 、Ti 2 AlC, V 2 AlC, Mo 2 AlC, Nb 2 MXene precursors such as AlC are placed in a reaction deposition solution mixed with fluoride salt and boric acid for hydrothermal reaction to obtain MXene powder. This method uses monobasic weak acid boric acid to avoid the use of strong acid, but the safety factor of hydrothermal reaction is low. During operation prone to danger

Method used

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  • Method for etching MXene based on electrochemistry, MXene turbid liquid and application of MXene turbid liquid
  • Method for etching MXene based on electrochemistry, MXene turbid liquid and application of MXene turbid liquid
  • Method for etching MXene based on electrochemistry, MXene turbid liquid and application of MXene turbid liquid

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] (a) Treatment of MAX phase (Ti 3 AlC 2 ) block. its initial mass m 1 It is 0.8331g, soaked in absolute ethanol, and ultrasonically treated for 10min to remove surface dust, and then placed in an oven to dry for use.

[0047] (b) Configure the electro-etching solution. Take N-N-dimethylformamide (DMF) as a solvent, add tetrabutylammonium chloride tetrahydrate (TBAF) to it, prepare an electrolyte with a molar concentration of 0.5mol / L, and take 50ml of it for subsequent use after fully stirring and dissolving. ;

[0048] (c) Assembly of the two-electrode device. Pour the electro-etching solution prepared in step (b) into an electrolytic cell, wherein the Ti treated in step (a) 3 AlC 2 The block is the working electrode, the platinum sheet is the counter electrode, and the two electrodes are inserted into the electrolyte in parallel.

[0049] (d) The electrolytic cell assembled in step (c) was placed in a water bath to maintain a constant reaction temperature of 49...

Embodiment 2

[0056] (a) Processing MAX phase (V 2 GaN) bulk: initial mass m 1 For 2.684g, soak the MAX with absolute ethanol and ultrasonically treat it for 10min to remove surface dust, and then put it in an oven to dry for use.

[0057] (b) Configure the electro-etching solution. Take propylene carbonate (PC) as solvent, add a certain amount of ammonium bifluoride (NHF) to it 4 HF 2 ) so that the molar concentration of the solution is 4 mol / L, and after fully stirring and dissolving, 120 ml is weighed for subsequent use.

[0058] (c) Assembly of the two-electrode device. Pour the electro-etching solution prepared in step (b) into an electrolytic cell, wherein the V treated in step (a) 2 The GaN bulk is the working electrode, the nickel sheet is the counter electrode, and the two electrodes are kept parallel and inserted into the electrolyte.

[0059] (d) The electrolytic cell assembled in step (c) is placed in a water bath to maintain a constant reaction temperature of 50°C.

[00...

Embodiment 3

[0066] (a) Treatment of MAX phase (Cr 2 GeC) bulk. initial mass m 1 For 2.464g, soak MAX in absolute ethanol and ultrasonically treat it for 10min to remove surface dust, and then put it in an oven to dry for use;

[0067] (b) Configure the electro-etching solution. Take dimethylacetamide (DMAC) as solvent, add a certain amount of ammonium bifluoride (NHF) to it 4 HF 2 ) make the solution concentration be that the molar concentration is 0.8mol / L, after fully stirring and dissolving, take by weighing 60ml for subsequent use;

[0068] (c) Assembly of the two-electrode device. Pour the electro-etching solution prepared in step (b) into an electrolytic cell, wherein the Cr treated in step (a) 2 The GeC block is the working electrode, the graphite sheet is the counter electrode, and the two electrodes are inserted into the electrolyte in parallel;

[0069] (d) the electrolytic cell assembled by step (c) is placed in a water bath to maintain a constant 70°C reaction temperatu...

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Abstract

The invention provides a method for etching MXene based on electrochemical etching, MXene turbid liquid and application of the MXene turbid liquid, an organic solvent of fluoride salt is used as an electric etching solution, an MAX electrode is used as a working electrode, and MXene is obtained under the action of electrochemical etching. According to the method provided by the invention, the powdery or turbid liquid MXene can be prepared according to the post-treatment step of the etching liquid. In addition, by-product metal fluoride can be removed in an environment-friendly manner through post-treatment, few-layer MXene can be directly obtained, and the technological process is simplified.

Description

technical field [0001] The invention belongs to the field of two-dimensional material preparation, and in particular relates to a method for preparing MXene by electrochemical etching, MXene suspension and use thereof. Background technique [0002] MXene is an emerging two-dimensional material, the most widely studied for Ti 3 C 2 T x . The general formula M can be used n+1 X n T x where M denotes an early transition metal and X denotes C and / or N,T x Represents a terminal functional group, including various surface functional groups such as -OH, -O and / or -F, n=1-3. The layers of MAX are held together by strong covalent or metallic bonds, and MXene is produced by selectively etching Group A elements (usually Al or Ga) from the MAX phase. [0003] The basic mechanism of chemical corrosion is that M-Al bonds are more chemically active than M-C bonds, which is essentially an electrochemical process involving charge transfer from the target material to other materials. ...

Claims

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Application Information

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IPC IPC(8): C25C3/20C01B21/00C01B21/06C01B32/90C09D11/52D01F1/10
CPCC25C3/20C01B32/90C01B21/0602D01F1/10C09D11/52C01P2002/72Y02E60/10
Inventor 胡鹏飞刘钟升温合静张星卞亚涛张太省
Owner JIANGSU UNIV
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