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Low-temperature negative black photoresist composition and black matrix thereof

A technology of composition and photoresist, applied in the direction of nonlinear optics, optics, optomechanical equipment, etc., can solve the problems of peeling, poor chemical resistance, insufficient strength, etc., to improve adhesion, reduce impact, increase strength and The effect of stability

Pending Publication Date: 2022-07-15
深圳迪道微电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, there are problems that the composition is not sufficiently crosslinked when cured at low temperature, a cured film cannot be formed, or its strength is insufficient, and the chemical resistance of the sample is poor
[0007] However, these substances have problems in storage stability, causing problems such as peeling, insufficient chemical resistance during the preparation of cured films

Method used

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  • Low-temperature negative black photoresist composition and black matrix thereof
  • Low-temperature negative black photoresist composition and black matrix thereof
  • Low-temperature negative black photoresist composition and black matrix thereof

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0037] 15g photocurable resin (A), 3g photopolymerizable monomer (B) dipentaerythritol pentaacrylate, 1g photoinitiator (D), black color paste (E), low temperature blocked isocyanate crosslinking agent (F) and 0.02 g Surfactant (G) was uniformly mixed, the mixture was dissolved in propylene glycol methyl ether acetate so that the solid content of the mixture was 14 parts by weight, the solution was stirred for 2 hours, and filtered through a membrane filter with a pore size of 0.2 μm , to obtain a composition solution with a solid content of 14 parts by weight.

example 2 and comparative example 1

[0039] The photoresist compositions were each prepared in the same manner as in Example 1, except that the contents of the respective components were varied as shown in Table 2:

[0040] Table 2

[0041]

[0042] Prepare the black matrix:

[0043] The photoresist compositions obtained in each example and comparative example are coated on a substrate, subjected to a prebake at a temperature of 60°C to 130°C to remove the solvent; then exposed using a photomask having a desired pattern; and undergo development using a developer, which may be a potassium hydroxide solution, to form a pattern on the coating, post-bake the patterned coating at a temperature of 80°C to 120°C for 10 minutes to 5 hours, In order to prepare the desired cured film, exposure is performed in the wavelength band of 200 to 500 nm based on the wavelength of 365 nm, at 10 to 200 mJ / cm 2 The exposure rate is carried out to obtain the target pattern for testing.

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Abstract

The invention relates to a low-temperature negative black photoresist composition and a black matrix thereof, and the composition comprises an organic solvent and a solute dissolved in the organic solvent, and the solute accounts for 15-60% of the total weight of the composition. Wherein the solute comprises light-cured resin containing double bonds and hydroxyl, an alkali-soluble acrylate photopolymerization monomer, a photoinitiator, a coloring agent and a low-temperature blocked isocyanate cross-linking agent. According to the photoresist composition disclosed by the invention, the photo-cured resin containing double bonds and hydroxyl and the alkali-soluble acrylate photo-polymerization monomer are added, and polymerization is initiated by the photoinitiator, so that the adhesiveness of the photoresist is improved; the light-cured resin and the photopolymerization monomer are added, and the low-temperature blocked isocyanate crosslinking agent is added, so that hydroxyl in the light-cured resin and the photopolymerization monomer can be fully crosslinked and polymerized at a relatively low temperature, the strength and the stability of a cured film are further improved, the influence on a color filter is reduced, and the light-cured film is more suitable for OLED and display devices based on quantum dots.

Description

technical field [0001] The invention relates to a low-temperature negative black photoresist composition and a black matrix thereof, belonging to the technical field of semiconductor materials. Background technique [0002] In panels for liquid crystal display devices, patterned light-shielding films such as black matrices and black columnar spacers are generally formed. In panels for organic EL display devices, etc., for the purpose of dividing light-emitting layers, etc. Black banks are formed as light-shielding films. For such applications, various photoresists containing a light-shielding black pigment and a photopolymerization initiator for forming a light-shielding film have been proposed. [0003] The LCD includes an upper substrate, a lower substrate, and a liquid crystal interposed between the substrates. If necessary, a touch screen panel etc. can be attached to the upper substrate. It is usually fabricated after an assembly step in which the color filters and t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/038G03F7/027G03F7/004G02F1/1335
CPCG03F7/0382G03F7/027G03F7/004G02F1/133512
Inventor 陈旺康威康凯
Owner 深圳迪道微电子科技有限公司
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