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Cleaning agent for polishing wax film and preparation method thereof

A cleaning agent and polishing wax technology, which is applied in the direction of detergent composition, chemical instruments and methods, non-surface active cleaning solvents, etc., can solve the problems of low cleaning efficiency and poor cleaning performance of residual wax, and achieve cleaning efficiency Improvement, excellent corrosion inhibition and anti-oxidation effect, and the effect of reducing the residue of polishing agent

Pending Publication Date: 2022-07-29
上海皇晶生物科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem of poor cleaning performance or low cleaning efficiency for residual wax in the prior art is solved by the cleaning agent for polishing wax film of the present invention

Method used

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  • Cleaning agent for polishing wax film and preparation method thereof
  • Cleaning agent for polishing wax film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Among the embodiment 1, a cleaning agent for polishing wax film is provided, calculated by mass percentage, including the following components:

[0037] Hydrocarbon solvent (D60 dearomatized hydrocarbon solvent oil) 74.9%;

[0038] Fatty alcohol (industrial grade 1,3-butanediol) 8%;

[0039] Fatty acid ester (industrial grade dibasic acid dimethyl ester) 16%;

[0040] Benzenetriazole (industrial grade benzotriazole) 0.1%;

[0041] Stabilizer (ethylene glycol tert-butyl ether) 1%.

[0042] Under normal pressure, the benzene triazole and fatty acid ester are stirred and heated to 40-60 °C, and the dissolution is uniform and transparent;

[0043] After cooling down to room temperature, add hydrocarbon solvent, aliphatic alcohol and stabilizer and continue to stir for 10-30min to mix well and filter through 80-100 mesh screen.

Embodiment 2

[0045] Among the embodiment 2, a cleaning agent for polishing wax film is provided, calculated by mass percentage, including the following components:

[0046] Hydrocarbon solvent (D60 dearomatized hydrocarbon solvent oil) 69.9%;

[0047] Fatty alcohol (industrial grade n-butanol) 10%;

[0048] Fatty acid ester (technical grade methyl palmitoleate) 18%;

[0049] Benzenetriazole (industrial grade benzotriazole) 0.1%;

[0050] Stabilizer (diethylene glycol monobutyl ether) 2%.

[0051] Under normal pressure, the benzene triazole and fatty acid ester are stirred and heated to 40-60 °C, and the dissolution is uniform and transparent;

[0052] After cooling down to room temperature, add hydrocarbon solvent, aliphatic alcohol and stabilizer and continue to stir for 10-30min to mix well and filter through 80-100 mesh screen.

Embodiment 3

[0054] Among the embodiment 3, a cleaning agent for polishing wax film is provided, calculated by mass percentage, including the following components:

[0055] Hydrocarbon solvent (IP60 isoparaffin solvent oil) 69.5%;

[0056] Fatty alcohol (industrial grade n-butanol) 8.5%;

[0057] Fatty acid ester (industrial grade dimethyl adipate) 17%;

[0058] Benzenetriazole (industrial grade benzotriazole) 0.5%;

[0059] Stabilizer (diethylene glycol monobutyl ether) 4.5%.

[0060] Under normal pressure, the benzene triazole and fatty acid ester are stirred and heated to 40-60 °C, and the dissolution is uniform and transparent;

[0061] After cooling down to room temperature, add hydrocarbon solvent, aliphatic alcohol and stabilizer and continue to stir for 10-30min to mix well and filter through 80-100 mesh screen.

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Abstract

The invention discloses a cleaning agent for a polishing wax film, which is characterized by comprising the following components in percentage by mass: 60-80% of hydrocarbon solvent, 20-30% of solvent, 5-20% of solvent, 5-20% of solvent and the balance of water. 8-13% of fatty alcohol; 16 to 31 percent of fatty acid ester; 0.1 to 3 percent of benzotriazole; and 1-5% of a stabilizer. The invention further provides a preparation method of the cleaning agent for the polishing wax film. According to the cleaning agent, through the reasonable proportion, wax can be effectively removed, meanwhile, corrosion to metal can be reduced, the stability of the whole cleaning agent is improved, and the cleaning efficiency is greatly improved.

Description

technical field [0001] The invention relates to the field of organic chemical cleaning agents, in particular to a cleaning agent for polishing wax films and a preparation method thereof. Background technique [0002] The main chemical components of wax are mostly composed of hydrocarbons or higher fatty acids and higher monohydric alcohols, which are a class of organic compounds. Widely used in machining, parts protection, mold, automotive aftermarket and other fields, its main functions are polishing, demoulding, lubrication, protection, etc. [0003] Wax itself has good adhesion. Although it has the advantages of good protection and isolation, the disadvantages are quite obvious. It is not easy to remove after use, and it is easy to affect subsequent applications. [0004] The invention adopts hydrocarbon solvent as the base, compound alcohol, ether and ester compound, has excellent wax dissolving ability, can remove various wax-like substances in a short time, and restor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D7/24C11D7/26C11D7/32C11D7/50C11D7/60C23G5/032
CPCC11D7/262C11D7/261C11D7/266C11D7/3281C11D7/3227C11D7/5027C11D7/241C11D7/242C11D7/244C23G5/032
Inventor 陈良伦陈小宴
Owner 上海皇晶生物科技有限公司
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