Synthesis of ester ether compound with high acidolysis activity

A synthesis method and compound technology, applied in the field of photothermal functional new materials for imaging information recording materials

Inactive Publication Date: 2002-05-08
BEIJING NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This not only solves the problem of acid hydrolysis at room temperature that cannot be solved in the

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1-5

[0022]Replace resorcinol in Synthesis Example 1-3 with 126 grams of phloroglucinol. The amount of catalyst p-toluenesulfonic acid was doubled to 3 grams. The water output reaches 2 moles as the end point of the reaction. Others are the same as Synthesis Example 1-3. The product P1-5 is obtained.

[0023] Using the reactant ratio and method of Synthesis Example 1-5, just use 110 grams of hydroquinone, 110 grams of catechol, 108 grams of p-cresol, 108 grams of o-cresol, and 128.5 grams of o-chlorophenol to replace the synthetic Resorcinol in Examples 1-5. The products P1-6, P1-7, P1-8, P1-9 and P1-10 were obtained.

[0024] The appearance, yield, and some physical and chemical properties of the products P1-1 to P1-10 obtained in Synthesis Example P1-1 to Synthesis Example P1-10 are listed in Table 1. Infrared spectroscopy, mass spectrometry, 13 C-NMR analysis and element analysis determination, P1-1——P1-10 structural formula is as follows:

[0025] produc...

Synthetic example 2-19、2-20

[0032] 96.6 grams (0.14 moles) of dihydropyrrole were used to replace dihydrofuran in Synthesis Examples 2-17 and 2-18 respectively, and the apparatus and method were the same as Synthesis Examples 2-17 and 2-18. Reaction products P2-19 and P2-20 were obtained.

[0033] The yield, appearance and physicochemical properties of the product are shown in Table 2, and their structures are shown in formulas P2-1 to P2-20:

[0034] product

Synthetic example 3-3

[0038] 30.2 g (0.1 mol) and 8.9 g (0.22 mol) of P1-3 chloromethyl methyl ether were used to replace the corresponding reactants in Synthesis Example 3-1, and the others were completely the same as Synthesis Example 3-1. The product P3-3 is obtained.

[0039] 33.4 grams (0.1 mol) of P1-4 and P1-5 were used to replace P1-1 in Synthesis Example 3-1, and the others were completely the same as Synthesis Example 3-1 to obtain products P3-4 and P3-5.

[0040] The yield, appearance and physical and chemical properties of P3-1-P3-5 are listed in Table 3, and the product structure is shown in formula P3-1-formula P3-5.

[0041] A series of corresponding products can be obtained by replacing chloromethyl methyl ether with other chloromethyl alkyl ethers.

[0042] product

Exterior

yield

Solubility

Dichloromethane

alkane

Ethylene glycol

monoethyl ether

ethanol

butanone

toluene

1%NaOH

the solution

P3-1...

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PUM

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Abstract

The ester ether compound with high acidolysis activity is synthesized through the reaction between benzil acid (2,2-diphenyl glycolic acid) and phenols, each of which has at residual active point in its benzene ring, in the presence of p-toluene sulfonic-acid catalyst in 0.1-2 % and methyl benzene, dimethyl benzene and other benzene compound as solvent to synthesize a serial addition compound of benzil acid and phenols which may be further dewatered to produce lactone compound; and the etherification of the said addition compound or the lactone compound the ether compound, such as vinyl ethylether, dihydropyran, dihydrofuran, dihyidropyrrole, etc. at below 70 deg.c. The ester ether compound may be used as photothermal imaging information record material.

Description

technical field [0001] The technical field of the present invention is the field of photothermal functional new materials for imaging information recording materials, that is, the synthesis method of photothermal information recording materials with high acidolysis activity. Specifically, this material decomposes the highly acidolytic active compound of the present invention under the irradiation or scanning of ultraviolet light or infrared light by means of the acid generated by the photothermal acid generating source, and changes from highly resistant to alkali developer solution before decomposition to decomposition After being highly solubilized, it can be developed in an alkaline developer to obtain an image, which is used for imaging information recording materials. Background technique [0002] The background technology of the present invention includes the following aspects [0003] 1. In 1983, the chemically amplified resist technology invented by Ito Hiroshi of IB...

Claims

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Application Information

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IPC IPC(8): C07C67/08C07C69/734C07D307/83C07D309/10C07D407/12
Inventor 余尚先邹应全施致雄
Owner BEIJING NORMAL UNIVERSITY
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