Transparent laminate having low emissivity

Abstract

A transparent laminate having low emissivity which has one or more dielectric layers such as a zinc oxide (ZnO) film and one or more metal layers such as a silver (Ag) film being laminated on one another, characterized in that at least one dielectric layer is divided in the direction of film thickness by at least one amorphous layer. The transparent laminate having low emissivity exhibits improved durability of the metal layer, since the formation of a zinc oxide film as a dielectric layer on an amorphous layer causes the collapse of the columnar crystal structure of zinc oxide and, as a result, not only the amorphous layer but also the dielectric layer act also as a barrier preventing the entry of moisture or a gas.

Description

technical field [0001] The present invention relates to a low emissivity transparent multilayer body used as multilayer glass, laminated glass, transparent plate with electromagnetic wave control function, flat heating element and transparent electrode. Background technique [0002] It is known that these are disclosed in JP-A-63-30212, JP-A-63-134232 or JP-A-63-239044, etc., as low-emissivity transparent materials for realizing sun-shielding and high-insulation mechanisms. Multi-layer body. [0003] This low-emissivity transparent multilayer body is formed by laminating a total of (2n+1) dielectric layers and metal layers on a transparent substrate, and a protective layer is formed on the uppermost layer. Zinc oxide is known to have an excellent film-forming speed as a dielectric layer, and silver is known to have an excellent radiation reflection function as a metal layer. [0004] In addition, it is known that SiN x 、TiO 2 or SiAlO x N y (silicon aluminum oxynitride...

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Problems solved by technology

[0006] In the invention proposed in the aforementioned Japanese Patent Laid-Open No. 9-71441, three methods are listed as methods for reducing the grain size of the metal oxide layer. 1) A method of using a Zn target and increasing the pressure of the sputtering gas ; 2) adopt Zn target, the method for mixing nitrogen in the oxygen as sputtering gas; 3) adopt the ZnO target that is coated with Al, use the method for the argon sputtering of adding several percentage points of oxygen, but there is this class problem: In the above method 1), due to the high pressure of the spraying gas, the pressure in the spraying device is unstable and the film quality is uneven; in the above method 2), the spraying rate is unstable and the film quality is uneven; in the above method 3) Medium, high cost of spraying

[0010] In addition, the test results show that although SiN x 、TiO 2 or SiAlO x N y (Sialon polymer material) and other protective films are amorphous, and the grain boundaries are not aligned in the thickness direction. However, when the crystal orientation of the dielectric layer formed outside the metal layer is high, the metal layer cannot be sufficiently suppressed. deterioration

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