Transparent laminate having low emissivity
A low-radiation, multi-layer body technology, applied in coating, layered products, sputtering coating, etc., can solve problems such as unstable pressure, uneven film quality, unstable spraying rate, etc., to improve durability and wear resistance, crystallization inhibition effect
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Example Embodiment
[0049] (Example 1)
[0050] use Picture 11 The shown is a load-locked linear magnetron spraying device with 5 sets of cathodes, figure 1 The structure shown, namely glass / ZnO / Ag / ZnO / SiN x / ZnO / SiN x The low-emissivity transparent multilayer body composed of a dielectric / silver / dielectric sandwich structure is formed into a film on one side of a general float glass with a thickness of 3mm×2500mm×1800mm.
[0051] From Picture 11 The entrance of the spraying device shown transports the cleaned plate glass (G) to the load lock chamber (1), evacuates to a predetermined pressure, and transports it to the coating chamber (2), and then introduces the spraying gas In the plating chamber (2), it is adjusted to a predetermined pressure balanced with the exhaust pump, and then the cathode (3) is energized to generate discharge, and the material set on each cathode is sprayed to form a film.
[0052] In addition, in this embodiment, the glass is not particularly heated during plating but is...
Example Embodiment
[0059] (Example 2)
[0060] Using the same sputtering device as in Example 1, and image 3 Same structure, namely glass / ZnO / Ag / TiO x / ZnO / SiN x / ZnO / Ag / TiO x / ZnO / SiN x The low-emissivity transparent multilayer body composed of the dielectric / silver / dielectric / silver / dielectric sandwich structure is formed as a film on one surface of the same float glass in the following manner.
[0061] First, oxygen is introduced into the chamber to make the pressure 0.40Pa, and 55kW of direct current is applied to the cathode (3b) with a zinc target (size: 3100mm×330mm) to generate reactive spraying, and the glass is moved back and forth under the cathode. , Forming a zinc oxide film as the first layer.
[0062] Then, the gas in the chamber was switched to argon, the pressure was set to 0.45 Pa, a direct current of 8 kW was applied to the cathode (3c) with a silver target (size: 3100mm×330mm), and a titanium target (size: 3100mm) The cathode (3d) of ×330 mm) was supplied with a direct current o...
Example Embodiment
[0066] (Example 3)
[0067] Using the same sputtering device as in Example 1, and Figure 5 Same structure, namely glass / ZnO / Ag / TiO x / ZnO / SiN x / ZnO / SiN x / ZnO / Ag / TiO x / ZnO / SiN x The low-emissivity transparent multilayer body composed of the dielectric / silver / dielectric / silver / dielectric sandwich structure is formed as a film on one surface of the same float glass as follows.
[0068] Using the same method as in Example 2, the first layer of zinc oxide film, the second layer of silver film, the third layer of titanium film (after acting as a sacrificial layer, become a titanium oxide film), and the fourth layer of A zinc oxide film, a fifth layer of aluminum-added silicon nitride film, and a sixth layer of zinc oxide film.
[0069] Next, use the same method as the fifth and sixth layers to form the seventh layer of aluminum-added silicon nitride film and the eighth layer of zinc oxide film, and then use the second layer, third layer, and fourth layer. , The fifth layer is the sam...
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