Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JILIN UNIV
- Publication Date
- 2004-03-24
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
Technical field
[0001] The invention relates to a method for preparing two-dimensional ordered nanorings, nanopores and nano self-assembled monolayer films, in particular to a method for preparing colloidal crystals using a double substrate method, and then using restricted colloidal crystals as templates to prepare Two-dimensional ordered nanorings, nanopores and nano self-assembled monolayer film methods. Background technique
[0002] The study of materials with specific structures and morphologies on the surface is an important subject in the development of modern technology. The existing methods for constructing the specific structure and topography of the surface usually include micro-contact printing, self-assembly, photolithography and soft photolithography. At the same time, these methods have been successfully applied in basic and application fields such as controlling crystal growth, preparing chemical and biological sensitive devices, and processing microelectronics an...