Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film

A nano-self-assembly, nano-ring technology, used in nanostructure fabrication, nanotechnology, nanotechnology, etc.

Inactive Publication Date: 2004-03-24
JILIN UNIV
View PDF0 Cites 30 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of three-dimensional ordered colloidal crystals to construct two-dimensional ordered surfaces has not been reported.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film
  • Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film
  • Method for preparing tw-dimension ordered nano ring, nano hole and nano self-assembling single layer film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029]Under the protection of nitrogen, distilled water is used as a dispersion medium, and styrene and (meth)acrylic acid are used as monomers for soap-free emulsion polymerization to obtain an emulsion of stable monodisperse crosslinked polymer microspheres. For example: under the protection of nitrogen, using 100 ml of distilled water as the dispersion medium, 10 g of styrene, 0.5 g of 4,4'-dimethylacryloxy-2,2'-diphenylpropane, 1.2 g (Meth) acrylic acid, 0.08 g of potassium persulfate or ammonium persulfate, 0.24 g of sodium bicarbonate, were added to a reactor equipped with a mechanical stirrer and a reflux condenser, and the mechanical stirring speed was 300 rpm. The soap-free emulsion polymerization reaction is carried out in a water bath at 70°C. There is no need to add any surfactants and dispersants. After 24 hours of reaction, a stable milky white surface is obtained with a monodisperse cross-linked polymer with a negative charge and a rich surface. The emulsion of styr...

Embodiment 2

[0033] 1. Monodisperse polymer microspheres and silicon wafer treatment, and the preparation of three-dimensional ordered colloidal crystals composed of monodisperse crosslinked polymer microspheres (diameter 220 nm) between the two substrates are as described in Example 1. .

[0034] 2. Put one end of the double substrate with three-dimensional ordered colloidal crystals composed of monodispersed polymer microspheres vertically into the 10 mg / ml aqueous solution of polyvinyl alcohol. Due to capillary action, the aqueous solution of polyvinyl alcohol is filled Fill the space between the two substrates and the voids in the three-dimensional colloidal crystal. After taking it out, it is naturally dried and ultrasonicated for 1 minute in a mixture of methanol and water. A two-dimensional ordered polyvinyl alcohol nanoring arrangement can be obtained on the surface of the substrate (the inner diameter of the ring is about 90 nm, the outer diameter is about 170 nm, and the ring height ...

Embodiment 3

[0036] 1. The preparation of monodisperse polymer microspheres and silicon wafer processing, and the preparation of three-dimensional ordered colloidal crystals composed of monodisperse crosslinked polymer microspheres between two substrates are as described in Example 1.

[0037] 2. Three-dimensional ordered colloidal crystals composed of polymer microspheres with a diameter of 190 nanometers. Place one end of a double substrate with a three-dimensional ordered colloidal crystal composed of monodispersed polymer microspheres into 20% (volume) vertically. Compared with the ethanol solution of butyl titanate, due to capillary action, the ethanol solution of butyl titanate fills the space between the double substrates and the voids in the three-dimensional colloidal crystals. After taking it out, it will be dried naturally, and the colloidal crystal template will be removed after firing at 550℃ for 6 hours, and sonicated in toluene and chloroform for 10 minutes respectively to obtai...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
sizeaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The present invention relates to a method for preparing two-dimensional ordered nano ring, nano hole and nano self-assembled single-layer film. Said invention adopts double-substrate method to prepare three-dimensional ordered colloidal crystal body formed from monodisperse polymer microsphere or monodisperse SiO2 microsphere between two substrates, then the internal voids of colloidal crystal body between two substrates can be filled with inorganic or organic component solution with a certain concentration, and then the solvent is volatilized, the colloidal crystal template is removed, so that the two-dimensional ordered nano ring, nano hole and nano self-assembled single-layer film can be obtained on the substrate.

Description

Technical field [0001] The invention relates to a method for preparing two-dimensional ordered nanorings, nanopores and nano self-assembled monolayer films, in particular to a method for preparing colloidal crystals using a double substrate method, and then using restricted colloidal crystals as templates to prepare Two-dimensional ordered nanorings, nanopores and nano self-assembled monolayer film methods. Background technique [0002] The study of materials with specific structures and morphologies on the surface is an important subject in the development of modern technology. The existing methods for constructing the specific structure and topography of the surface usually include micro-contact printing, self-assembly, photolithography and soft photolithography. At the same time, these methods have been successfully applied in basic and application fields such as controlling crystal growth, preparing chemical and biological sensitive devices, and processing microelectronics an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B82B1/00B82B3/00
CPCB82Y30/00
Inventor 陈鑫杨柏陈志民
Owner JILIN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com