Binary optica device grey scale changing mask method and device for making

A technology of gray scale mask and binary optics, which is applied in the direction of photolithographic exposure device, optics, and originals for photomechanical processing, etc., can solve the problems of complex process and high cost, and achieve high contrast characteristics and high gray scale Number, the effect of reducing production costs

Inactive Publication Date: 2004-12-22
NAT UNIV OF DEFENSE TECH
View PDF0 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using the evaporation and separation process of Inconel to make grayscale masks, the process is complex and costly, and cannot be accepted by most people

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Binary optica device grey scale changing mask method and device for making
  • Binary optica device grey scale changing mask method and device for making
  • Binary optica device grey scale changing mask method and device for making

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] The key to the variable grayscale mask method is that it is difficult to quickly produce a high-precision grayscale mask with different grayscale levels to precisely control the exposure. The invention proposes a grayscale mask manufacturing method based on a spatial light modulator, which adopts pattern-by-pattern exposure, which can overcome the shortcomings of slow speed and high cost of direct writing grayscale masks by lasers and electron beams, and at the same time utilizes the high Features such as resolution, high gray scale number and high contrast can make the minimum feature size of the gray scale reticle reach the micron or even sub-micron level. The present invention is characterized in that it connects the spatial light modulator with the computer through the video driver, and the computer controls and inputs the video signal, the light beam emitted by the point light source becomes parallel light after passing through the condenser lens, and the vertical i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a variable-gradation mask making method of binary optical devices, and its character: it connects a space optical modulator able to display gradation pictures with a computer through a video driver, uses the computer to control and input video signals, then vertically irradiates the electric-addressing space optical modulator by light beams, images gradation images displayed on the optical modulator on a photosensitive printing plate on a 2D displacement platform through finely zooming objective, exposes pictures on the photosensitive printing plate one by one by moving the platform, then taking the working procedures of developing, etc to complete making the gradation mask. The making device: a photosensitive printing plate is arranged on the 2D displacement platform, the finely zooming objective able to receive incident light beams is situated between the space optical modulator and a shutter, the shutter is situated above the photosensitive printing plate or the objective, and the space optical modulator is connected with the computer through the video driver. It has a concurrent character, able to largely increase speed and precision of making gradation masks and reducing production cost.

Description

Technical field: [0001] The invention relates to the field of precision optical instruments, in particular to a manufacturing method of a binary optical device and a device designed by the method. Background technique: [0002] Binary optics is a new branch of optics developed based on the theory of light wave diffraction. It is a frontier discipline formed by the mutual penetration and intersection of optics and microelectronics technology. Binary optical devices have the characteristics of small size, light weight, high diffraction efficiency, easy replication, low cost, etc., and can realize new functions such as miniaturization, array, integration, and arbitrary wavefront transformation that are difficult to achieve with traditional optics. For example, binary optical devices can be used as telescopic hybrid optical systems, smart beam control, multi-channel processing, detector arrays and adaptive optical interconnects in multi-channel micro-sensing systems; Veldkamp co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/38G03F7/20G06F3/00
Inventor 颜树华李圣怡戴一帆吕海宝杨健陈善勇杨智刘宗林
Owner NAT UNIV OF DEFENSE TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap