Precise vertical temperature-difference gradient condensation single crystal growth device and method thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- 长治虹源科技晶片技术有限公司
- Publication Date
- 2006-11-22
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The present invention relates to a high-quality single crystal growth preparation method, more specifically, the present invention is used for III-V or II-IV compound semiconductor materials, such as large-diameter gallium arsenide, indium phosphide, indium arsenide, phosphide A vertical temperature gradient condensation single crystal growth preparation method for gallium, indium antimonide, cadmium selenide, zinc telluride, germanium and silicon, etc. is disclosed. Background technique
[0002] The common VGF (Vertical Temperature Gradient Condensation) crystal growth method is to package the PBN (hot-pressed boron nitride) crucible containing polycrystalline materials in a quartz vessel, and then vertically put it into multiple temperature zones (generally there are three temperature zones, Four temperature zones, six temperature zones, etc.) VGF furnace growth. Ordinary VGF crystal growth furnace see figure 1 shown. The quartz vessel is a contai...