Method for producing light-transmitting electromagnetic wave-shielding film, light-transmitting electromagnetic wave-shielding film and plasma display panel using the shielding film

a technology of electromagnetic shielding film and shielding film, which is applied in the direction of metallic image processing, identification means, instruments, etc., can solve the problems of unsuitable shielding electromagnetic waves, damage to the health of operators of these apparatuses, and malfunctions of electronic or electric equipment, etc., and achieves high emi-shielding properties, low cost, and high transparency

Inactive Publication Date: 2008-07-24
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0024]The present invention has been achieved in view of the state of the art described above. An object of the present invention is to provide a method for producing an electromagnetic wave-shielding material simultaneously exhibiting high EMI-shielding property and hi

Problems solved by technology

It is pointed out that EMI not only causes malfunctions and damages to electronic or electric equipments, but also damages health of operators of these apparatuses.
Therefore, all of the aforementioned methods were unsuitable as a method for shielding electromagnetic waves, since the aforementioned methods often provide opaque display front faces.
However, this shielding material has a drawback that it has a thick mesh line width, and therefore when a display screen is shielded with this shielding material, the screen becomes dark, and thus characters displayed on the display are hard to see.
However, the line width of the printed catalyst is as large as about 60 μm and is not suitable for use in a display that requires a relatively small line width and a precise pattern.
However, the visible light transmittance of the conductive film is 72%, which means insufficient transparency.
In addition, since extremely expensive palladium must be used as the electroless plating catalyst, most part of which is removed after the exposure, this method also suffers from a problem of production cost.
However, this method suffers from problems of the time-consuming and complicated production process and thus high production cost.
Moreover, it is known that this mesh has a problem that, since it is produced by etching, the width of the intersectional points in the grid pattern is thicker than that of the straight line portions.
However, any method has not been known at all for forming conductive metal silver by such methods to shield electromagnetic waves emitted from image display surfaces of displays including CRT, PDP etc. without inhibiting the image display.
Therefore, they suffer from a problem that opaque physical development nuclei remain in an exposed portion in which the metal silver is not formed, and thus light transmission is degraded.
The aforementioned problem is serious particularly in a case that the metal pattern material is used as a light-transmitting electromagnetic wave-shielding material for a display such as CR

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0111]An emulsion containing silver iodobromide grains having an average diameter as sphere of 0.05 μm and 7.5 g of gelatin per 60 g of Ag in an aqueous medium was prepared. The emulsion was prepared so that the Ag / gelatin volume ratio should become 1 / 1. As the gelatin species, low molecular weight gelatin having an average molecular weight of 20,000 was used. Further, K3Rh2Br9 and K2IrCl6 were added to the emulsion, and the silver bromide grains were doped with Rh ions and Ir ions. This emulsion was added with Na2PdCl4, further subjected to gold and sulfur sensitization by using chloroauric acid and sodium thiosulfate and then applied to polyethylene terephthalate (PET) together with a gelatin hardening agent so that the applied amount of silver should become 1 g / m2. PET was made hydrophilic beforehand prior to the application. The dried coated film was exposed through a photomask in a grid pattern providing developed silver image of line / space=5 μm / 195 μm (photomask of line / space=...

example 2

[0124]Comparison was performed as follows with the silver salt diffusion transfer process in which silver is deposited on physical development nuclei (Japanese Patent Laid-open Publication No. 2000-149773, International Patent Publication WO01 / 51276 etc.), which is the “method for forming conductive metal silver utilizing silver salt” mentioned in the section of Prior art mentioned above.

[0125]A physical development nucleus layer and a photosensitive layer were applied on a support consisting of hydrophilized transparent TAC (triacetyl cellulose), exposed through a mesh photomask having a pitch of 200 μm and developed by the DTR method in the same manner as the method described in Japanese Patent Laid-open Publication No. 2000-149773 to produce Comparative Sample 1.

[0126]Further, in the same manner as in Example 1, Sample C according to the present invention was prepared by using a coated sample having a size of 4 cm×4 cm.

[0127]As for the mesh shapes of Sample C according to the pre...

example 3

[0131]In order to show that a high Ag / gelatin volume ratio is an important factor for obtaining higher conductivity when the conductive metal portion is obtained without utilizing the silver salt diffusion transfer process, the following experiment was conducted.

[0132]The amount of gelatin used in Example 1 was changed to prepare Samples D to G according to the present invention in which the Ag / gelatin volume ratio is 1 / 4 to 1 / 0.6, the line width of metal fine lines constituting the mesh was 12 μm, and the aperture ratio was 88%. The surface resistance was measured in the same manner as in Example 1 of the present specification.

[0133]Moreover, a case where a usual negative color film was used will be described for comparison. Since the Ag / binder (gelatin) volume ratio of a commercial negative color film is extremely small, i.e., about 1 / 17, the amount of gelatin used in Example 1 was changed to prepare Sample C having an Ag / gelatin volume ratio of 1 / 17. An experiment similar to that...

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Abstract

A silver salt-containing layer containing a silver salt and provided on a support is exposed and developed to form a metal silver portion and a light-transmitting portion, and then the metal silver portion is further subjected to physical development and/or plating to form a conductive metal portion consisting of the metal silver portion carrying conductive metal particles. A method for producing a light-transmitting electromagnetic wave-shielding film which enables production of an electromagnetic wave-shielding material simultaneously having high EMI-shielding property and high transparency in a fine line pattern and also enables mass production of such films at a low cost, and a light-transmitting electromagnetic wave-shielding film obtained by the production method and free from the problem of moire are provided.

Description

BACKGROUND OF THE INVENTION[0001]1. Field of the Invention[0002]The present invention relates to a method for producing an electromagnetic wave-shielding material which shields electromagnetic waves generated from front faces of displays such as CRT (cathode ray tube), PDP (plasma display panel), liquid crystal display, EL (electroluminescence) display and FED (field emission display), microwave oven, electronic equipment, printed wiring board and so forth and has transparency, and an electromagnetic wave-shielding material having transparency obtained by the production method.[0003]2. Description of the Background[0004]In recent years, electromagnetic interferences (EMI) have rapidly increased with the increase in utilization of various electric installations and electronics-applied equipments. It is pointed out that EMI not only causes malfunctions and damages to electronic or electric equipments, but also damages health of operators of these apparatuses. Therefore, it is required...

Claims

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Application Information

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IPC IPC(8): G03C5/29C03C17/10C03C17/36G02F1/13G03C1/08G03C5/58G09F9/00H01J9/20H01J11/44H01J29/86H05K9/00
CPCC03C17/10Y10T428/26C03C17/3676C03C2217/256C03C2217/445C03C2217/475C03C2217/93C03C2218/11G02F2001/133334G03C1/08G03C5/58H01J9/205H01J11/44H01J29/868H01J2211/446H01J2229/8636H01J2329/869H05K3/106H05K9/0096Y10T428/24273Y10T428/24802C03C17/36G02F1/133334Y10T442/10Y10T442/109Y10T442/112Y10T442/164
Inventor SASAKI, HIROTOMONISHIZAKURA, RYOUMORIMOTO, KIYOSHITAKADA, SHUNJI
Owner FUJIFILM CORP
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