Reflective anode and wiring film for organic el display device

Inactive Publication Date: 2011-09-15
KOBE STEEL LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0036]In accordance with the present invention, the Ag-based alloy in the reflective anode is excellent in heat resistance and moisture resistance, and has a high smoothness. For this reason, despite that an oxide conductive film such as ITO in direct contact thereon is stacked, the Ag-based alloy has a high smoothness. As a result, it becom

Problems solved by technology

The passive matrix type is simple in structure, but has a difficulty in providing full color.
In the case of the active matrix type organic EL display device, a plurality of TFTs and wires become obstacles, resulting in reduction of the area usable for organic EL pixels.
As the driving circuit becomes complicated, a

Method used

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  • Reflective anode and wiring film for organic el display device
  • Reflective anode and wiring film for organic el display device
  • Reflective anode and wiring film for organic el display device

Examples

Experimental program
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Effect test

example 1

[0068]Using a disk-like glass (Corning non-alkaline glass #1737, diameter: 50 mm, thickness: 0.7 mm) as a material for the substrate 1, a SiN film of the passivation film 3 was deposited at a substrate temperature: 280° C., and with a thickness: 300 nm. Further, using a DC magnetron sputtering device, on the surface of the passivation film 3, there were deposited 1000-angstrom-thick Ag-based alloy film 6 of Ag-(X)Nd-(Y)Cu (X: 0.2 to 0.7 at %, Y: 0.3 to 0.9 at %) and Ag-based alloy film 6 of Ag-(X) Bi (X: 0.1 to 1.0 at %) thin film. The deposition conditions at this step were as follows. Substrate temperature: room temperature, Ar gas pressure: 1 to 3 mTorr, interpole distance: 55 mm, and deposition rate: 7.0 to 8.0 nm / sec. Further, the ultimate vacuum before deposition of the Ag-based alloy film 6 was 1.0×10−5 Torr or less.

[0069]Then, samples in each of which deposition of the Ag-based alloy film 6 had been completed were divided into three groups (A to C). The samples of Group A we...

example 2

[0079]Using a disk-like glass (Corning non-alkaline glass #1737, diameter: 50 mm, thickness: 0.7 mm) as a material for the substrate 1, a SiN film of the passivation film 3 was deposited at a substrate temperature: 280° C., and with a thickness: 300 nm on the surface of the substrate 1. Further, using a DC magnetron sputtering device, an Ag-based alloy film of Ag-0.1Bi-0.2Nd, and an Ag-based alloy film 6 of Ag-0.1Bi-0.1Ge were deposited with a thickness of 1000 angstrom on the surface of the passivation film 3. The deposition conditions at this step were as follows. Substrate temperature: room temperature, Ar gas pressure: 1 to 3 mTorr, interpole distance: 55 mm, and deposition rate: 7.0 to 8.0 nm / sec. Further, the ultimate vacuum before deposition of the Ag-based alloy film 6 was 1.0×10−5 Torr or less.

[0080]Then, samples in each of which deposition of the Ag-based alloy film 6 had been completed were subjected to a heat treatment at a heat treatment temperature: 250° C., for a heat...

example 3

[0084]Out of the samples of the group A of Example 1, the ones in each of which the material for the Ag-based alloy film 6 was Ag-(X)Nd-(Y)Cu alloy (X: 0.7 at %, Y: 0.9 at %) were subjected to an environmental test (Aging Test). The environmental test was performed by exposing each sample under environment of a temperature of 80° C. and a humidity of 90% for 48 hours. Thus, the changes in surface roughness by AFM measurement were observed. FIG. 4 shows the results.

[0085]As apparent from FIG. 4, for the Ag-based alloy films in the present invention, the surface smoothness immediately after deposition (as-depo) is higher than that of pure Ag, and this scarcely changes even after the environmental test. This indicates that the aggregation resistance is improved by addition of Nd and Cu. In the present example, the example of Ag—Nd—Cu alloy was shown. However, even the Ag—Bi alloy provided the same results.

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Abstract

To avoid a phenomenon of deterioration which is characteristic to an organic EL display device, such as a dark spot, without forming a pin hole in an organic material used for forming an organic EL layer. A reflective anode for an organic EL display device includes: an Ag-based alloy film (6) containing 0.01 to 1.5 atomic % of Nd and formed on a substrate (1); and an oxide conductive film (7) formed on the Ag-based alloy film (6) and in direct contact with the film (6).

Description

TECHNICAL FIELD[0001]The present invention relates to a reflective anode, a wiring film, and a thin-film transistor substrate for use in an organic EL display device (particularly, top emission type), and a sputtering target.BACKGROUND ART[0002]An organic electroluminescence (which may be hereinafter described as an “organic EL”) display device which is one of self-emitting type flat panel display devices is an all solid-state flat panel display device in which organic EL devices are arrayed in a matrix on a substrate such as a glass substrate. In the organic EL display device, anodes and cathodes are formed in stripes, the portions of intersection of which correspond to pixels (organic EL devices). The organic EL devices are externally applied with a voltage of several volts, so that a current flows therethrough. As a result, organic molecules are raised to the excited state. When the organic molecules return to the base state (stable state), they emit an extra energy thereof as a ...

Claims

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Application Information

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IPC IPC(8): H01L33/12H01B5/00H01L33/08C23C14/14C23C14/34
CPCH01B1/02H01L27/3244Y10T428/12896H01L2251/5315H05B33/26H01L51/5218Y10T428/31678H10K59/12H10K50/818H10K2102/3026H10K50/813
Inventor TAUCHI, YUUKIOCHI, MOTOTAKASATO, TOSHIKI
Owner KOBE STEEL LTD
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