Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Ultralow dielectric constant polyimide film and its preparation method

A technology of ultra-low dielectric constant and polyimide film, which is applied in the field of polymer dielectric materials and its preparation, can solve the conflict of thermal/chemical stability and dielectric properties, and is not easy to scale application, process and technology Complexity and other issues, to achieve the effect of reducing the dielectric constant, improving the preparation efficiency, and simplifying the process and equipment

Inactive Publication Date: 2008-12-24
ZHEJIANG UNIV
View PDF14 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Solve the problem that the existing low dielectric constant polyimide material structure and composition conflict with thermal / chemical stability and dielectric properties; to solve the problem of expensive raw materials used in the existing low dielectric constant polyimide porous film preparation method , complex process and technology, high cost, and difficult large-scale application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Ultralow dielectric constant polyimide film and its preparation method
  • Ultralow dielectric constant polyimide film and its preparation method
  • Ultralow dielectric constant polyimide film and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0046] (1) Preparation of film-making solution-polyamic acid solution

[0047] Dissolve polyamic acid solids in polar solvents to prepare polyamic acid solutions, or directly add dianhydride and diamine monomers in a molar ratio of 1 / 1 to polar solvents, and stir at 15-30°C for 15- After 24 hours, the polyamic acid solution was obtained, and then vacuum degassed at room temperature for 1-12 hours to obtain the membrane-forming solution.

[0048] The dianhydride monomer of the polyamic acid is any one of pyromellitic dianhydride (PMDA) or 3,3',4,4'-benzophenone tetraacid dianhydride (BTDA), and the diamine monomer Any one of 4,4'-diaminodiphenyl ether (ODA) or p-phenylenediamine (PDA);

[0049] The polar solvent is any one of N,N-dimethylacetamide (DMAc), N,N-dimethylformamide (DMF) or N-methylpyrrolidone (NMP);

[0050] The mass concentration of the polyamic acid in the film forming liquid is 10-30%, and the mass concentration of the solvent is 70-90%.

[0051] The purpose ...

Embodiment 1

[0082] Example 1: Various implementation conditions and the structure and performance of the obtained ultra-low dielectric constant polyimide porous membrane are shown in Table 1.

[0083] Table I

[0084]

Embodiment 2

[0085] Example 2: The various implementation conditions and the structure and performance of the obtained ultra-low dielectric constant polyimide porous membrane are shown in Table 2.

[0086] Table II

[0087]

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
diameteraaaaaaaaaa
porosityaaaaaaaaaa
Login to View More

Abstract

The present invention discloses one kind of ultra low dielectric constant polyimide film and its preparation process. The polyimide film features its honeycomb structure of 5-2000 nm size, two compact surface layers, thickness of 10-200 microns and porosity of 30-85 %. The preparation process includes the following steps: 1. dissolving polyamic acid as the precursor of polyimide in polar solvent to compound filming liquid of 10-30 wt% concentration; 2. flow casting the filming liquid on some support to form liquid film of 50-500 micron thickness; 3. soaking the liquid film inside coagulating bath to solidify into polyamic acid film; 4. soaking and cleaning in detergent, and drying to obtain honeycombed polyamic acid film; and 5. heat treating the polyamic acid film at 100-300 deg.c to iminate so as to obtain honeycombed polyimide film of dielectric constant 1.45-2.50.

Description

technical field [0001] The technical field that the present invention relates to is polymer dielectric material and its preparation technology, especially relates to an ultra-low dielectric constant polyimide film and its preparation method. Background technique [0002] With the continuous development of electronic and electrical technology, the size of electronic and electrical equipment and its components is getting smaller and larger, and the power is getting bigger and bigger. Interference between the lines requires the use of interlayer materials with low dielectric constants to reduce capacitive effects or conductive coupling, thereby shortening the cycle time of signals and energy between conductor lines, reducing transmission lag, cross-interference between lines, and capacitive coupling, creating a larger capacity , Higher integration equipment or components. Therefore, the development of electronics and electrical technology not only puts forward higher requireme...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C08J5/18C08L79/08
Inventor 朱宝库楚晖娟张梅徐又一
Owner ZHEJIANG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com