Method for producing tiny soldered balls with repeatedly-usable substrates
A manufacturing method and substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as poor process controllability, easy introduction of various impurities, ineffective control of droplet size and continuous growth, etc. , to reduce production costs, avoid surface oxidation, wire drawing or fluffing, and avoid chipping, burrs and adhesion
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0025] The preparation process flow of a typical micro solder ball includes the following steps:
[0026] 1. Using IC manufacturing process to prepare reusable substrates
[0027] (1) First, clean the single-side polished N-type (100) silicon wafer, and then perform thermal oxidation treatment, and the thickness of the silicon dioxide oxide layer 102 is about 0.3 microns;
[0028] (2) Vacuum sputtering metal conductive layer TiW and Au 103, the thickness is about 0.05 microns and 0.2 microns, respectively; the adhesion between the silicon dioxide layer and Au is poor, so TiW is used as the metal adhesion layer on the silicon dioxide , The three layers of metal are all sputtered sequentially in the same vacuum chamber;
[0029] (3) Then deposit a layer of barrier layer SiO on the conductive layer by plasma enhanced chemical vapor deposition (PECVD) method 2 Or Si 3 O 4 104, the thickness is about 0.1 micrometers; the circular barrier layer opening is etched by positive photoresist ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com