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Method for manufacturing multiple stage micro-reflector by double film alternating corrosion

A technology of micro-mirror and film layer, which is applied in the photoplate process of mirrors and patterned surfaces, optics, etc. It can solve problems such as difficulty in ensuring horizontal accuracy, poor accuracy and repeatability, and difficulty in accurately controlling corrosion or etching depth. Achieve high flatness, good repeatability, and improve the effect of step longitudinal dimension accuracy and repeatability

Inactive Publication Date: 2010-06-02
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Multi-level micromirrors can be used to prepare stepped microstructures on various materials such as quartz through multiple photolithography and multiple corrosions (dry or wet) on the substrate by binary optical technology. This method has the following disadvantages: 1. Due to multiple overlays, the horizontal accuracy is difficult to guarantee; 2. It is difficult to accurately control the corrosion or etching depth, and the accuracy and repeatability are poor

Method used

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  • Method for manufacturing multiple stage micro-reflector by double film alternating corrosion
  • Method for manufacturing multiple stage micro-reflector by double film alternating corrosion
  • Method for manufacturing multiple stage micro-reflector by double film alternating corrosion

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Embodiment 1

[0024] The specific steps of the method for manufacturing a multi-stage micro-mirror by alternate etching of double films of the present invention are as follows:

[0025] (1) The substrate used for the multi-stage micro-mirror adopts double-sided polished glass, silicon dioxide or fused silica, and the surface roughness of the substrate is 0.2nm~1μm. The cleaning steps are as follows:

[0026] 1) Ultrasonic cleaning with toluene, acetone, ethanol for 15 minutes to remove oil and other organic matter;

[0027] 2) Boil a mixture of concentrated sulfuric acid and concentrated nitric acid to remove metal ions, where the volume ratio of sulfuric acid and nitric acid is 3:1;

[0028] 3) Ultrasonic cleaning with deionized water, dehydration with absolute ethanol and drying.

[0029] (2) Molybdenum film and silicon film materials are alternately deposited on the roughness of glass or quartz substrate by magnetron sputtering or radio frequency sputtering or ion beam sputtering or direct current...

Embodiment 2

[0037] The specific steps of the method for manufacturing a multi-stage micro-mirror by alternate etching of double films of the present invention are as follows:

[0038] (1) The substrate used for the multi-stage micro-mirror adopts molybdenum or silicon carbide wafers that are polished on both sides, and the surface roughness of the substrate is 0.2nm~1μm. The cleaning steps are as follows:

[0039] 1) Ultrasonic cleaning with toluene, acetone, ethanol for 15 minutes to remove oil and other organic matter;

[0040] 2) Boil a mixture of sulfuric acid and nitric acid to remove metal ions (except molybdenum flakes), where the volume ratio of sulfuric acid and nitric acid is 3:1;

[0041] 3) Ultrasonic cleaning with deionized water, dehydration with absolute ethanol and drying.

[0042] (2) Alternate deposition of silicon dioxide film and silicon film materials on molybdenum or silicon carbide by magnetron sputtering or radio frequency sputtering or ion beam sputtering or direct current ...

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Abstract

The invention relates to a method for producing a multi-stage microreflecting mirror by alternately corroding double films, which belongs to the multi-stage microreflecting mirror production method field. The invention mainly comprises the following steps that: a substrate of the multi-stage microreflecting mirror is produced, and undergoes the cleaning treatment; two different film materials arealternately deposited on the surface of the substrate to form alternating film layers; the upper surface of the film layer is coated with high corrosion-resistant photoresist and is photoetched, thenetching solution corresponding to the two film materials are respectively used to alternatively perform wet etching or dry etching, the photoresist is removed, and the upper surface is cleaned; a multi-stage staircase structure with preset stages is obtained through a plurality of times of photoetching and etching; finally the upper surface of the multi-stage staircase structure is deposited witha reflection increasing film layer. The alternating deposition to the film layers with different materials is adopted, and then two etching solution are respectively used to alternatively etch, so themethod can accurately control the etching depth during the production, and effectively improves the longitudinal dimension accuracy and the repetitiveness of the multi-stage microreflecting mirror. Moreover, the method has strong process controllability and good repetitiveness.

Description

Technical field [0001] The invention relates to a manufacturing method of a multi-stage micro-reflecting mirror, in particular to a method of manufacturing a multi-stage micro-reflecting mirror for visible and infrared bands by adopting double-film alternate etching. Background technique [0002] As a kind of light reflecting device, multi-stage micro-mirror has more and more extensive applications in optical systems, such as: spectrum analysis, beam shaping and fiber coupling. [0003] With the development of optical systems in the direction of small size and compact structure, the miniaturization of optical devices in optical systems has become an important research topic of optical devices. The design and manufacturing level of micro-optical devices directly determines the performance of the optical instrument. Multi-level micro-mirrors can be used to prepare stepped microstructures on quartz and other materials through multiple photolithography and multiple etchings (dry or wet...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00G02B1/10G02B5/08G02B1/14
Inventor 梁中翥梁静秋
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI