Method for manufacturing photoelectricity semiconductor element of semiconductor containing P-type three-tribe nitrogen compound
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- ZHANJING TECH SHENZHEN
- Publication Date
- 2011-04-06
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a method for manufacturing an optoelectronic semiconductor element containing P-type III-group nitrogen compound semiconductor, in particular to a method for activating P-type dopant in the III-group nitrogen compound semiconductor. Background technique
[0002] As light-emitting diode elements are widely used in different products, in recent years, materials for making blue light-emitting diodes have become an important research and development object in the current optoelectronic semiconductor material industry. At present, the materials of blue light-emitting diodes include zinc selenide (ZnSe), silicon carbide (SiC) and indium gallium nitride (InGaN). above eV.
[0003] Since the gallium nitride series is a light-emitting material with a direct gap, it can produce high-brightness illumination light, and has the advantage of longer life than zinc selenide, which also has a direct gap. In addition, the energy gap of gallium...