Method for preparing hybrid medium of waveguide distributed feedback structure with fluctuant surface
A technology of distributed feedback and hybridization, applied in the direction of active dielectric materials, laser components, electrical components, etc., to achieve the effect of simple process, easy control and high efficiency
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Embodiment 1
[0032] step 1:
[0033] Irradiate a commercial photoresist plate such as Chp-C with two polarized interference 488nm Ar+ lasers, HPR photoresist No. 15 (polyvinyl alcohol cinnamate No. 15), photoresist No. 16 (polyvinyl alcohol oxyethyl Aldehyde cinnamate No. 16), photoresist BP218 (300), AZ4110, etc. The exposure time is 10-150s, and then the exposed photoresist is soaked in NaOH aqueous solution with a concentration of 0.1-10wt%, the developing time is 1-15s, and the one-dimensional photonic crystal structure with surface fluctuations is obtained after drying. micropattern master.
[0034] Step 2:
[0035] The preparation of the soft stamp with micropatterns on the surface is to mix the prepolymer of polydimethylsiloxane (PDMS, purchased from Dow Corning Company) and the supporting crosslinking agent according to the ratio of 20:1 to 5:1 by mass Uniform, vacuum degassed for 10-60 minutes, cast into the mold of the micro-pattern master plate with one-dimensional photonic c...
Embodiment 2
[0041] The difference from Example 1 is that the photoresist plate in Step 1 of Example 1 is replaced by an azo polymer film. The specific process steps are as follows:
[0042] Dissolve 0.05-1 g of azo polymer such as BP-AZ-CA molecule reported in document Polymer 43 (2002) 7325-7333 in 1 ml of N, N-dimethylformamide (DMF), and use 0.2 Filter with a μm needle filter, then spin-coat the filtered solution on a glass slide to form a film, and dry it at 40-80°C for 2-48 hours to obtain an azo polymer film with a smooth surface; irradiate with two beams of 488nm Ar+ laser beams The azo polymer film takes 5 to 60 minutes to obtain a micropattern master plate with a one-dimensional photonic crystal structure with surface fluctuations.
Embodiment 3
[0044] The difference from Example 1 is that the micropattern master of the one-dimensional photonic crystal structure with surface relief obtained by the photoresist in step 1 of Example 1 is replaced by a microstructure with surface relief produced by micromachining. of the master. That is to use a special grating marking machine to directly mark the substrate (silicon wafer or glass wafer or polymethyl methacrylate wafer or polyurethane wafer, etc.) by means of mechanical marking.
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