A non-vacuum solar spectrum selective absorption film layer and its preparation method

A technology of absorbing film layer and solar spectrum is applied in the field of solar thermal utilization materials, which can solve the problems of low radiation performance and low resistivity, and achieve the effects of simple preparation method, low cost and light weight.

Active Publication Date: 2011-12-14
GRIMAT ENG INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

(2) TiAlN thin film has low resistivity, and should have low radiation performance in the mid-to-far infrared; (3) Recently, Harish C et al. have obtained TiAl with an oxidation resistance of 600 degrees Celsius, an absorption rate of 0.95, and an emissivity of 0.07. Nitrogen / titanium aluminum oxynitride / silicon nitride film layer; (4) no one at home and abroad has conducted in-depth research on the optical properties of the titanium aluminum nitrogen film layer, especially the thermal control characteristics of the titanium aluminum nitrogen film layer (that is, visible absorption , thermal infrared emission characteristics and infrared reflection characteristics) research is still in the blank stage

Method used

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  • A non-vacuum solar spectrum selective absorption film layer and its preparation method
  • A non-vacuum solar spectrum selective absorption film layer and its preparation method
  • A non-vacuum solar spectrum selective absorption film layer and its preparation method

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Embodiment 1

[0042] (1) The TX-1000 multi-target composite coating machine produced by Beijing Tianruixing Co., Ltd. was used for coating; in order to improve the bonding force between the titanium nitrogen oxide film and the substrate, the substrate material was respectively soaked in sulfuric acid, detergent, and detoxification before being placed in the vacuum chamber. Sonicate in ionized water, gasoline, and ethanol for 5 to 20 minutes, then dry; place in a vacuum chamber, bake at 100 degrees Celsius for 10 minutes, and the experimental background vacuum is 3×10 -3 Pa, before the sample is deposited, argon is introduced to a pressure of 8×10 -2 Pa, the cathode current is 75 amps, and the negative bias voltage of 800 volts bombards the surface of the sample with argon ions to remove the gas and impurities adsorbed on the surface and expose a clean surface. When the background vacuum in the vacuum sputtering chamber is better than 3×10 -3 Introduce appropriate amount of reaction gases n...

Embodiment 2

[0049] (1) The TX-1000 multi-target composite coating machine produced by Beijing Tianruixing Co., Ltd. was used for coating; in order to improve the bonding force between the titanium nitrogen oxide film and the substrate, the substrate material was respectively soaked in sulfuric acid, detergent, and detoxification before being placed in the vacuum chamber. Sonicate in ionized water, gasoline, and ethanol for 5 to 20 minutes, then dry; place in a vacuum chamber, bake at 100 degrees Celsius for 10 minutes, and the experimental background vacuum is 3×10 -3 Pa, before the sample is deposited, argon is introduced to a pressure of 8×10 -2 Pa, the cathode current is 75 amps, and the negative bias voltage of 800 volts bombards the surface of the sample with argon ions to remove the gas and impurities adsorbed on the surface and expose a clean surface. When the background vacuum in the vacuum sputtering chamber is better than 3×10 -3 Introduce an appropriate amount of reaction gas ...

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Abstract

A non-vacuum solar spectrum selective absorption film layer and its preparation method. The absorption film layer is provided with a titanium aluminum film layer, a titanium aluminum nitrogen film layer, a titanium aluminum oxynitride film layer, and a titanium aluminum oxynitride film layer sequentially from the inside to the outside on a stainless steel or copper substrate. The film layer and the titanium aluminum oxide film layer; each film layer is prepared by multi-arc ion plating, and the target material is a titanium aluminum alloy target with an atomic ratio of titanium and aluminum of 50:50; by controlling the argon gas in the multi-arc ion plating atmosphere , nitrogen and oxygen flow to control the composition of nitrogen and / or oxygen in each film layer. The method comprises: (1) selecting a base material and cleaning it; (2) baking the base material in a vacuum sputtering chamber of a multi-target composite coating machine; (3) bombarding the surface of the base material with argon ions; (4) The substrate material is coated; (5) annealing treatment is performed. The film-receiving layer has a high absorption rate α in the solar spectrum range (0.3-2.5 microns), a very low emissivity ε in the infrared region (2-50 microns), has high-temperature oxidation resistance, and meets the requirements of high-temperature utilization of solar energy. Require.

Description

technical field [0001] The invention relates to a non-vacuum solar spectrum selective absorption film layer and a preparation method thereof, belonging to the technical field of solar heat utilization materials. Background technique [0002] The solar selective absorption film is characterized by a high absorption rate α in the solar spectral range (0.3-2.5 microns), and a very low emissivity ε in the infrared region (2-50 microns); it can convert low energy density The conversion of solar energy into heat energy with high energy density, enriching solar energy and improving the efficiency of solar thermal conversion is an important content in the research work of solar thermal utilization. In the past 20 to 30 years of research in our country, the main achievements are limited to low-temperature utilization, and the fields include daily bathing, swimming pool heating, seawater desalination, heating, drying, and breeding. But from a long-term point of view, medium and high ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): F24J2/48B32B15/04B32B33/00C23C14/34C23C14/14C23C14/54
CPCY02E10/40
Inventor 郝雷王树茂蒋利军刘晓鹏李华玲李志念李国斌
Owner GRIMAT ENG INST CO LTD
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