Growing method of large-size flaky sapphire crystals
A sapphire crystal and growth method technology, which is applied in the field of sapphire crystal manufacturing, can solve the problems of inability to grow single crystals with temperature gradients, low utilization rate of crystal materials, high internal stress value of crystals, etc., and achieve reasonable distribution of radial temperature and axial temperature , remove energy efficiency loss, and improve integrity
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example 1
[0021] Example 1: The resistance heating single crystal furnace is adopted, the heating power is 20kw, the heating method is graphite resistance heating, the heating control is the constant current source mode, and the single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die opening is 110mm wide and 5mm thick. Put 700g of pretreated α-alumina into a crucible made of pure tungsten, turn on the water cooling system of the equipment so that the flow rate of the water outlet of the system is 1.5m 3 / h. Vacuum the furnace to 3.2×10 -2 After Pa, turn on the heating power supply, heat the raw material with a heating slope of 200w / min, the vacuum degree drops halfway, and the vacuum degree gradually rises to 3.2×10 after 20 minutes. -2 Pa. When the heating power rises to 18Kw, turn on the high-purity argon gas inlet and outlet system, adjust the flow rate at 0.1-50slpm, and th...
example 2
[0022] Example 2: The resistance heating single crystal furnace is adopted, the heating power is 45kw, the heating method is graphite resistance heating, the heating control is the constant current source mode, and the single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die mouth is 150mm wide and 12mm thick. Put 1200g of pretreated α-alumina into a crucible made of pure molybdenum, turn on the water cooling system of the equipment, and the flow rate of the water outlet of the system is 1.4m 3 / h. Vacuum the furnace to 3.5×10 -2 Pa, turn on the heating device, heat the raw material at a heating rate of 9.5w / min, turn on the high-purity argon gas inlet and outlet system at 19.5kw, adjust the flow rate at 0.2-40slpm, and then turn on the pressure control system, the pressure is at 400Pa-70Kpa. Continue to raise the temperature until the raw material melts. After the seed...
example 3
[0023]Example 3: A resistance heating single crystal furnace is used, the heating power is 10kw, the heating method is graphite resistance heating, and the heating control is a constant current source mode. The single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die mouth is 80mm wide and 0.8mm thick. Put 150g of pretreated α-alumina into a crucible made of pure molybdenum, turn on the water cooling system of the equipment, and the flow rate of the water outlet of the system is 1.4m 3 / h. Vacuumize the furnace 3.5×10 -2 Pa, open the high-purity argon gas inlet and outlet system, adjust the flow rate at 0.2-40slpm, and then open the pressure control system, the pressure is at 400Pa-70Kpa. Turn on the heating device and heat the raw material at a heating rate of 130w / min until the raw material melts. After the seed crystal is in contact with the guide die opening, observ...
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