Growing method of large-size flaky sapphire crystals

A sapphire crystal and growth method technology, which is applied in the field of sapphire crystal manufacturing, can solve the problems of inability to grow single crystals with temperature gradients, low utilization rate of crystal materials, high internal stress value of crystals, etc., and achieve reasonable distribution of radial temperature and axial temperature , remove energy efficiency loss, and improve integrity

Inactive Publication Date: 2010-10-13
镇江市丹徒区黄墟润蓝晶体制造厂
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among the above methods, the flame method cannot grow single crystals with a diameter larger than 50mm due to the large temperature gradient, and the defects and internal stress values ​​of the crystals are relatively high, so the scope of application is greatly limited.
Large-sized sapphire crystals can be grown by methods such as pulling method, kyropoulos method, heat exchange method, and guided temperature gradient method, but they need to go through a series of heavy mechanical processing such as high hardness cutting, molding, and grinding before they can be made into suitable crystals. The shape and size of the crystal are complex, the process is more complicated; the cost is high and time-consuming; the utilization rate of crystal materials is low, the work efficiency is not high, and the cost remains high

Method used

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Examples

Experimental program
Comparison scheme
Effect test

example 1

[0021] Example 1: The resistance heating single crystal furnace is adopted, the heating power is 20kw, the heating method is graphite resistance heating, the heating control is the constant current source mode, and the single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die opening is 110mm wide and 5mm thick. Put 700g of pretreated α-alumina into a crucible made of pure tungsten, turn on the water cooling system of the equipment so that the flow rate of the water outlet of the system is 1.5m 3 / h. Vacuum the furnace to 3.2×10 -2 After Pa, turn on the heating power supply, heat the raw material with a heating slope of 200w / min, the vacuum degree drops halfway, and the vacuum degree gradually rises to 3.2×10 after 20 minutes. -2 Pa. When the heating power rises to 18Kw, turn on the high-purity argon gas inlet and outlet system, adjust the flow rate at 0.1-50slpm, and th...

example 2

[0022] Example 2: The resistance heating single crystal furnace is adopted, the heating power is 45kw, the heating method is graphite resistance heating, the heating control is the constant current source mode, and the single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die mouth is 150mm wide and 12mm thick. Put 1200g of pretreated α-alumina into a crucible made of pure molybdenum, turn on the water cooling system of the equipment, and the flow rate of the water outlet of the system is 1.4m 3 / h. Vacuum the furnace to 3.5×10 -2 Pa, turn on the heating device, heat the raw material at a heating rate of 9.5w / min, turn on the high-purity argon gas inlet and outlet system at 19.5kw, adjust the flow rate at 0.2-40slpm, and then turn on the pressure control system, the pressure is at 400Pa-70Kpa. Continue to raise the temperature until the raw material melts. After the seed...

example 3

[0023]Example 3: A resistance heating single crystal furnace is used, the heating power is 10kw, the heating method is graphite resistance heating, and the heating control is a constant current source mode. The single crystal furnace is equipped with a protective gas inlet and outlet device and an automatic pressure control device. The prefabricated size of the guide die mouth is 80mm wide and 0.8mm thick. Put 150g of pretreated α-alumina into a crucible made of pure molybdenum, turn on the water cooling system of the equipment, and the flow rate of the water outlet of the system is 1.4m 3 / h. Vacuumize the furnace 3.5×10 -2 Pa, open the high-purity argon gas inlet and outlet system, adjust the flow rate at 0.2-40slpm, and then open the pressure control system, the pressure is at 400Pa-70Kpa. Turn on the heating device and heat the raw material at a heating rate of 130w / min until the raw material melts. After the seed crystal is in contact with the guide die opening, observ...

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Abstract

The invention relates to a manufacture technology of sapphire crystals, in particular to a growing method of large-size flaky sapphire crystals. A crystal growing process of the method is carried out in a single-crystal growing furnace internally provided with a crucible and a guide mould, wherein the crystal growing process sequentially comprises the following steps of: sapphire raw material heating, seeding, shouldering, constant-diameter lifting and cooling. The single-crystal growing furnace is internally provided with a protective gas inlet and outlet system capable of introducing and exhausting protective gas and a pressure control system capable of controlling the pressure in the furnace, wherein the protective gas is introduced into the furnace in the steps of sapphire raw material heating, seeding, shouldering and constant-diameter lifting and is formed into flowing gas in the furnace through the protective gas inlet and outlet system, and the gas inlet flow of the protective gas is 0.1-50slpm; and meanwhile, the pressure in the furnace is controlled to be 100pa-90kpa through the pressure control system. The method can be directly used for growing the flaky sapphire crystals with a larger size and has simple manufacture procedure, high material utilization ratio and low manufacture cost.

Description

technical field [0001] The invention relates to a manufacturing technology of sapphire crystals, in particular to a method for growing large-size flaky sapphire crystals. Background technique [0002] Sapphire (α-alumina) crystal material is a colorless and transparent single crystal material. Because sapphire crystal has a similar structure to gallium nitride, has a similar thermal expansion coefficient to silicon, and has good UV resistance, it is widely used in LEDs, SOS integrated circuits, and satellite space technology. [0003] Sapphire crystals have good transmission performance in the spectral range from visible light to 5.6um and are used as optical window materials for many measurement and analysis instruments. The anisotropy of sapphire crystal is applied to waveguide laser cavity, surface acoustic wave filter, delay line, ultrasonic transmission element; the hardness of sapphire crystal (Mohs degree 9) is second only to diamond, and it has high hardness and str...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/20
Inventor 丁盱洁
Owner 镇江市丹徒区黄墟润蓝晶体制造厂
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