Manufacturing method of polyether-ether-ketone thin film

A technology of polyether ether ketone film and manufacturing method, which is applied in the field of polymer material resin, and can solve the problems of unsatisfactory film crystallization performance results and the like

Active Publication Date: 2011-01-12
陈逊
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] In the Chinese patent 200410081436.4, the purification method of polyether ether ketone resin is introduced, which is to treat and purify polyether ether ketone resin on the basis of using N-methylpyrrolidone as a solvent and adding a surface compound as an auxiliary agent, like this Due to the addition of another substance in the purification method, according to the princip

Method used

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  • Manufacturing method of polyether-ether-ketone thin film
  • Manufacturing method of polyether-ether-ketone thin film
  • Manufacturing method of polyether-ether-ketone thin film

Examples

Experimental program
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Effect test

Embodiment 1

[0039] Add 218.2kg of 4,4'-difluorobenzophenone into a reaction polymerization kettle with 1842kg of sulfolane as a solvent, heat it with an electric heater, feed in nitrogen and keep stirring, when the temperature rises to 150-160°C, Add 106kg anhydrous alkali metal carbonate, 228.29kg bisphenol A respectively again successively; The mol ratio of 4,4'-difluorobenzophenone and bisphenol A and alkali metal carbonate is 1: 1: 1, So that the solid-liquid ratio is 0.25-0.3: 1; then continue to heat up, when the temperature rises to 250 ° C, after 3 hours of heat preservation, the temperature is then raised to 290 ° C for 6 hours of heat preservation. Then the mixture was poured into ice water at -5°C, rapidly cooled to normal temperature, and filtered, then the sulfolane solvent in the mixture was washed out with 30% chloroform-containing absolute ethanol, and finally the mixture was repeatedly washed with deionized water to obtain High polyether ether ketone resin.

[0040] The ...

Embodiment 2

[0048] The polyetheretherketone resin was synthesized using the process conditions and data in Example 1, thereby obtaining a polyetheretherketone resin with low purity.

[0049] The polyether ether ketone resin obtained above was re-added into the washing tank filled with sulfolane solvent containing 30% deionized water, and heated to 220° C. for 1 hour. Filtrate while it is hot, then pour the mixture into ice water at -5°C, rapidly cool to room temperature, and filter, then wash out the sulfolane solvent in the mixture with acetone, and finally wash the mixture repeatedly with deionized water, and dry to obtain the melt flow index It is 10.3g / 10min polyetheretherketone resin.

[0050] Utilize the above process to obtain the polyether ether ketone resin with the addition of inorganic fillers and organic compounds: 91.6% polyether ether ketone, 0.3% inorganic filler nano-scale silica, 8.1% organic filler polyester resin, and mix these materials into Film premix, the film prem...

Embodiment 3

[0057] The polyetheretherketone resin was synthesized using the process conditions and data in Example 1, thereby obtaining a polyetheretherketone resin with low purity.

[0058] The polyether ether ketone resin obtained above was added again into the washing kettle containing sulfolane solvent containing 30% deionized water, and heated to 214° C. for 1.3 hours. Filtrate while it is hot, then pour the mixture into ice water at -1°C, rapidly cool to room temperature, and filter, then wash out the sulfolane solvent in the mixture with absolute ethanol, and finally wash the mixture repeatedly with deionized water, and dry to obtain a molten Polyetheretherketone resin with flow index of 14.7g / 10min.

[0059] The polyether ether ketone resin film obtained by the above process is added with inorganic fillers and organic compounds. The formula is: 93.6-91.6% polyether ether ketone, 0.2% inorganic filler nano-scale silica, 6.2% organic filler polyester resin; these substances are mixe...

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Abstract

The invention discloses a manufacturing method of a polyether-ether-ketone thin film, which comprises the following steps: adopting 4,4'-difluoro benzophenone and bisphenol A as raw materials, adopting sulfolane as a solvent, carrying out condensation polymerization under the action of an alkali metal carbonate assistant for synthesizing polyether-ether-ketone resin; then adding 0.2-0.3% of inorganic nano-material and 5.0-8.1% of organic filler and other compounds or high-temperature elastomer material into the polyether-ether-ketone resin, mixing the substances into thin film raw materials according to a certain proportion, extruding the materials by a twin-screw extruder, passing through a T-shaped die with the width of 1-5mm and the length of 150-200mm, andfurther increasing the breadth of the thin film to 1000-2000m via two-way drafting and finally to obtain the polyether-ether-ketone thin film. The manufacturing method can be widely used in electronic and electrical appliances, war industry, aerospace, aviation and the like.

Description

technical field [0001] The invention belongs to the field of polymer material resin, especially polyether ether ketone film production. Background technique [0002] Polyether ether ketone (PEEK) has high temperature resistance, it has a high glass transition temperature (Tg=143°C) and melting point (Tm=334°C), its load heat distortion temperature is as high as 316°C, and its long-term use temperature is 260 °C, the instantaneous use temperature can reach 300 °C. The mechanical properties of polyether ether ketone (PEEK) are rigid and flexible, especially the fatigue resistance under alternating stress is very outstanding, comparable to alloy materials. Polyetheretherketone (PEEK) has self-lubricating properties and excellent sliding properties, and is suitable for occasions that strictly require low friction coefficient and wear resistance, especially the sliding grades of PEEK modified with carbon film, graphite, and PTFE. Abrasion is very good. Corrosion resistance Exc...

Claims

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Application Information

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IPC IPC(8): C08L61/16C08G8/02B29C47/92B29C55/12B29C48/92
CPCB29C48/92B29C2948/92628B29C2948/92638B29C2948/92704B29C2948/92895B29C2948/92904
Inventor 陈逊
Owner 陈逊
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