Heat-type wind-speed and wind-direction sensor with heat insulation structure and preparation method thereof
A technology of wind speed, wind direction, and thermal isolation. It is used in semiconductor/solid-state device manufacturing, using thermal variables to measure fluid velocity, and instruments. It can solve problems such as increasing sensors, unstable performance, and damage.
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Embodiment 1
[0044] The manufacturing process of a thermal wind speed and direction sensor with thermal isolation structure is as follows:
[0045] The first step, the preparation of the silicon chip, see Figure 1 to Figure 3
[0046]Step 1, thermally growing a first thermal oxide layer 2 on the surface of the silicon chip 1;
[0047] Step 2, chemical vapor deposition of a silicon nitride layer 3 on the first thermal oxide layer 1;
[0048] Step 3, using RIE technology to etch the silicon chip 1 to define the active region 4;
[0049] Step 4, chemical vapor deposition of the second oxide layer 5;
[0050] Step 5, using CMP technology to polish the silicon chip 1;
[0051] Step 6, removing the silicon nitride layer 3 by wet etching, and preparing the field oxide layer 6;
[0052] Step 7, P ion implantation to prepare N well 7;
[0053] Step 8, thermally growing the gate oxide layer 8;
[0054] Step 9, B ion implantation, preparing the heating resistor 9 and one end 10 of the tempera...
Embodiment 2
[0068] A thermal wind speed and direction sensor with a thermal isolation structure, comprising a silicon chip 1 and a ceramic substrate 20, the silicon chip 1 is located above the ceramic substrate 20, four heating elements 9 and 4 heat-sensing temperature-measuring elements 15, characterized in that a heat-insulating groove 16 is arranged between the heating element 9 and the heat-sensing temperature-measuring element 15, below the heat-sensing temperature-measuring element 15 on the back side of the silicon chip 1 A heat insulation cavity 17 is provided, and a gold layer 18 on ceramics and a gold layer 19 on silicon are provided between the silicon chip 1 and the ceramic substrate 20, and the gold layer 18 on ceramics and the gold layer 19 on silicon are connected through a gold-gold bonding process, It is used for thermal connection between the silicon chip 1 and the ceramic substrate 20 .
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