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Electron beam ablation propulsion method and system

A technology of electron beam and high-current electron beam, which is applied in the field of electron beam ablation propulsion method and system, can solve the problems of shallow interaction depth between laser and material, low energy utilization rate of thruster, and limitation of thruster target selection, etc., to achieve The effect of small ablation beam spot, large total stroke and long service life

Active Publication Date: 2011-07-06
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Because this propulsion technology uses laser as the energy source and the characteristics of the laser itself, the laser propulsion technology has the following disadvantages: 1. The energy conversion efficiency of the laser is low. The energy conversion efficiency of the commonly used CO2 laser is less than 20%, and the latest fiber laser conversion The efficiency does not exceed 30%, which leads to low energy utilization of the thruster; 2. For single-element materials with high specific impulse performance, the impulse coupling coefficient of laser ablation is low, and the thrust generated is small; 3. The relationship between laser and material The depth of action is relatively shallow; 4. It is difficult for lasers to ablate materials with high reflectivity, which limits the choice of target materials for thrusters; 5. Due to the long action time of millisecond-level lasers, the target material can only choose polymers with low thermal conductivity However, due to the limitations of existing laser technology, it is difficult to apply to microsatellites after miniaturization design.

Method used

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  • Electron beam ablation propulsion method and system
  • Electron beam ablation propulsion method and system
  • Electron beam ablation propulsion method and system

Examples

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Embodiment 1

[0018] As shown in FIG. 1 , the electron beam ablation propulsion system of this embodiment includes: an electron beam generating device 101 and a target 102 .

[0019] The electron beam generating device 101 generates electron beams, and makes the electron beams pass through the exit of the electron beam generating device 101 and shoot toward the target 102 to generate ablation recoil thrust along the electron beam transmission direction. The target 102 receives the electron beam generated by the electron beam generating device 101 , and generates gas or tiny particles outward (opposite to the direction of electron beam transmission) under the ablation effect of the electron beam. The material of the target 102 may be gold, silver, copper, aluminum, etc., and the present invention is not limited thereto.

[0020] The electron beam ablation propulsion system of this embodiment can also be as Figure 1B as shown, Figure 1B and Figure 1A The difference is that the target is ...

Embodiment 2

[0038] Such as Figure 4 As shown, the present embodiment provides an electron beam ablation advancing method, the method comprising:

[0039] Using an electron beam generating device to generate an electron beam, and causing the electron beam to pass through the exit of the electron beam generating device to the target S401;

[0040] The electron beam ablates the target material to generate recoil thrust to push the target material, that is, the electron beam ablates the target material, causing the target material to eject gas or tiny particles outward, and at the same time generate a reaction force. Impact thrust; the recoil thrust pushes the target S402.

[0041] The electron beam generating device 101 can be a short-pulse high-current electron beam generating device, including: Marx generator-pulse forming line-multistage discharge chamber, trigger-single-stage discharge chamber, pseudo-spark discharge device, etc. The present invention only uses pseudo-spark The spark ...

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Abstract

The invention provides an electron beam ablation propulsion method and system. The electron beam ablation propulsion method comprises the following steps: an electron beam generator is adopted to generate an electronic beam and lead the electronic beam to shoot at a target through an outlet of the electron beam generator; the electronic beam ablates the target to generate a kickback thrust to push the target. The invention has very high energy conversion efficiency, solves the problem of being incapable of using singleton metals with high specific impulse performances due to low coupling coefficient of impulses in laser ablation propulsion technology, has extremely short action time, can realize single injection of tiny impulse, has quick response time for the mutual action with the target, has small ablation beam spots and action area, is convenient to precisely locate the propulsion, can finish control on the propulsion performances by adjusting the pulse width, frequency, and peak power density, and the like of a beam source, is not influenced by the reflection performance of the target, and has very low ablation quality for each pulse; therefore, a propeller has very large overall pulse, and long service life.

Description

technical field [0001] The invention relates to plasma propulsion technology, in particular to an electron beam ablation propulsion method and system. Background technique [0002] In the aerospace field, satellite miniaturization has become a development trend. In recent years, with the development of mechanical microelectronics technology, micro-satellite, nano-satellite and pico-satellite technology has developed rapidly. In order to build a micro-satellite constellation, it is necessary to carry out precise orbit change and attitude adjustment control on the micro-satellites, which not only requires the thruster to be as small as possible, but also requires the thruster to provide a propulsive force with a range as large as possible, that is, to generate μN. Propelling force to the order of mN. [0003] Existing MEMS propulsion technologies include chemical propulsion and electric propulsion. Common thrusters need to be processed in centimeter-scale chips through chip ...

Claims

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Application Information

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IPC IPC(8): F03H1/00H05H1/00
Inventor 乐小云王莹张高龙张洁荣翠华王立英喻晓沈杰屈卫卫郭晨雷
Owner BEIHANG UNIV
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