A white light led without phosphor powder
A phosphor-free, white light technology, applied in the field of white light LEDs, can solve problems such as difficult control of uniformity and consistency, uneven color of white light, and reduced efficiency, so as to improve energy conversion efficiency and lifespan, improve color rendering index, The effect of improving quality
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Embodiment 1
[0031] 1. Clean the substrate. The ion-implanted sapphire substrate is ultrasonically cleaned in HCl, acetone, absolute ethanol, and deionized water, and then placed in a reaction furnace;
[0032] 2. Introduce hydrogen (H 2 ) was warming up to 1020°C and cleaned for 3 minutes;
[0033] 3. Grow 30nm low-temperature nucleation layer GaN at 550°C;
[0034] 4. Anneal at 750°C for 5 minutes;
[0035] 5. Grow 2μm non-doped GaN at 1050°C;
[0036] 6. Grow 2μm silicon-doped n-type GaN at 1050°C;
[0037] 7. Out of the oven, cleaned, and implanted with luminous ions, including red-emitting erbium ions (Er 3+ ) or praseodymium ion (Pr 3+ ), the green-emitting erbium ion (Er 3+ ) or cerium ions (Ce 3+ );
[0038] 8. Annealing.
[0039] 9. Grow In for 5 cycles between 700-850 degrees 0.24 Ga 0.76 N 3nm / GaN 10nm blue quantum well;
[0040] 10. Growth of Mg doped 20nm thick Al at 1050°C 0.15 Ga 0.85 N electron blocking layer;
[0041] 11. Grow Mg-doped p-type GaN at 1050°C;...
Embodiment 2
[0045] 1. Clean the substrate. The ion-implanted sapphire substrate is ultrasonically cleaned in HCl, acetone, absolute ethanol, and deionized water, and then placed in a MOCVD reactor;
[0046] 2. Introduce hydrogen (H 2 ) was warming up to 1020°C and cleaned for 3 minutes;
[0047] 3. Grow 30nm low-temperature nucleation layer GaN at 550°C;
[0048] 4. Anneal at 750°C for 5 minutes;
[0049] 5. Grow 2μm non-doped GaN at 1050°C;
[0050] 6. Out of the oven, cleaned, and ion-implanted with red erbium ions (Er 3+ ) or praseodymium ion (Pr 3+ );
[0051] 7. At 750°C, MBE grows 2μm silicon-doped n-type GaN;
[0052] 8. Annealing.
[0053] 9. Grow In at 700-850°C for 5 cycles 0.24 Ga 0.76 N 3nm / GaN 10nm blue quantum well;
[0054] 10. Take out the sample, clean it, and place it in a molecular beam epitaxy (MBE) reactor;
[0055] 11. At 520°C, grow 5 cycles of InGaN / GaN self-assembled quantum dot layer under the gas flow ratio Ga:In=3:2;
[0056] 12. Growth of Mg doped 2...
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