A white light led without phosphor powder
A phosphor-free, white light technology, applied in the field of white light LEDs, can solve problems such as difficult control of uniformity and consistency, uneven color of white light, and reduced efficiency, so as to improve energy conversion efficiency and lifespan, improve color rendering index, The effect of improving quality
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[0030] Example 1:
[0031] 1. Clean the substrate. The ion-implanted sapphire substrate is ultrasonically cleaned in HCl, acetone, absolute ethanol, and deionized water, and then placed in a reactor;
[0032] 2. Fill in hydrogen (H 2 ) Rinse at 1020°C for 3 minutes;
[0033] 3. Growing 30nm low-temperature nucleation layer GaN at 550°C;
[0034] 4. Annealing at 750°C for 5 minutes;
[0035] 5. Grow 2μm undoped GaN at 1050°C;
[0036] 6. Grow 2μm silicon-doped n-type GaN at 1050°C;
[0037] 7. Baking, cleaning, luminous ion implantation, including erbium ions (Er 3+ ) Or praseodymium ion (Pr 3+ ), the green erbium ion (Er 3+ ) Or cerium ion (Ce 3+ );
[0038] 8. Annealing.
[0039] 9. Grow 5 cycles of In between 700-850 degrees 0.24 Ga 0.76 N 3nm / GaN 10nm blue quantum well;
[0040] 10. Grow Mg doped with 20nm thick Al at 1050°C 0.15 Ga 0.85 N electron blocking layer;
[0041] 11. Grow Mg-doped p-type GaN at 1050°C;
[0042] 12. Annealing at 750°C for 20 minutes;
[0043] 13. After the standard...
Example Embodiment
[0044] Example 2
[0045] 1. Clean the substrate. The ion-implanted sapphire substrate is ultrasonically cleaned in HCl, acetone, absolute ethanol, and deionized water, and then placed in the MOCVD reactor;
[0046] 2. Fill in hydrogen (H 2 ) Rinse at 1020°C for 3 minutes;
[0047] 3. Growing 30nm low-temperature nucleation layer GaN at 550°C;
[0048] 4. Annealing at 750°C for 5 minutes;
[0049] 5. Grow 2μm undoped GaN at 1050°C;
[0050] 6. Baking out, cleaning, ion implantation of red erbium ions (Er 3+ ) Or praseodymium ion (Pr 3+ );
[0051] 7. At 750°C, MBE grows 2μm silicon-doped n-type GaN;
[0052] 8. Annealing.
[0053] 9. Grow 5 cycles of In between 700-850°C 0.24 Ga 0.76 N 3nm / GaN 10nm blue quantum well;
[0054] 10. Take out the sample, clean it, and place it in a molecular beam epitaxy (MBE) reactor;
[0055] 11. At 520°C and gas flow ratio Ga:In=3:2, grow 5 cycles of InGaN / GaN self-assembled quantum dot layer;
[0056] 12. Grow Mg doped with 20nm thick Al at 740°C 0.15 Ga 0.85...
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