Concentration and demineralization purification treatment method of biological samples
A biological sample purification treatment technology, applied in the field of biochemical analysis, can solve problems such as analyte loss
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Embodiment 1
[0046] Single crystal silicon [n type, (100)] was treated with oxygen plasma at a power of 100 W for 3 minutes to make the surface of the silicon wafer hydrophilic. Then use high-purity water to ultrasonically clean the surface of the substrate three times, each time for 4 minutes, so that the surface is thoroughly cleaned and hydroxylated.
[0047] Take 0.1 μL of polymethyl methacrylate (PMMA, Sigma-Aldrich) and drop-coat it on the surface of the treated silicon wafer to form a polymer barrier layer with a thickness of about 60 μm and a radius of 800 μm. The silicon surface substrate (hydrophilized) was attached to a clean upper surface dish, and 1 μL of fluorine-containing silicon coupling reagent (heptadecafluorodecyltrimethoxysilane, Sigma-Aldrich) was dropped on the surface with a pipette gun. The lower surface plate is fastened to the upper surface plate, and heated and grown at 250°C for 3 hours, so that fluorine-containing silane is grown on the entire surface except f...
Embodiment 2
[0052] The glass sheet was treated with oxygen plasma at a power of 100 W for 3 minutes to make the surface of the glass sheet hydrophilic. Then use high-purity water to ultrasonically clean the surface of the substrate three times, each time for 4 minutes, so that the surface is thoroughly cleaned and hydroxylated.
[0053]0.1 μL of polymethyl methacrylate (PMMA, Sigma-Aldrich) was drop-coated on the surface of the treated glass slide to form a polymer barrier layer with a thickness of about 60 μm and a radius of 800 μm.
[0054] Subsequently, the glass surface substrate (hydrophilized) containing the baffle was attached to a clean upper surface dish, and 1 μL of fluorine-containing silicon coupling reagent (heptadecafluorodecyltrimethoxysilane, Sigma -Aldrich) was dropped on the lower surface dish, buckled the upper surface dish, and heated and grown at 250°C for 3 hours, so that fluorine-containing silane was grown on the entire surface except for the PMMA coverage area, wh...
Embodiment 3
[0058] The quartz plate was treated with oxygen plasma at a power of 100W for 3 minutes to make the surface of the quartz plate hydrophilic. Then use high-purity water to ultrasonically clean the surface of the substrate three times, each time for 4 minutes, so that the surface is thoroughly cleaned and hydroxylated.
[0059] 0.1 μL of polymethyl methacrylate (PMMA, Sigma-Aldrich) was drop-coated on the surface of the treated quartz plate to form a polymer barrier layer with a thickness of about 60 μm and a radius of 800 μm.
[0060] Subsequently, the quartz surface substrate (hydrophilized) containing the baffle was attached to a clean upper surface dish, and 1 μL of fluorine-containing silicon coupling reagent (heptadecafluorodecyltrimethoxysilane, Sigma -Aldrich) was dropped on the lower surface dish, buckled the upper surface dish, and heated and grown at 250°C for 3 hours, so that fluorine-containing silane was grown on the entire surface except for the PMMA coverage area...
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