Anti-static coating for photo-curing nanometer polyaniline-epoxy acrylic resin interpenetrating network
A technology of epoxy acrylic acid and nano-polyaniline, which is applied in conductive coatings, coatings and other directions, can solve the problems of easy agglomeration of nano-polyaniline particles, and achieve the effects of good surface gloss, adjustable curing time and simple preparation process
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0026] (1) Nano-polyaniline-epoxy acrylic resin mixture prepared by in-situ emulsion polymerization: ammonium persulfate (8.26wt%), dodecylbenzenesulfonic acid (13.57%), water (45.24wt%), xylene ( 24.13 wt%), aniline (2.76 wt%), epoxy acrylic resin (6.04 wt%), react in an ice-water bath for 6h, and obtain a mixture of nano-polyaniline and epoxy acrylic resin, and the content of polyaniline in the obtained mixture is 4.42wt %.
[0027] (2) Preparation of antistatic coating: the mixture of nano-polyaniline and epoxy acrylic resin is 63.66wt%, the diluting monomer TPGDA is 27.72wt%, the initiator 2,4,6-diphenylphosphine oxide is 4.15wt%, Catalyst triethanolamine 1.28 wt%, polymerization inhibitor hydroquinone 0.64 wt%, filler 500 mesh silica 2.55 wt%. Stir evenly to obtain a nano-polyaniline-epoxy acrylic resin conductive coating, and brush or spray the coating on a glass plate. The UV light source used for photocuring is 1000W, the curing distance of the light source is 15cm, a...
Embodiment 2
[0029](1) Nano-polyaniline-epoxy acrylic resin mixture prepared by in-situ emulsion polymerization: ammonium persulfate (8.26wt%), dodecylbenzenesulfonic acid (13.57%), water (45.24wt%), xylene ( 24.13 wt%), aniline (2.76 wt%), epoxy acrylic resin (6.04 wt%), react in an ice-water bath for 6h, and obtain a mixture of nano-polyaniline and epoxy acrylic resin, and the content of polyaniline in the obtained mixture is 4.42wt %.
[0030] (2) Preparation of antistatic coating: the mixture of nano-polyaniline and epoxy acrylic resin is 55.81wt%, the diluting monomer TPGDA is 33.48wt%, the initiator 2,4,6-diphenylphosphine oxide is 4.46wt%, Catalyst triethanolamine 1.79 wt%, polymerization inhibitor hydroquinone 0.89 wt%, filler 500 mesh silica 3.57 wt%. Stir evenly to obtain a nano-polyaniline-epoxy acrylic resin conductive coating, and brush or spray the coating on a glass plate. The UV light source used for photocuring is 1000W, the curing distance of the light source is 15cm, an...
Embodiment 3
[0032] (1) Nano-polyaniline-epoxy acrylic resin mixture prepared by in-situ emulsion polymerization: ammonium persulfate (8.26wt%), dodecylbenzenesulfonic acid (13.57%), water (45.24wt%), xylene ( 24.13 wt%), aniline (2.76 wt%), epoxy acrylic resin (6.04 wt%), react in an ice-water bath for 6h, and obtain a mixture of nano-polyaniline and epoxy acrylic resin, and the content of polyaniline in the obtained mixture is 4.42wt %.
[0033] (2) Preparation of antistatic coating: the mixture of nano-polyaniline and epoxy acrylic resin is 62.78wt%, the diluting monomer TPGDA is 28.27wt%, the initiator 2,4,6-diphenylphosphine oxide is 4.55wt%, Catalyst triethanolamine 1.25 wt%, polymerization inhibitor hydroquinone 0.63 wt%, filler 500 mesh silica 2.52 wt%. Stir evenly to obtain a nano-polyaniline-epoxy acrylic resin conductive coating, and brush or spray the coating on a glass plate. The UV light source used for photocuring is 1000W, the curing distance of the light source is 15cm, a...
PUM
Property | Measurement | Unit |
---|---|---|
Resistance | aaaaa | aaaaa |
Tensile strength | aaaaa | aaaaa |
Tensile strength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com