Field effect gas sensor taking air gap as insulation layer and preparation method thereof

A gas sensor and air gap technology, applied in the field of sensing, can solve the problem of improving the sensitivity of field effect gas sensors, limiting field effect one-dimensional micro-nano single-crystal gas sensors, slowing down the development of device miniaturization and nanometerization, etc. problems, to avoid the tip effect, improve device performance, and ensure stability and repeatability

Inactive Publication Date: 2012-08-01
NORTHEAST NORMAL UNIVERSITY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

More importantly, the solid insulating layer shields most of the conductive channel interface that is most sensitive to adsorbed molecules, which affects the further improvement of the sensitivity of the field effect gas sensor.
These problems limit the development of field-effect one-dimensional micro-nano single crystal gas sensors, and slow down the development of device miniaturization and nanometerization.

Method used

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  • Field effect gas sensor taking air gap as insulation layer and preparation method thereof
  • Field effect gas sensor taking air gap as insulation layer and preparation method thereof
  • Field effect gas sensor taking air gap as insulation layer and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] Embodiment 1, Preparation method 1 of a field effect transistor gas sensor with an air gap as an insulating layer:

[0034] Device Fabrication Process The air gap grooves are prepared by spin-coating PMMA on the surface of the substrate combined with electron beam exposure technology. The source and drain electrodes are prepared by using the gold sheet film electrode method or photolithography method. The micro-nano single crystal is placed above the air gap by mechanical movement.

[0035] The field-effect gas sensor provided by the present invention to manufacture an air gap as an insulating layer comprises the following steps:

[0036] (1) Clean the glass substrate with a standard silicon wafer cleaning process, and then use photolithography to prepare Ti / Au (10nm / 20nm) electrodes as the gate of the device;

[0037](2) The anisole solvent is equipped with PMMA with a mass volume ratio of 6%, and the prepared PMMA solution is dripped on the glass sheet, and spin-c...

Embodiment 2

[0043] Embodiment 2, Preparation method 2 of field effect transistor gas sensor with air gap as insulating layer:

[0044] Proceed as follows:

[0045] (1) Clean the heavily doped Si as the gate of the device with a standard silicon wafer cleaning process;

[0046] (2) Step (2) in Example 1 is used to spin-coat two layers of PMMA on Si to obtain 510nm PMMA.

[0047] (3) A groove with a width of 10 microns and a smooth bottom is prepared on the gate by electron beam exposure technology, and heavily doped Si is used as the gate. Both sides of the trench are used to support copper phthalocyanine nanobelts.

[0048] (4) As in step (4) in Example 1, the micro-nano crystals are mechanically moved to place a single copper phthalocyanine nanoribbon above the air gap, and the width of the micro-nano single crystal is 350nm.

[0049] (5) Step (5) in Example 1 is used to prepare source-drain electrodes.

[0050] (6) The air gap between the semiconductor and the bottom of the trenc...

Embodiment 3

[0053] Embodiment 3, Application of Field Effect Transistor Gas Sensor with Air Gap as Insulator (Taking Copper Phthalocyanine Nanoribbons as an Example)

[0054] Device pair SO 2 Gas-sensitive characteristics:

[0055] Connect the finished device to the self-made stainless steel gas-sensing test system by using a gold wire ball welding machine. The air pressure was maintained at one atmosphere during the test. The gas flow rate was 500 sccm. In the test we chose the gate voltage as V G =-10 V, the source-drain voltage is V SD =-15V. The gas concentration is controlled by a mass flow meter, and the balance gas is N 2 . Measured gas SO 2 The concentration of the gas is 0.5-20ppm, and the measured gas flow time is 15min, and then the high-purity N 2 The access time was set at 30 min. Test device against SO 2 Gas sensitivity characteristics and sensitivity.

[0056] Figure 7 and Figure 8 Field-effect gas sensors prepared for copper phthalocyanine single nanobelt...

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Abstract

The invention discloses a field effect transistor gas sensor taking an air gap as an insulation layer and a preparation method. The preparation method mainly comprises the following steps of: spin-coating an organic insulation layer on an electric conducting substrate to serve as a device supporting layer, and etching a part of the device supporting layer to prepare an air gap groove; placing a micro-nano crystal above the air gap; and preparing source and drain electrodes of the device by utilizing a gold plate pasting electrode method or a photoetching technology, wherein the air gap between the micro-nano crystal and a grid electrode at the bottom of the groove is taken as a grid electrode insulation layer of the device. According to the field effect transistor gas sensor taking the air gap as the insulation layer and the preparation method, disclosed by the invention, the pollution and the damage to the surface of the nano-crystal due to the contact of the insulation layer in a preparation process is avoided; the point discharge effect is avoided favorably, and the stability of the sensor is increased; the success rate for preparing the device is greatly increased, and the device performance is improved; and an electric conducting channel is directly exposed in gas to be tested, and thus the field effect transistor gas sensor has a better air-sensitive performance. The field effect transistor gas sensor disclosed by the invention has the advantages of good stability, high sensitivity, detection limit reaching ppb (parts per billion) order and high response speed and recovery speed.

Description

technical field [0001] The invention belongs to the field of sensing technology, and in particular relates to a field-effect gas sensor with an air gap as an insulating layer and a preparation method thereof. [0002] Background technique [0003] From 1962, Seiyama, T.; Kato, A.; Fujiishi, K.; Nagatani, M. Anal. Chem. 1962, 34, 1502–1503) discovered that the active gas in the air at 400 °C can After changing the conductivity of ZnO thin films, gas sensors based on semiconductor materials have been widely studied. Due to the characteristics of high sensitivity, low cost, long life and convenient use of semiconductor gas sensors, after decades of development, there are countless various semiconductor sensors that can be used for gas detection. [0004] In recent years, gas sensors have increasingly higher requirements in terms of miniaturization, selectivity, stability, sensitivity, response time and service life, so the research and development of new gas sensors has also ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/414
Inventor 汤庆鑫童艳红塔力哈尔裴腾飞
Owner NORTHEAST NORMAL UNIVERSITY
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